Institution · Carl Zeiss (Israel)
Most cited papers from Carl Zeiss (Israel)
What are the most cited papers from Carl Zeiss (Israel)?
The most cited paper from Carl Zeiss (Israel) is "Correcting image placement errors using registration control (RegC) technology" (Erez Graitzer, Gunter Antesberger, Guy Ben-Zvi et al., 2011), with 9 citations. Next come "RegC: a new registration control process for photomasks after pattern generation" (7) and "Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance" (6).
Showing 32 of 32 papers. Every paper is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | Correcting image placement errors using registration control (RegC) technology Erez Graitzer, Gunter Antesberger, Guy Ben-Zvi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 12 Feb 2011 | 9 |
| 2 | RegC: a new registration control process for photomasks after pattern generation Erez Graitzer, Guy Ben-Zvi, Avi Cohen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 29 Apr 2011 | 7 |
| 3 | Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance Kujan Gorhad, Ofir Sharoni, Vladimir Dmitriev et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 8 Mar 2016 | 6 |
| 4 | CD uniformity correction on 45-nm technology non-volatile memory Ute Buttgereit, Robert Birkner, Mark Joyner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 11 Mar 2010 | 6 |
| 5 | Improved CD control for 45-40 nm CMOS logic patterning: anticipation for 32-28 nm Bertrand Le Gratiet et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 11 Mar 2010 | 5 |
| 6 | Hot spot variability and lithography process window investigation by CDU improvement using CDC technique Bernd Geh, Alla Bitensky, Aravind Narayana Samy et al. | 20 Mar 2018 | 4 |
| 7 | Closed loop registration control (RegC) using PROVE as the data source for the RegC process Erez Graitzer, Avi Cohen, Vladimir Dmitriev et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 21 Jun 2012 | 4 |
| 8 | Improving wafer level CD uniformity for logic applications utilizing mask level metrology and process Avi Cohen, Thomas Trautzsch, Ute Buttgereit et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 9 Sep 2013 | 4 |
| 9 | Process window improvement on 45nm technology non volatile memory by CD uniformity improvement Ute Buttgereit, Robert Birkner, Erez Graitzer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 23 Sep 2010 | 4 |
| 10 | Correcting image placement errors using registration control (RegC) technology in the photomask periphery Avi Cohen, Falk Lange, Guy Ben-Zvi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 9 Apr 2012 | 4 |
| 11 | Critical dimension control using ultrashort laser for improving wafer critical dimension uniformity Dan Avizemer, Ofir Sharoni, Sergey V. Oshemkov et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 11 Sep 2015 | 4 |
| 12 | Improving mask registration and wafer overlay control using an ultrashort pulsed laser Dan Avizemer, Vladimir Dmitriev, Michael S. Hibbs · Journal of Micro/Nanolithography MEMS and MOEMS | 9 Jun 2016 | 3 |
| 13 | Intra-field on-product overlay improvement by application of RegC and TWINSCAN corrections Ofir Sharoni, Vladimir Dmitriev, Erez Graitzer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 19 Mar 2015 | 3 |
| 14 | Compensating process non-uniformity to improve wafer overlay by RegC Philippe J. Leray, Shaunee Cheng, Avi Cohen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 2 Apr 2014 | 3 |
| 15 | Reduce probability of wafer intra-field process (printing) defects for logic and DRAM applications Yael Sufrin, Avi Cohen, Ofir Sharoni et al. | 29 Aug 2019 | 2 |
| 16 | New registration calibration strategies for MBMW tools by PROVE measurements Michael Haberler, Peter Hudek, Michal Jurkovič et al. | Nov 2022 | 1 |
| 17 | Enhanced wafer overlay residuals control: deep sub-nanometer at sub-millimeter lateral resolution Yael Sufrin, Philippe J. Leray, Eren Canga et al. | 29 Aug 2019 | 1 |
| 18 | M-CAMP™: A cloud-based web platform with a novel approach for species-level classification of 16S rRNA microbiome sequences Andrew E. Schriefer, Brajendra Kumar, Avihai Zolti et al. · bioRxiv (Cold Spring Harbor Laboratory) | 27 Aug 2021 | 1 |
| 19 | Enhanced wafer overlay residuals control; deep sub-nanometer at sub-millimeter lateral resolution Avi Cohen, Philippe J. Leray, Eren Canga et al. | 26 Mar 2019 | 1 |
| 20 | Intra field CD uniformity correction by Scanner Dose Mapper using Galileo mask transmission mapping as the CDU data source Gek Soon Chua, Chason Eran, Sia Kim Tan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 19 Feb 2010 | 1 |
| 21 | Mask tuning for process window improvement Ute Buttgereit, Robert Birkner, Erez Graitzer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 2 Feb 2011 | 1 |
| 22 | Further beyond: registration and overlay control enhancements for optical masks Kujan Gorhad, Avi Cohen, Dan Avizemer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 16 Sep 2014 | 1 |
| 23 | Prospective Fecal Microbiomics Biomarkers for Chronic Wasting Disease Adam Didier, Maureen J. Bourner, Guy Kleks et al. · bioRxiv (Cold Spring Harbor Laboratory) | 22 Aug 2023 | 0 |
| 24 | Excursion prevention by edge placement error reduction using photomask tuning Rolf Seltmann, Tino Hertzsch, Matthias Ruhm et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV | 19 Feb 2021 | 0 |
| 25 | Excursion Prevention Strategy to Increase Chip Performance by Wafer Intra-Field CD Control Using Photomask Tuning Ofir Sharoni, Yael Sufrin, Avi Cohen et al. | Aug 2020 | 0 |
| 26 | Excursion prevention and increasing device performance using mask correction for intrafield CD and Overlay improvement Thomas Scherübl, Yael Sufrin, Avi Cohen et al. | Sep 2019 | 0 |
| 27 | Improving chip performance by photomask tuning: ultimate intra-field CD control as a major part of an overall excursion prevention strategy Rolf Seltmann, Aravind Narayana Samy, Thomas Thamm et al. | 3 Oct 2019 | 0 |
| 28 | Optical design of ZEISS ForTune photo mask tuning system: how to generate diffraction-limited laser foci in thick specimens Markus Seeßelberg, Joachim Welte, Vladimir Dmitriev et al. | 5 Jun 2018 | 0 |
| 29 | Addressing EUV masks registration challenges through closed loop correction (Conference Presentation) Avi Cohen, Ofir Sharoni, Dirk Beyer et al. | 16 Oct 2017 | 0 |
| 30 | Modification of Mo/Si multilayer coating by processing with fs laser pulses Sergey V. Oshemkov, Vladimir Kruglyakov, Yuval Perets et al. | Jun 2017 | 0 |
| 31 | Controllable bumps and holes fabrication on the surface of fused silica by processing bulk material with ultrashort laser pulses Sergey V. Oshemkov, Vladimir Kruglyakov, Ralph Klaesges et al. | May 2011 | 0 |
| 32 | A study of closed-loop application: WLCD-CDC for 32nm and beyond reticles Arosha W. Goonesekera, Ute Buttgereit, Thomas Thaler et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 29 Sep 2011 | 0 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.