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Development of high-performance zinc-ion batteries: Issues, mitigation strategies, and perspectives
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20 Jun 2023 |
85 |
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Developing practical solid-state rechargeable Li-ion batteries: Concepts, challenges, and improvement strategies
Teddy Mageto, Sanket D. Bhoyate, Felipe Martins de Souza et al. · Journal of Energy Storage
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20 Sep 2022 |
51 |
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Feeding high amounts of almond hulls to lactating cows
K.L. Swanson, H.M. Bill, J. Asmus et al. · Journal of Dairy Science
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10 May 2021 |
39 |
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Nutritional composition of almond hulls
E.J. DePeters, K.L. Swanson, H.M. Bill et al. · Applied Animal Science
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Dec 2020 |
38 |
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Controlling the broadband enhanced light chirality with L-shaped dielectric metamaterials
Ufuk Kılıç, Matthew Hilfiker, Shawn Wimer et al. · Nature Communications
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4 May 2024 |
32 |
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Hydrogen effects on the thermal conductivity of delocalized vibrational modes in amorphous silicon nitride ( a − SiN x : H )
Jeffrey L. Braun, Sean W. King, Eric R. Hoglund et al. · Physical Review Materials
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23 Mar 2021 |
27 |
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Solvent-assisted sulfur vacancy engineering method in MoS 2 for a neuromorphic synaptic memristor
Jiyeon Kim, Changik Im, Chan Young Lee et al. · Nanoscale Horizons
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2023 |
24 |
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Efficient pump-probe sampling with a single-cavity dual-comb laser: Application in ultrafast photoacoustics
Justinas Pupeikis, Weisheng Hu, Benjamin Willenberg et al. · Photoacoustics
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13 Dec 2022 |
23 |
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Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry
Madhulika S. Korde, Subhadeep Kal, Cheryl Alix et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
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Mar 2020 |
23 |
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MoTe2 Field-Effect Transistors with Low Contact Resistance through Phase Tuning by Laser Irradiation
Geun Yeol Bae, Jin Sung Kim, Junyoung Kim et al. · Nanomaterials
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22 Oct 2021 |
16 |
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Progress, challenges, and prospects with electrocatalyst (From transition metal oxides to dual-atom catalysts) for oxygen reduction reaction
Teddy Mageto, Sanket D. Bhoyate, Anuj Kumar et al. · Molecular Catalysis
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7 May 2024 |
13 |
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Metal−Organic Precursors for Transition‐Metal‐Doped Ni2P via Pyrolysis for Efficient Overall Water Splitting and Supercapacitance
Syabonga G. Sibiya, Gwaza Eric Ayom, Malik Dilshad Khan et al. · European Journal of Inorganic Chemistry
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7 Apr 2023 |
12 |
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Tomato seeds as a novel by-product feed for lactating dairy cows
C.A. Cassinerio, James G. Fadel, J. Asmus et al. · Journal of Dairy Science
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14 May 2015 |
12 |
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X-ray critical dimension metrology solution for high aspect ratio semiconductor structures
Matthew Wormington, Adam Ginsburg, Israel Reichental et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Conference paper |
19 Feb 2021 |
11 |
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Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
Shiva Mudide, Nick Keller, G. A. Antonelli et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
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2025 |
9 |
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High Aspect Ratio, High Resolution, and Broad Process Window Description of a Low Loss Photodielectric for 5G HS/HF Applications Using High and Low Numerical Aperture Photolithography Tools
Colin O. Hayes, Kevin Wang, Rosemary Bell et al.
Conference paper |
Jun 2020 |
9 |
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Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes
G. A. Antonelli, Nick Keller, Troy Ribaudo et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
Conference paper |
19 Feb 2021 |
8 |
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Nanocolumnar Metamaterial Platforms: Scaling Rules for Structural Parameters Revealed from Optical Anisotropy
Ufuk Kılıç, Yousra Traouli, Matthew Hilfiker et al. · Advanced Optical Materials
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31 Aug 2024 |
7 |
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Extremely Large Exposure Field With Fine Resolution Lithography Technology To Enable Next Generation Panel Level Advanced Packaging
John Chang, Timothy N. Chang, Casey Donaher et al.
Conference paper |
Jun 2021 |
7 |
| 21 |
Nano Horizons: Exploring the untapped power of two-Dimensional materials
Junyoung Kim, Anuj Kumar, Sanket D. Bhoyate et al. · Materials Science and Engineering B
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9 Sep 2024 |
6 |
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A new species of Trimma of the T. taylori species group (Teleostei: Gobiidae) from the Red Sea, Indian Ocean
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9 Oct 2023 |
6 |
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Adaptive Shot Technology To Address Severe Lithography Challenges For Advanced FOPLP
John Chang, Keith Best, Jian John Lu et al.
