Institution · Multibeam (United States)
Most cited papers from Multibeam (United States)
What are the most cited papers from Multibeam (United States)?
The most cited paper from Multibeam (United States) is "E-beam to complement optical lithography for 1D layouts" (David K. Lam, Enden D. Liu, Michael C. Smayling et al., 2011), with 36 citations. Next come "Practical laser-activated photoemissive electron source" (19) and "Optimization of e-beam landing energy for EBDW" (17).
Showing 18 of 18 papers. Every paper is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | E-beam to complement optical lithography for 1D layouts David K. Lam, Enden D. Liu, Michael C. Smayling et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Mar 2011 | 36 |
| 2 | Practical laser-activated photoemissive electron source Chunghsin Lee, PETER E. OETTINGER, Alan P. Sliski et al. · Review of Scientific Instruments | Apr 1985 | 19 |
| 3 | Optimization of e-beam landing energy for EBDW Enden D. Liu, Ted A. Prescop · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Mar 2011 | 17 |
| 4 | E-beam direct write (EBDW) as complementary lithography David K. Lam, Dave Liu, Ted A. Prescop · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 28 Sep 2010 | 17 |
| 5 | Multiple columns for high-throughput complementary e-beam lithography (CEBL) Enden D. Liu, Cong Tran, Ted A. Prescop et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | Mar 2012 | 8 |
| 6 | Multiple column high-throughput e-beam inspection (EBI) David K. Lam, Kevin M. Monahan, Enden D. Liu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 29 Mar 2012 | 6 |
| 7 | Lithography Mark O. Neisser, Harry Levinson, Stefan Wurm et al. | Nov 2021 | 5 |
| 8 | Shaped beam technique using a novel 3rd-order imaging approach Tadashi Kotsugi, Takashi Fuse, Hidetoshi Kinoshita et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 6 Mar 2008 | 5 |
| 9 | Full-wafer, maskless patterning with sub-50nm resolution and large depth-of-focus enabled by multicolumn electron beam lithography Andrew C. Ceballos, Kenneth P. MacWilliams, Ted A. Prescop et al. | 24 Feb 2024 | 4 |
| 10 | Simulation of robustness of a new e-beam column with the 3rd-order imaging technique K. Takeya, Takashi Fuse, Hidetoshi Kinoshita et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 6 Mar 2008 | 4 |
| 11 | Analysis of multibeam's scalable column for complementary e-beam lithography (CEBL) Enden D. Liu, Cong Tran, Ted A. Prescop et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | Mar 2012 | 4 |
| 12 | Charting CEBL's role in mainstream semiconductor lithography David K. Lam · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 9 Sep 2013 | 4 |
| 13 | Use of E-Beam Lithography to Optimize Lithography Patterning on SiC Wafers K. Chen, Zhuowen Feng, S. Williams et al. · IEEE Transactions on Semiconductor Manufacturing | 9 Sep 2025 | 2 |
| 14 | Transcending the Reticle Limit in On-Wafer Die Integration and Advanced Packaging: Full-Wafer Patterning with High-Productivity Electron Beam Lithography Tsenguun Byambadorj, Andrew C. Ceballos, Kenneth P. MacWilliams et al. | 28 May 2024 | 2 |
| 15 | Multicolumn e-beam lithography (MEBL) for IC traceability: MEBL enables chip ID to thwart tampering/counterfeiting David K. Lam | 31 Mar 2020 | 2 |
| 16 | Formation ofWell-defined Nanocolumns by Ion Tracking Lithography Thomas E. Felter, Ronald G. Musket, John M. Macaulay et al. · MRS Proceedings | 2003 | 1 |
| 17 | Enabling Next-Generation Space Systems with High Productivity Electron Beam Lithography Kenneth P. MacWilliams, David K. Lam, Ted A. Prescop et al. · ASCEND 2022 | 15 Oct 2022 | 0 |
| 18 | Image contrast of line-cut / contact hole features in Complementary E-Beam Lithography (CEBL) Enden D. Liu, Cong Tran, David K. Lam et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 26 Mar 2013 | 0 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.