Most cited papers from EV Group (Austria)
What are the most cited papers from EV Group (Austria)?
The most cited paper from EV Group (Austria) is "III–V-on-silicon solar cells reaching 33% photoconversion efficiency in two-terminal configuration" (Romain Cariou, Jan Benick, Frank Feldmann et al., 2018), with 336 citations. Next come "Mechanisms for room temperature direct wafer bonding" (197) and "Monolithic Two-Terminal III–V//Si Triple-Junction Solar Cells With 30.2% Efficiency Under 1-Sun AM1.5g" (116).
Showing 50 of 60 papers. Every paper with more than 16 citations is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | III–V-on-silicon solar cells reaching 33% photoconversion efficiency in two-terminal configuration Romain Cariou, Jan Benick, Frank Feldmann et al. · Nature Energy | 29 Mar 2018 | 336 |
| 2 | Mechanisms for room temperature direct wafer bonding Thomas Plach, Kurt Hingerl, Sajjad Tollabimazraehno et al. · Journal of Applied Physics | 7 Mar 2013 | 197 |
| 3 | Monolithic Two-Terminal III–V//Si Triple-Junction Solar Cells With 30.2% Efficiency Under 1-Sun AM1.5g Romain Cariou, Jan Benick, Paul Beutel et al. · IEEE Journal of Photovoltaics | 9 Dec 2016 | 116 |
| 4 | High resolution lithography with PDMS molds Markus Bender, Ulrich Plachetka, Jianhua Ran et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena | Nov 2004 | 99 |
| 5 | Reliable 300 mm Wafer Level Hybrid Bonding for 3D Stacked CMOS Image Sensors S. Lhostis et al. | May 2016 | 95 |
| 6 | Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography Marko Vogler, Sabine Wiedenberg, Michael M. Mühlberger et al. · Microelectronic Engineering | 27 Feb 2007 | 85 |
| 7 | Physical mechanisms of copper-copper wafer bonding Bernhard Rebhan, Kurt Hingerl · Journal of Applied Physics | Oct 2015 | 83 |
| 8 | Integration of a temporary carrier in a TSV process flow Jean Charbonnier, Severine Cheramy, David D. Henry et al. | May 2009 | 60 |
| 9 | Simultaneous Cu-Cu and Compliant Dielectric Bonding for 3D Stacking of ICs Anne Jourdain, Serguei Stoukatch, Piet De Moor et al. | 2007 | 59 |
| 10 | Annealing temperature effect on the Cu-Cu bonding energy for 3D-IC integration Eun‐Jung Jang, Jaewon Kim, Bioh Kim et al. · Metals and Materials International | Feb 2011 | 54 |
| 11 | High-Performance Temporary Adhesives for Wafer Bonding Applications Rama Puligadda, Sunil K. Pillalamarri, Wenbin Hong et al. · MRS Proceedings | 2006 | 52 |
| 12 | Adhesive wafer bonding for MEMS applications Viorel Drăgoi, Thomas Glinsner, Gerald Mittendorfer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 25 Apr 2003 | 50 |
| 13 | Advances in SiCN-SiCN Bonding with High Accuracy Wafer-to-Wafer (W2W) Stacking Technology Lan Peng, S-W Kim, Serena Iacovo et al. | Jun 2018 | 47 |
| 14 | Temporary Bonding and DeBonding Enabling TSV Formation and 3D Integration for Ultra-thin Wafers Stefan Pargfrieder, Paul Kettner, Mark Privett et al. | Dec 2008 | 45 |
| 15 | Micro-transfer-printed narrow-linewidth III-V-on-Si double laser structure with a combined 110 nm tuning range Emadreza Soltanian, Grigorij Muliuk, Sarah Uvin et al. · Optics Express | 28 Sep 2022 | 43 |