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Jun 2020 |
6 |
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Analysis of Pattern Distortion by Panel Deformation and Addressing it by Using Extremely Large Exposure Field Fine-Resolution Lithography
John Chang, Corey Shay, James Edric Alan Webb et al. · 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
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May 2022 |
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K.L. Swanson, H.M. Bill, J. Asmus et al. · The Journal of Agricultural Science
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Sep 2021 |
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Yield Prediction Technology a Game Changer for Cutting Costs and Reducing Ramp Time in FOPLP Lithography
John Chang, Keith Best, Jian John Lu et al.
Conference paper |
27 May 2025 |
4 |
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Overlay Challenges of Extremely Large Exposure Field, Fine Resolution Lithography Due to Alignment Solution Errors and a Solution Using Early Zone Corrections in Advanced IC Substrates
John Chang, Xing Song, Timothy N. Chang et al.
Conference paper |
28 May 2024 |
4 |
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Oct 2015 |
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Superlattice effects and limitations of non-destructive measurement of advanced Si/Si1−xGex superlattice structures using Mueller matrix scatterometry and high-resolution X-ray diffraction
Ezra Mel B. Pasikatan, G. A. Antonelli, Nicholas A. Keller et al. · Journal of Micro/Nanopatterning Materials and Metrology
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6 Nov 2024 |
3 |
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Characteristic Mueller matrix responses and correlation analysis for vertical GAA nanowire structure manufacturing using RCWA simulated spectra
Colin Wadsworth, Ezra Mel B. Pasikatan, Nick Keller et al.
Conference paper |
18 Apr 2023 |
3 |
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Novel inline on-device measurement of silicon nitride lateral recess post channel hole etch with IRCD metrology
Nicholas A. Keller, Wenmei Ming, Zhuo Chen et al. · Metrology, Inspection, and Process Control XXXVI
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26 May 2022 |
3 |
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Non-destructive measurement of bottom width in deep trench isolation structures using IRCD metrology
Nick Keller, Marc Poulingue, Ross Grynko et al.
Conference paper |
10 Apr 2024 |
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3D NAND Oxide/Nitride Tier Stack Thickness Measurements with Infrared Metrology
Youcheng Wang, Zhuo Chen, Cong Wang et al.
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May 2023 |
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Characterization of asymmetries in 3D NAND memory devices
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Decorrelation of optical critical dimensions in mid-infrared ellipsometric spectroscopy of high aspect ratio etch profiles
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4 Apr 2022 |
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Advanced Outlier Die Control Technology in Fan-Out Panel Level Packaging Using Feedforward Lithography
John Chang, Jian John Lu, Burhan Ali
Conference paper |
Jun 2021 |
2 |
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Scatterometry of nanowire/ nanosheet FETs for advanced technology nodes
Madhulika S. Korde, Subhadeep Kal, Cheryl Alix et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
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19 Feb 2021 |
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The Adoption of Machine Learning in the Measurement of Copper Contact on the Main Chip in Advanced 3D NAND Technology Nodes
Michael Meng, Albert P. Li, J. Andrew Zhang et al.
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From Pilot To HVM: A Practical Overlay Yield Prediction Workflow For FOPLP Lithography
John Chang, Jian Lu, Timothy Chang
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14 Apr 2026 |
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Frequency stabilization and referencing of a mid-infrared dual-comb spectrometer
Chu C. Teng, Yifeng Chen, Jie Liu et al. · Applied Physics B
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13 Feb 2026 |
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Non-destructive lateral cavity etch measurements of 8-superlattice layer nanowire test structures using optical Mueller matrix spectroscopic ellipsometry, x-ray diffraction, and x-ray fluorescence
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27 Oct 2025 |
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Advanced Post Overlay Compensation for Enhanced Lithography Overlay Accuracy for Next-Generation AICS Packaging
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15 Apr 2025 |
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3-D NAND Oxide/Nitride Tier Stack Thickness and Zonal Measurements With Infrared Metrology
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3 Jun 2024 |
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Superlattice effects and limitations of non-destructive measurement of advanced Si/Si(1-x)Ge(x) superlattice structures using Mueller matrix scatterometry (MMSE) and high-resolution x-ray diffraction (XRD)
Ezra Mel B. Pasikatan, G. A. Antonelli, Nicholas A. Keller et al.
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10 Apr 2024 |
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23 Feb 2024 |
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Applications of Picosecond Laser Acoustics to Power Semiconductor Device: IGBT and MOSFET
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In situ spectroscopic ellipsometry and rigorous coupled wave analysis for real time profile evolution of atomic layer deposited films inside SiO2 nanotrenches
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Methods to overcome limited labeled data sets in machine learning-based optical critical dimension metrology
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19 Feb 2021 |
1 |