Institution · ASML (Netherlands)
Most cited papers from ASML (Netherlands)
What are the most cited papers from ASML (Netherlands)?
The most cited paper from ASML (Netherlands) is "Lithography gets extreme" (Christian C. Wagner, Noreen Harned, 2009), with 641 citations. Next come "Modeling piezoelectric actuators" (602) and "Improved motion robustness of remote-PPG by using the blood volume pulse signature" (493).
Showing 50 of 60 papers. Every paper with more than 68 citations is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | Lithography gets extreme Christian C. Wagner, Noreen Harned · Nature Photonics | 23 Dec 2009 | 641 |
| 2 | Modeling piezoelectric actuators Han J.M.T.A. Adriaens, Willem L. de Koning, Reinder Banning · IEEE/ASME Transactions on Mechatronics | 2000 | 602 |
| 3 | Improved motion robustness of remote-PPG by using the blood volume pulse signature Geert de Haan, Arno van Leest · Physiological Measurement | 27 Aug 2014 | 493 |
| 4 | Stability of Networked Control Systems With Uncertain Time-Varying Delays M.B.G. Cloosterman, Nathan van de Wouw, W.P.M.H. Heemels et al. · IEEE Transactions on Automatic Control | Jul 2009 | 397 |
| 5 | The performance of CA-125 measurement in the detection of endometriosis: a meta-analysis Ben W. Mol, Neriman Bayram, Jeroen G. Lijmer et al. · Fertility and Sterility | Dec 1998 | 359 |
| 6 | Physical processes in EUV sources for microlithography Vadim Banine, Konstantin N. Koshelev, G. H. P. M. Swinkels · Journal of Physics D Applied Physics | 7 Jun 2011 | 246 |
| 7 | Electrostatic Doping in Semiconductor Devices Gaurav Gupta, Bijoy Rajasekharan, Raymond J. E. Hueting · IEEE Transactions on Electron Devices | 23 Jun 2017 | 153 |
| 8 | Advances in Capacitive, Eddy Current, and Magnetic Displacement Sensors and Corresponding Interfaces Boby George, Zhichao Tan, Stoyan N. Nihtianov · IEEE Transactions on Industrial Electronics | 25 Jul 2017 | 152 |
| 9 | Exclusion of Deep Venous Thrombosis with D-Dimer Testing Henk van den Borne, Marion van der Kolk, Piet de Wild et al. · Thrombosis and Haemostasis | 2000 | 151 |
| 10 | AMGIE-A synthesis environment for CMOS analog integrated circuits Geert Van der Plas, G. Debyser, Francky Leyn et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 2001 | 146 |
| 11 | Extreme ultraviolet lithography Dimitrios Kazazis, Jara G. Santaclara, Jan van Schoot et al. · Nature Reviews Methods Primers | 28 Nov 2024 | 137 |
| 12 | Theory of high-NA imaging in homogeneous thin films Donis G. Flagello, Tom D. Milster, Alan E. Rosenbluth · Journal of the Optical Society of America A | 1996 | 134 |
| 13 | Unipolar Organic Transistor Circuits Made Robust by Dual-Gate Technology Kris Myny, Monique J. Beenhakkers, N. A. J. M. van Aerle et al. · IEEE Journal of Solid-State Circuits | 17 Mar 2011 | 129 |
| 14 | Process Mining Applied to the Test Process of Wafer Scanners in ASML Anne Rozinat, I.S.M. de Jong, Christoph Günther et al. · IEEE Transactions on Systems Man and Cybernetics Part C (Applications and Reviews) | 30 Mar 2009 | 128 |
| 15 | On the Possibilities of Straightforward Characterization of Plasma Activated Water Wflm Wilfred Hoeben, P. P. van Ooij, D.C. Schram et al. · Plasma Chemistry and Plasma Processing | 2 Apr 2019 | 126 |
| 16 | Optical wafer metrology sensors for process-robust CD and overlay control in semiconductor device manufacturing Arie J. den Boef · Surface Topography Metrology and Properties | 17 Feb 2016 | 125 |
| 17 | Enabling mobility in heterogeneous wireless sensor networks cooperating with UAVs for mission-critical management Ayşegül Tüysüz Erman, Lodewijk van Hoesel, Paul Havinga et al. · IEEE Wireless Communications | Dec 2008 | 125 |
| 18 | Symmetric equilibrium strategies in game theoretic real option models Jacco Thijssen, Kuno J. M. Huisman, Peter M. Kort · Journal of Mathematical Economics | 30 May 2012 | 115 |
| 19 | Constrained Iterative Feedback Tuning for Robust Control of a Wafer Stage System Marcel Heertjes, Bart Van der Velden, Tom Oomen · IEEE Transactions on Control Systems Technology | 20 Apr 2015 | 108 |
| 20 | Industry engagement with control research: Perspective and messages Tarıq Samad, Margret Bauer, Scott A. Bortoff et al. · Annual Reviews in Control | 2020 | 106 |
| 21 | Plasma Propulsion of a Metallic Microdroplet and its Deformation upon Laser Impact Dmitry Kurilovich, Alexander L. Klein, Francesco Torretti et al. · Physical Review Applied | 29 Jul 2016 | 106 |
| 22 | Cavity and other radial substructures in the disk around HD 97048 G. van der Plas, C. M. Wright, F. Ménard et al. · Astronomy and Astrophysics | 4 Oct 2016 | 104 |
| 23 | Plasma sources for EUV lithography exposure tools Vadim Banine, Roel Moors · Journal of Physics D Applied Physics | 20 Nov 2004 | 101 |
