Institution · Synopsys (Belgium)
Most cited papers from Synopsys (Belgium)
What are the most cited papers from Synopsys (Belgium)?
The most cited paper from Synopsys (Belgium) is "Electrochemical oxidation of key pharmaceuticals using a boron doped diamond electrode" (Glenn Loos, Thomas Scheers, Kwinten Van Eyck et al., 2017), with 136 citations. Next come "Comprehensive analysis of the impact of single and arrays of through silicon vias induced stress on high-k / metal gate CMOS performance" (120) and "Multipotent Adult Progenitor Cells Enhance Recovery After Stroke by Modulating the Immune Response from the Spleen" (87).
Showing 50 of 58 papers. Every paper is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | Electrochemical oxidation of key pharmaceuticals using a boron doped diamond electrode Glenn Loos, Thomas Scheers, Kwinten Van Eyck et al. · Separation and Purification Technology | 6 Dec 2017 | 136 |
| 2 | Comprehensive analysis of the impact of single and arrays of through silicon vias induced stress on high-k / metal gate CMOS performance Abdelkarim Mercha et al. | Dec 2010 | 120 |
| 3 | Multipotent Adult Progenitor Cells Enhance Recovery After Stroke by Modulating the Immune Response from the Spleen Bing Yang, Jason A. Hamilton, Krystal S. Valenzuela et al. · Stem Cells | 6 Mar 2017 | 87 |
| 4 | Recent advances in technologies for removal and recovery of selenium from (waste)water: A systematic review Izba Ali, Vaibhav Shrivastava · Journal of Environmental Management | 9 Jun 2021 | 73 |
| 5 | Seroprevalence of SARS-CoV-2 significantly varies with age: Preliminary results from a mass population screening Gabriele Pagani, Federico Conti, Andrea Giacomelli et al. · Journal of Infection | 19 Sep 2020 | 64 |
| 6 | Repair of natural EUV reticle defects R. Jonckheere, T. Bret, Dieter Van den Heuvel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 6 Oct 2011 | 42 |
| 7 | Removal of miconazole from water by O3, UV/H2O2 and electrochemical advanced oxidation: Real-time process monitoring and degradation pathway elucidation Allisson Barros de Souza, Jörg Mielcke, Izba Ali et al. · Journal of environmental chemical engineering | 24 Apr 2023 | 35 |
| 8 | Calibration and verification of a stochastic model for EUV resist Weimin Gao, Alexander Philippou, Ulrich K. Klostermann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 15 Mar 2012 | 30 |
| 9 | Recent advances in carbonaceous catalyst design for the in situ production of H2O2 via two-electron oxygen reduction Izba Ali, Kwinten Van Eyck, Steven De Laet et al. · Chemosphere | 23 Aug 2022 | 24 |
| 10 | Computational insights on the role of structure-directing agents (SDAs) in the synthesis of zeolites Xiaomin Tang, Ömer Faruk Altundal, Frits F. D. Daeyaert et al. · Chemical Society Reviews | 2025 | 22 |
| 11 | Anodic oxidation of sulfamethoxazole paired to cathodic hydrogen peroxide production Izba Ali, Allisson Barros de Souza, Steven De Laet et al. · Chemosphere | 28 Jan 2023 | 20 |
| 12 | A 2.3mW 10-bit 170MS/s two-step binary-search assisted time-interleaved SAR ADC Si-Seng Wong, U-Fat Chio, Yan Zhu et al. | Sep 2012 | 18 |
| 13 | Treatment of antimicrobial azole compounds via photolysis, electrochemical and photoelectrochemical oxidation: Degradation kinetics and transformation products Izba Ali, Allisson Barros de Souza, Deirdre Cabooter et al. · Environmental Pollution | 17 Jul 2023 | 13 |