| 16 | A Moiré method for high accuracy alignment in nanoimprint lithography Michael M. Mühlberger, Iris Bergmair, Wolfgang Schwinger et al. · Microelectronic Engineering | 3 Feb 2007 | 43 |
| 17 | UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns Christine Thanner, Martin Eibelhuber · Nanomaterials | 23 Mar 2021 | 41 |
| 18 | Facilitating Ultrathin Wafer Handling for TSV Processing A. Jouve, Shelly Fowler, Mark Privett et al. | Dec 2008 | 41 |
| 19 | Wafer-level plasma activated bonding: new technology for MEMS fabrication Viorel Drăgoi, Gerald Mittendorfer, Christine Thanner et al. · Microsystem Technologies | 19 Oct 2007 | 41 |
| 20 | Nanoimprint lithography with a commercial 4-in. bond system for hot embossing Nils Roos, Thomas Luxbacher, Thomas Glinsner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 20 Aug 2001 | 39 |
| 21 | Uniformity study of wafer-scale InP-to-silicon hybrid integration Di Liang, David C. Chapman, Youli Li et al. · Applied Physics A | 20 Aug 2010 | 38 |
| 22 | Influence of 2.09-μm pulse duration on through-silicon laser ablation of thin metal coatings Ignas Astrauskas, Boris Považay, Andrius Baltuška et al. · Optics & Laser Technology | 28 Aug 2020 | 34 |
| 23 | Cu-SiO2 hybrid bonding simulation including surface roughness and viscoplastic material modeling: A critical comparison of 2D and 3D modeling approach Thomas Wlanis, René Hammer, Werner Ecker et al. · Microelectronics Reliability | 15 May 2018 | 34 |
| 24 | CMOS: compatible wafer bonding for MEMS and wafer-level 3D integration Viorel Drăgoi, Eric F. Pabo, Jürgen Burggraf et al. · Microsystem Technologies | 6 Feb 2012 | 33 |
| 25 | Development of nanoimprint processes for photovoltaic applications Hubert Hauser, Nico Tucher, Katharina Tokai et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 29 Jul 2015 | 32 |
| 26 | 0.5 ¼m Pitch Wafer-to-wafer Hybrid Bonding with SiCN Bonding Interface for Advanced Memory Kai Ma, Nikolaos Bekiaris, Sesh Ramaswami et al. | May 2023 | 31 |
| 27 | Cyclo-Olefin polymer direct bonding using low temperature plasma activation bonding J.R. Mizuno, Hiroyasu Ishida, Shari N. Farrens et al. | 24 Aug 2005 | 29 |
| 28 | Pre-storage of gelified reagents in a lab-on-a-foil system for rapid nucleic acid analysis Yi Sun, Jonas Høgberg, Christine Thanner et al. · Lab on a Chip | 2013 | 28 |
| 29 | A Study of SiCN Wafer-to-Wafer Bonding and Impact of Wafer Warpage Serena Iacovo, Koen D’havé, Oguzhan Orkut Okudur et al. | May 2023 | 27 |
| 30 | Characterization of bonding activation sequences to enable ultra-low Cu/SiCN wafer level hybrid bonding Serena Iacovo, Lan Peng, Fuya Nagano et al. | Jun 2021 | 27 |
| 31 | A simple fabrication process for disposable interdigitated electrode arrays with nanogaps for lab-on-a-chip applications Stefan Partel, Stephan Kasemann, Volha A. Matylitskaya et al. · Microelectronic Engineering | 31 Mar 2017 | 27 |
| 32 | Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography J.L. Linden, Ch. Thanner, Benjamin Schaaf et al. · Microelectronic Engineering | 5 Jan 2011 | 27 |
| 33 | Metal Thermocompression Wafer Bonding for 3D Integration and MEMS Applications Viorel Drăgoi, Gerald Mittendorfer, Jürgen Burggraf et al. · ECS Transactions | Oct 2010 | 26 |