| 24 | Extreme ultraviolet lithography: Status and prospects Jos P. H. Benschop, Vadim Banine, Sjoerd Lok et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena | Nov 2008 | 101 |
| 25 | An evaluation of clone detection techniques for identifying crosscutting concerns Magiel Bruntink, Arie van Deursen, Tom Tourwé et al. | 23 Dec 2004 | 101 |
| 26 | How to optimize high-order harmonic generation in gases Robin Weissenbilder, Stefanos Carlström, Laura Rego et al. · Nature Reviews Physics | 13 Oct 2022 | 100 |
| 27 | String Stable Model Predictive Cooperative Adaptive Cruise Control for Heterogeneous Platoons Ellen van Nunen, Joey Reinders, Elham Semsar-Kazerooni et al. · IEEE Transactions on Intelligent Vehicles | 20 Mar 2019 | 99 |
| 28 | Deep learning-based single image super-resolution for low-field MR brain images M. L. de Leeuw den Bouter, Giuseppe Ippolito, Thomas O’Reilly et al. · Scientific Reports | 16 Apr 2022 | 94 |
| 29 | Cloud-Based Networked Visual Servo Control Haiyan Wu, Lei Lou, Chih‐Chung Chen et al. · IEEE Transactions on Industrial Electronics | 3 Feb 2012 | 94 |
| 30 | Control of Wafer Scanners: Methods and Developments Marcel Heertjes, Hans Butler, Nic Dirkx et al. | Jul 2020 | 92 |
| 31 | EUV lithography performance for manufacturing: status and outlook Alberto Pirati et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 18 Mar 2016 | 91 |
| 32 | State-space analysis and identification for a class of hysteretic systems Reinder Banning, Willem L. de Koning, Han J.M.T.A. Adriaens et al. · Automatica | Dec 2001 | 91 |
| 33 | Periodic arrays of deep nanopores made in silicon with reactive ion etching and deep UV lithography Léon A. Woldering, R. Willem Tjerkstra, Henri V. Jansen et al. · Nanotechnology | 4 Mar 2008 | 90 |
| 34 | Development of a Silicon-based Nanoprobe System for 3-D Measurements Han Haitjema, W.O. Pril, Piet H. J. Schellekens · CIRP Annals | 2001 | 89 |
| 35 | Towards ultimate optical lithography with NXT:1950i dual stage immersion platform Tom Castenmiller, Frank van de Mast, Toine de Kort et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 11 Mar 2010 | 89 |
| 36 | Pitch doubling through dual-patterning lithography challenges in integration and litho budgets Mircea V. Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 16 Mar 2007 | 89 |
| 37 | Spatiotemporal coupling of attosecond pulses Hampus Wikmark, Chen Guo, Jan Vogelsang et al. · Proceedings of the National Academy of Sciences | Mar 2019 | 88 |
| 38 | Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner Mark A. van de Kerkhof, Hans Jasper, Leon Levasier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 24 Mar 2017 | 87 |
| 39 | Progress on EUV pellicle development Carmen Zoldesi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Apr 2014 | 86 |
| 40 | Volume flexibility and capacity investment under demand uncertainty Verena Hagspiel, Kuno J. M. Huisman, Peter M. Kort · International Journal of Production Economics | 13 May 2016 | 84 |
| 41 | AGNIFS survey of local AGN: GMOS-IFU data and outflows in 30 sources Daniel Ruschel-Dutra, Thaisa Storchi‐Bergmann, Allan Schnorr-Müller et al. · Monthly Notices of the Royal Astronomical Society | 15 Jul 2021 | 82 |
| 42 | RILEM TC 247-DTA round robin test: mix design and reproducibility of compressive strength of alkali-activated concretes John L. Provis, K. Arbi, Susan Andrea Bernal et al. · Materials and Structures | 10 Sep 2019 | 81 |
| 43 | Characterization of intermetallic compounds in Cu–Al ball bonds: Mechanical properties, interface delamination and thermal conductivity M.H.M. Kouters, G.H.M. Gubbels, O. Dos Santos Ferreira · Microelectronics Reliability | 15 May 2013 | 81 |
| 44 | First performance results of the ASML alpha demo tool H. Meiling, H.C. Meijer, Vadim Banine et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 10 Mar 2006 | 79 |
| 45 | A Compact Integrated Polarization Splitter/Converter in InGaAsP–InP Luc M. Augustin, R. Hanfoug, J.J.G.M. van der Tol et al. · IEEE Photonics Technology Letters | 8 Aug 2007 | 77 |
| 46 | Simultaneous source mask optimization (SMO) Robert J. Socha, Xuelong Shi, David LeHoty · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 28 Jun 2005 | 77 |
| 47 | Solidification of liquid metal drops during impact Marise V. Gielen, Riëlle de Ruiter, Robin B. J. Koldeweij et al. · Journal of Fluid Mechanics | 26 Nov 2019 | 76 |
| 48 | Nonlinear iterative learning control with applications to lithographic machinery Marcel Heertjes, Tim K. Tso · Control Engineering Practice | 16 May 2007 | 74 |
| 49 | Formal Methods in Industry Maurice H. ter Beek, Roderick Chapman, Rance Cleaveland et al. · Formal Aspects of Computing | 21 Aug 2024 | 72 |
| 50 | Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography Jan Mulkens, M. M. Hanna, Hannah Wei et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 13 Mar 2015 | 72 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.