Institution · Nova Measuring Instruments (Israel)
Most cited papers from Nova Measuring Instruments (Israel)
What are the most cited papers from Nova Measuring Instruments (Israel)?
The most cited paper from Nova Measuring Instruments (Israel) is "A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM" (Alok Vaid, Bin Bin Yan, Yun Tao Jiang et al., 2011), with 66 citations. Next come "An Immunohistochemical Study of the Secretory Immune System in Human Fetal Membranes and Decidua of the First Trimester of Pregnancy" (24) and "Line edge roughness detection using deep UV light scatterometry" (24).
Showing 50 of 65 papers. Every paper with more than 2 citations is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM Alok Vaid, Bin Bin Yan, Yun Tao Jiang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Mar 2011 | 66 |
| 2 | An Immunohistochemical Study of the Secretory Immune System in Human Fetal Membranes and Decidua of the First Trimester of Pregnancy Pavel Leonidovich Gurevich, Asher Elhayany, Herzl Ben‐Hur et al. · American Journal of Reproductive Immunology | 16 Jun 2003 | 24 |
| 3 | Line edge roughness detection using deep UV light scatterometry Barak Yaakobovitz, Yoel Cohen, Yoed Tsur · Microelectronic Engineering | 23 Dec 2006 | 24 |
| 4 | New Method of Measuring Linear Dichroism in the Ultraviolet: Application to Helical Polymers Joseph H. Jaffé, Halina Jaffe, Kurt Rosenheck · Review of Scientific Instruments | Jul 1967 | 24 |
| 5 | Hybrid metrology: from the lab into the fab Alok Vaid, Alexander Elia, Givantha Iddawela et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 6 Nov 2014 | 18 |
| 6 | Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement Daniel Schmidt, Aron J. Cepler, Curtis Durfee et al. · IEEE Transactions on Semiconductor Manufacturing | 19 Apr 2022 | 17 |
| 7 | Electrical test prediction using hybrid metrology and machine learning John G. Gaudiello, Susan Emans, Michael A. Shifrin et al. | 12 Apr 2017 | 17 |
| 8 | Hybrid metrology solution for 1X node technology Alok Vaid, Alexander Elia, Mark Kelling et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 29 Mar 2012 | 17 |
| 9 | Implementation of hybrid metrology at HVM fab for 20nm and beyond Alok Vaid, Lokesh Subramany, Givantha Iddawela et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 10 Apr 2013 | 15 |
| 10 | Epitalon and colon carcinogenesis in rats: Proliferative activity and apoptosis in colon tumors and mucosa George Kossoy, Judit Zandbank, Eugenie Tendler et al. · International Journal of Molecular Medicine | Oct 2003 | 13 |
| 11 | OCD enhanced: implementation and validation of spectral interferometry for nanosheet inner spacer indentation Daniel F. Schmidt, Curtis Durfee, Shanti Pancharatnam et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV | 19 Feb 2021 | 11 |
| 12 | Machine learning for predictive electrical performance using OCD Sayantan Das, Joey Hung, Sandip Halder et al. | 26 Mar 2019 | 11 |
| 13 | Impact of shrinking measurement error budgets on qualification metrology sampling and cost Matthew J. Sendelbach, Niv Sarig, Koichi Wakamoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 2 Apr 2014 | 11 |
| 14 | Automatic defect classification system for semiconductor wafers Rivi Sherman, Ehud Tirosh, Zeev Smilansky · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 6 May 1993 | 11 |
| 15 | Hybrid approach to optical CD metrology of directed self-assembly lithography Stéphane Godny, Masafumi Asano, Akiko Kawamoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 10 Apr 2013 | 11 |
| 16 | Machine learning and hybrid metrology using scatterometry and LE-XRF to detect voids in copper lines Dexin Kong, Koichi Motoyama, Abraham Arceo de la Peña et al. | 26 Mar 2019 | 10 |
| 17 | Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference Taher Kagalwala, Alok Vaid, Sridhar Mahendrakar et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 25 Oct 2016 | 10 |
| 18 | Product-driven material characterization for improved scatterometry time-to-solution Alok Vaid, Carsten Hartig, Matthew J. Sendelbach et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 13 Mar 2009 | 9 |
| 19 | Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA) Raja Muthinti, Nicolas J. Loubet, Robin Chao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 29 Mar 2016 | 8 |
| 20 | In-line Raman spectroscopy for gate-all-around nanosheet device manufacturing Daniel J. Schmidt, Curtis Durfee, Jun‐Tao Li et al. · Journal of Micro/Nanopatterning Materials and Metrology | 27 Jan 2022 | 7 |
| 21 | Measuring local CD uniformity in EUV vias with scatterometry and machine learning Dexin Kong, Daniel J. Schmidt, Jennifer Church et al. | 24 Mar 2020 | 7 |
| 22 | A holistic metrology sensitivity study for pattern roughness quantification on EUV patterned device structures with mask design induced roughness Kurt G. Ronse, B. Kutrzeba-Kotowska, Gaoliang Dai et al. | 19 Mar 2018 | 7 |
| 23 | Scatterometry-based metrology for SAQP pitch walking using virtual reference Taher Kagalwala, Alok Vaid, Sridhar Mahendrakar et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 24 Mar 2016 | 7 |