| 34 | Aggressive Pitch Scaling (sub-0.5 μm) of W2W Hybrid Bonding Through Process Innovations Tyler Sherwood, R. Patlolla, Joe Salfelder et al. | May 2023 | 25 |
| 35 | Heterogeneous Integration by Collective Die-To-Wafer Bonding Thomas Uhrmann, Jürgen Burggraf, Martin Eibelhuber | Oct 2018 | 25 |
| 36 | New Results on Plasma Activated Bonding of Imprinted Polymer Features for Bio MEMS Applications Paul Kettner, R. Pelzer, Thomas Glinsner et al. · Journal of Physics Conference Series | Apr 2006 | 25 |
| 37 | Fabrication of 3D-photonic crystals via UV-nanoimprint lithography Thomas Glinsner, Paul F. Lindner, Michael M. Mühlberger et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena | Nov 2007 | 25 |
| 38 | Achieving low-temperature wafer level bonding with Cu-Sn-In ternary at 150 °C Obert Golim, Vesa Vuorinen, Glenn Ross et al. · Scripta Materialia | Sep 2022 | 23 |
| 39 | Making a good impression Gerald Kreindl, Thomas Glinsner, R. A. Miller · Nature Photonics | 24 Dec 2009 | 23 |
| 40 | Real-time isothermal RNA amplification of toxic marine microalgae using preserved reagents on an integrated microfluidic platform Maria‐Nefeli Tsaloglou, Florian Laouenan, Christos-Moritz Loukas et al. · The Analyst | 5 Nov 2012 | 22 |
| 41 | Comparison of multilayer stamp concepts in UV–NIL Ulrich Plachetka, Markus Bender, Andreas Fuchs et al. · Microelectronic Engineering | 4 Feb 2006 | 21 |
| 42 | Integration of Edge-Emitting Quantum Dot Lasers with Different Waveguide Platforms using Micro-Transfer Printing Ali Uzun, Fatih Bilge Atar, Simone Iadanza et al. · IEEE Journal of Selected Topics in Quantum Electronics | 2023 | 20 |
| 43 | 3D interconnect through aligned wafer level bonding Paul F. Lindner, Viorel Drăgoi, Thomas Glinsner et al. | 25 Jun 2003 | 20 |
| 44 | Investigation of Distortion in Wafer-to-wafer Bonding with Highly Bowed Wafers Shuo Kang, Serena Iacovo, Koen D’havé et al. | 28 May 2024 | 19 |
| 45 | Plasma Activated Wafer Bonding of Silicon: In Situ and Ex Situ Processes Viorel Drăgoi, Paul F. Lindner · ECS Transactions | 20 Oct 2006 | 19 |
| 46 | 200 nm Wafer-to-wafer overlay accuracy in wafer level Cu/SiO2 hybrid bonding for BSI CIS Bernhard Rebhan, M. Bernauer, Thomas Wagenleitner et al. | Dec 2015 | 19 |
| 47 | 3D Die-to-wafer Cu/Sn Microconnects Formed Simultaneously with an Adhesive Dielectric Bond Using Thermal Compression Bonding Scott Pozder, Ankur Jain, Ritwik Chatterjee et al. | Jun 2008 | 19 |
| 48 | Influence of the acetic acid concentration on the growth of zinc oxide thin films prepared by spray pyrolysis of aqueous solutions Stefan Edinger, Justyna Bekacz, Moses Richter et al. · Thin Solid Films | 18 Apr 2015 | 19 |
| 49 | Analytical methods used for low temperature Cu–Cu wafer bonding process evaluation Bernhard Rebhan, Sajjad Tollabimazraehno, Günter Hesser et al. · Microsystem Technologies | 10 Feb 2015 | 19 |
| 50 | Micro-transfer printing InP C-band SOAs on advanced silicon photonics platform for lossless MZI switch fabrics and high-speed integrated transmitters Jing Zhang, Laurens Bogaert, Clemens J. Krückel et al. · Optics Express | 26 Oct 2023 | 18 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.