Institution · Plasma (Macedonia)
Most cited papers from Plasma (Macedonia)
What are the most cited papers from Plasma (Macedonia)?
The most cited paper from Plasma (Macedonia) is "Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells" (Gijs Dingemans, W. M. M. Kessels, 2012), with 808 citations. Next come "Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3" (728) and "On OH production in water containing atmospheric pressure plasmas" (298).
Showing 50 of 60 papers. Every paper with more than 30 citations is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells Gijs Dingemans, W. M. M. Kessels · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | Jul 2012 | 808 |
| 2 | Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3 Bram Hoex, S. B. S. Heil, Erik Langereis et al. · Applied Physics Letters | 24 Jul 2006 | 728 |
| 3 | On OH production in water containing atmospheric pressure plasmas Peter Bruggeman, D.C. Schram · Plasma Sources Science and Technology | 23 Jul 2010 | 298 |
| 4 | In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition Erik Langereis, S. B. S. Heil, Harm C. M. Knoops et al. · Journal of Physics D Applied Physics | 13 Mar 2009 | 296 |
| 5 | Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers Erik Langereis, Mariadriana Creatore, S. B. S. Heil et al. · Applied Physics Letters | 21 Aug 2006 | 269 |
| 6 | Understanding Randomness and its Impact on Student Learning: Lessons Learned from Building the Biology Concept Inventory (BCI) Kathy Garvin-Doxas, Michael W. Klymkowsky · CBE—Life Sciences Education | Jun 2008 | 220 |
| 7 | Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition Gijs Dingemans, N. M. Terlinden, Marcel A. Verheijen et al. · Journal of Applied Physics | Nov 2011 | 170 |
| 8 | Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3] Gijs Dingemans, N. M. Terlinden, Dieter Pierreux et al. · Electrochemical and Solid-State Letters | 21 Oct 2010 | 164 |
| 9 | Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties Gijs Dingemans, Cristian A. A. van Helvoirt, Dieter Pierreux et al. · Journal of The Electrochemical Society | 2012 | 147 |
| 10 | Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma Martijn F. J. Vos, Bart Macco, Nick F. W. Thissen et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 9 Sep 2015 | 138 |
| 11 | Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy W. M. M. Kessels, Harm C. M. Knoops, S. A. F. Dielissen et al. · Applied Physics Letters | 6 Jul 2009 | 133 |
| 12 | Atomic layer deposition for nanostructured Li-ion batteries Harm C. M. Knoops, Merijn E. Donders, M. C. M. van de Sanden et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 21 Nov 2011 | 131 |
| 13 | Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum Adriaan J. M. Mackus, Noémi Leick, Layton Baker et al. · Chemistry of Materials | 17 Apr 2012 | 128 |
| 14 | Photoelectrochemical Hydrogen Production on InP Nanowire Arrays with Molybdenum Sulfide Electrocatalysts Lu Gao, Yingchao Cui, Jia Wang et al. · Nano Letters | 29 May 2014 | 118 |
| 15 | In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition Erik Langereis, S. B. S. Heil, M. C. M. van de Sanden et al. · Journal of Applied Physics | 15 Jul 2006 | 112 |
| 16 | Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3 S. B. S. Heil, J. Leo van Hemmen, M. C. M. van de Sanden et al. · Journal of Applied Physics | 15 May 2008 | 112 |
| 17 | Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection Stephen E. Potts, Lilia Schmalz, M. Fenker et al. · Journal of The Electrochemical Society | 2011 | 111 |
| 18 | Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth Harald Benjamin Profijt, M. C. M. van de Sanden, W. M. M. Kessels · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 4 Oct 2012 | 111 |
| 19 | Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide Vikrant R. Rai, Vincent Vandalon, Sumit Agarwal · Langmuir | 20 Jul 2010 | 111 |
| 20 | In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3 S. B. S. Heil, Pavel Kudláček, Erik Langereis et al. · Applied Physics Letters | 25 Sep 2006 | 105 |
| 21 | Enhanced Doping Efficiency of Al-Doped ZnO by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide as an Alternative Aluminum Precursor Yizhi Wu, Stephen E. Potts, P. M. Hermkens et al. · Chemistry of Materials | 6 Nov 2013 | 95 |
| 22 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties Tahsin Faraz, Karsten Arts, Saurabh Karwal et al. · Plasma Sources Science and Technology | 21 Nov 2018 | 93 |
| 23 | Detailed study of the plasma-activated catalytic generation of ammonia in N2-H2 plasmas Jean-Pierre H. van Helden, Wiebe Wagemans, G Göksel Yagci et al. · Journal of Applied Physics | 15 Feb 2007 | 91 |
| 24 | Building, Using, and Maximizing the Impact of Concept Inventories in the Biological Sciences: Report on a National Science Foundation–sponsored Conference on the Construction of Concept Inventories in the Biological Sciences Kathy Garvin-Doxas, Michael W. Klymkowsky, Susan L. Elrod · CBE—Life Sciences Education | Dec 2007 | 89 |
| 25 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides Harald Benjamin Profijt, Pavel Kudláček, M. C. M. van de Sanden et al. · Journal of The Electrochemical Society | 2011 | 82 |