| 24 | A novel method for pushing the limits of line edge roughness detection by scatterometry Yoel Cohen, Barak Yaakobovitz, Yoed Tsur et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 5 Mar 2008 | 7 |
| 25 | Scatterometry-based defect detection for DSA in-line process control Robin Chao, Chi‐Chun Liu, Cornel Bozdog et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 19 Mar 2015 | 7 |
| 26 | Application of optical CD metrology for alternative lithography Masafumi Asano, Akiko Kawamoto, Kazuto Matsuki et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 10 Apr 2013 | 7 |
| 27 | 300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition Jan‐Willem J. Clerix, L. Warad, J. Hung et al. · Applied Surface Science | 10 Apr 2023 | 6 |
| 28 | Spectral interferometry for fully integrated device metrology Daniel F. Schmidt, Manasa Medikonda, Michael Rizzolo et al. · Journal of Micro/Nanopatterning Materials and Metrology | 21 Feb 2023 | 6 |
| 29 | Spectroscopy: a new route towards critical-dimension metrology of the cavity etch of nanosheet transistors Janusz Bogdanowicz, Yusuke Oniki, Karine Kenis et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV | 19 Feb 2021 | 6 |
| 30 | In-line characterization of non-selective SiGe nodule defects with scatterometry enabled by machine learning Dexin Kong, Robinhsinkuo Chao, Mary A. Breton et al. | 19 Mar 2018 | 6 |
| 31 | Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control Anil Gunay-Demirkol, Efrain Altamirano Sánchez, Stephane Heraud et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 24 Mar 2016 | 6 |
| 32 | Hybrid metrology universal engine: co-optimization Alok Vaid, Carmen Osorio, Jamie Tsai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 2 Apr 2014 | 6 |
| 33 | Improved scatterometry time-to-solution using virtual reference Alok Vaid, Givantha Iddawela, Jamie Tsai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 19 Mar 2015 | 6 |
| 34 | CD metrology for EUV lithography and etch Hayley Johanesen, Anne Kenslea, Mark Williamson et al. | May 2015 | 6 |
| 35 | Advanced EUV Resist Characterization using Scatterometry and Machine Learning Daniel J. Schmidt, Karen E. Petrillo, Mary A. Breton et al. | 10 May 2021 | 5 |
| 36 | In-line Raman spectroscopy for stacked nanosheet device manufacturing Daniel J. Schmidt, Curtis Durfee, Jun‐Tao Li et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV | 19 Feb 2021 | 5 |
| 37 | Advanced machine learning eco-system to address HVM optical metrology requirements Padraig R. Timoney, Roma Luthra, Alex Elia et al. | 20 Mar 2020 | 5 |
| 38 | Application of scatterometry-based machine learning to control multiple electron beam lithography: AM: Advanced metrology Nivea Figueiró, Francisco Sanchez, Roy Koret et al. | Apr 2018 | 5 |
| 39 | Advanced in-line metrology strategy for self-aligned quadruple patterning Robin Chao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 30 Mar 2016 | 5 |
| 40 | Ablative flashlamps for high peak power dye lasers Yoann Lévy, G Neumann, D. Treves · Applied Optics | Aug 1977 | 5 |
| 41 | Effect of measurement error budgets and hybrid metrology on qualification metrology sampling Matthew J. Sendelbach, Niv Sarig, Koichi Wakamoto et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 19 Dec 2014 | 5 |
| 42 | LER detection using dark field spectroscopic reflectometry Boaz Brill, S. Gov, Dani Hak et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 11 Mar 2010 | 5 |
| 43 | Scatterometry and AFM measurement combination for area selective deposition process characterization Mohamed Saib, Alain Moussa, Anne-Laure Charley et al. | 26 Mar 2019 | 4 |
| 44 | Implementation of machine learning for high-volume manufacturing metrology challenges (Conference Presentation) Padraig R. Timoney, Taher Kagalwala, Edward Reis et al. | 19 Mar 2018 | 4 |
| 45 | Materials characterization for process integration of multi-channel gate all around (GAA) devices Gangadhara Raja Muthinti, Nicolas J. Loubet, Robin Chao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 31 Mar 2017 | 4 |
| 46 | Scatterometry control for multiple electron beam lithography Yoann Blancquaert, Nivea Figueiró, Thibault Labbaye et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 28 Mar 2017 | 4 |
| 47 | Measurement of a very high displacement sensitivity of the beat frequency in an He-Ne laser M. Weksler, Z. Vager, G Neumann · IEEE Journal of Quantum Electronics | Jul 1980 | 4 |
| 48 | Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension Alok Vaid, Carmen Osorio, Jamie Tsai et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 8 Dec 2014 | 4 |
| 49 | Scatterometry: interpretation by different methods of electromagnetic simulation V. Sh. Machavariani, Shahar Garber, Yoel Cohen · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | Jul 2002 | 4 |
| 50 | Scatterometry Application on Cu/SiCN Surface Topography Towards High Volume Manufacturing Soon Aik Chew, Joey Hung, Igor Turovets et al. | 11 Sep 2024 | 3 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.