| 26 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films ME Merijn Donders, Harm C. M. Knoops, M. C. M. van de Sanden et al. · Journal of The Electrochemical Society | 2011 | 81 |
| 27 | In situ spectroscopic ellipsometry growth studies on the Al-doped ZnO films deposited by remote plasma-enhanced metalorganic chemical vapor deposition I. Volintiru, Mariadriana Creatore, M. C. M. van de Sanden · Journal of Applied Physics | Feb 2008 | 81 |
| 28 | Numerical description of discharge characteristics of the plasma needle W.J.M. Brok, Mark D. Bowden, Jan van Dijk et al. · Journal of Applied Physics | Jul 2005 | 81 |
| 29 | Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition Erik Langereis, Harm C. M. Knoops, Adriaan J. M. Mackus et al. · Journal of Applied Physics | 15 Oct 2007 | 80 |
| 30 | B-spline parametrization of the dielectric function applied to spectroscopic ellipsometry on amorphous carbon J. W. Weber, T. A. R. Hansen, M. C. M. van de Sanden et al. · Journal of Applied Physics | 15 Dec 2009 | 75 |
| 31 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes Adriaan J. M. Mackus, S. B. S. Heil, Erik Langereis et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 18 Dec 2009 | 75 |
| 32 | The Joint European Torus Filippo Sartori, G. De Tommasi, Fabio Piccolo · IEEE Control Systems | Apr 2006 | 75 |
| 33 | Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas Matthieu J. Weber, Adriaan J. M. Mackus, Marcel A. Verheijen et al. · The Journal of Physical Chemistry C | 2 Apr 2014 | 70 |
| 34 | Fully Plastic Dye Solar Cell Devices by Low‐Temperature UV‐Irradiation of both the Mesoporous TiO2 Photo‐ and Platinized Counter‐Electrodes Valerio Zardetto, Francesco Di Giacomo, Diana Garcia‐Alonso et al. · Advanced Energy Materials | 7 Jun 2013 | 69 |
| 35 | Film growth precursors in a remote SiH4 plasma used for high-rate deposition of hydrogenated amorphous silicon W. M. M. Kessels, M. C. M. van de Sanden, Daniel C. Schram · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | Sep 2000 | 69 |
| 36 | Influence of the SiO2 interlayer thickness on the density and polarity of charges in Si/SiO2/Al2O3 stacks as studied by optical second-harmonic generation N. M. Terlinden, Gijs Dingemans, Vincent Vandalon et al. · Journal of Applied Physics | 16 Jan 2014 | 68 |
| 37 | Adiabatic formation of Rydberg crystals with chirped laser pulses Rick van Bijnen, Sjoerd Smit, K. A. H. van Leeuwen et al. · Journal of Physics B Atomic Molecular and Optical Physics | 14 Sep 2011 | 66 |
| 38 | Temperature dependence of the surface roughness evolution during hydrogenated amorphous silicon film growth Arno H. M. Smets, W. M. M. Kessels, M. C. M. van de Sanden · Applied Physics Letters | 10 Feb 2003 | 66 |
| 39 | Kinetic study of CO 2 plasmas under non-equilibrium conditions. II. Input of vibrational energy Marija Grofulović, Tiago Silva, Bart Klarenaar et al. · Plasma Sources Science and Technology | 20 Aug 2018 | 65 |
| 40 | Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate J.W.A.M. Gielen, M. C. M. van de Sanden, D.C. Schram · Applied Physics Letters | 8 Jul 1996 | 61 |
| 41 | Exploring Crystal Phase Switching in GaP Nanowires Simone Assali, L. Gagliano, Douglas Soares de Oliveira et al. · Nano Letters | 5 Nov 2015 | 60 |
| 42 | Effect of substrate conditions on the plasma beam deposition of amorphous hydrogenated carbon J.W.A.M. Gielen, W. M. M. Kessels, M. C. M. van de Sanden et al. · Journal of Applied Physics | Sep 1997 | 59 |
| 43 | The theory of recursive functions, approaching its centennial Stephen C. Kleene · Bulletin of the American Mathematical Society | 1981 | 58 |
| 44 | Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2 Gijs Dingemans, Cristian van Helvoirt, M. C. M. van de Sanden et al. · ECS Transactions | 25 Apr 2011 | 57 |
| 45 | Toroidal and poloidal momentum transport studies in JET T. J. J. Tala et al. · Nuclear Fusion | Aug 2007 | 51 |
| 46 | High-rate plasma-deposited SiO2 films for surface passivation of crystalline silicon Bram Hoex, Floran J. J. Peeters, Mariadriana Creatore et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 7 Aug 2006 | 49 |
| 47 | Transport of ground-state hydrogen atoms in a plasma expansion Stéphane Mazouffre, Maarten G. H. Boogaarts, Isj Bakker et al. · Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics | 26 Jun 2001 | 46 |
| 48 | Characterization of plasma beam deposited amorphous hydrogenated silicon R. J. Severens, G. J. H. Brussaard, M. C. M. van de Sanden et al. · Applied Physics Letters | 24 Jul 1995 | 45 |
| 49 | Wetting properties of titanium oxides, oxynitrides and nitrides obtained by DC and pulsed magnetron sputtering and cathodic arc evaporation Božana Čolović, Danilo Kisić, Bojan Jokanović et al. · Materials Science-Poland | Jun 2019 | 44 |
| 50 | Plasma activation of N 2 , CH 4 and CO 2 : an assessment of the vibrational non-equilibrium time window Alex van de Steeg, Tom Butterworth, Dirk C. M. van den Bekerom et al. · Plasma Sources Science and Technology | 23 Sep 2020 | 42 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.