| 14 | Comprehensive two-dimensional liquid chromatography with high resolution mass spectrometry to investigate the photoelectrochemical degradation of environmentally relevant pharmaceuticals and their degradation products in water Allisson Barros de Souza, Izba Ali, Tom van de Goor et al. · Journal of Environmental Management | 4 Jan 2024 | 12 |
| 15 | Degradation of 4-Chlorophenol by Microwave-Enhanced Advanced Oxidation Processes: Kinetics and Influential Process Parameters Hannah Milh, Kwinten Van Eyck, Raf Dewil · Water | 28 Feb 2018 | 12 |
| 16 | Improving the removal of losartan, irbesartan and their transformation products through in situ produced hydrogen peroxide in electrochemical oxidation processes Izba Ali, Allisson Barros de Souza, Zhongda Liu et al. · Journal of Water Process Engineering | 16 Aug 2023 | 10 |
| 17 | Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison Weimin Gao, Vincent I. Wiaux, W Hoppe et al. | 19 Mar 2018 | 10 |
| 18 | Parallel paradigms and run-time management techniques for many-core architectures: The 2PARMA approach Cristina Silvano et al. | Jul 2011 | 10 |
| 19 | Experimental validation of rigorous, 3D profile models for negative-tone develop resists Weimin Gao, Ulrich K. Klostermann, Itaru Kamohara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 31 Mar 2014 | 10 |
| 20 | Predicting Residual Adsorbable Organic Halides Concentrations in Industrial Wastewater Using Typical Wastewater Parameters Hannah Milh, Kwinten Van Eyck, Bert Bastiaens et al. · Water | 9 Jun 2020 | 7 |
| 21 | Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance Weimin Gao, Víctor Blanco, Vicky Philipsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 24 Mar 2017 | 7 |
| 22 | A fast triple patterning solution with fix guidance Weiping Fang, Srini Arikati, Erdem Cilingir et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 28 Mar 2014 | 7 |
| 23 | Rigorous assessment of patterning solution of metal layer in 7 nm technology node Weimin Gao, Ivan Ciofi, Yves Saad et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 19 Feb 2016 | 6 |
| 24 | Study of CD variation caused by the black border effect and out-of-band radiation in extreme ultraviolet lithography Weimin Gao, Ardavan Niroomand, Gian Francesco Lorusso et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 7 May 2014 | 6 |
| 25 | EUV modeling accuracy and integration requirements for the 16nm node Lena V. Zavyalova, Irene Su, Stephen Jang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 11 Mar 2010 | 6 |
| 26 | Generative AI on a Budget: Processing Transformer- based Neural Networks at the Edge Yankin Tanurhan, Peter Paulin, T. Michiels | 9 Dec 2023 | 5 |
| 27 | Combined resist and etch modeling and correction for the 45-nm node Martin Drapeau, Dan Beale · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 6 Oct 2006 | 5 |
| 28 | Optimized Communication Architecture of MPSoCs with a Hardware Scheduler Diandian Zhang, Han Zhang, Jerónimo Castrillón et al. · International Journal of Embedded and Real-Time Communication Systems | Jul 2011 | 5 |
| 29 | ASIP Exploration and Design Jari Kreku, Kari Tiensyrjä, Andreas Wieferink et al. | 13 Sep 2011 | 5 |
| 30 | 2PARMA: Parallel Paradigms and Run-time Management Techniques for Many-Core Architectures Cristina Silvano et al. · Lecture notes in electrical engineering | 2011 | 4 |
| 31 | Impact of EUV mask absorber sidewall angle on patterning robustness Lawrence S. Melvin, Yudhishthir Kandel, Tim Fuehner et al. | 19 Mar 2018 | 4 |
| 32 | Extending the Gate-All-Around (GAA) Era to the A10 Node: Outer Wall Forksheet Enabling Full Channel Strain and Superior Gate Control Lynn Verschueren, Geert Eneman, Sheng Hsiung Yang et al. | 8 Jun 2025 | 3 |
| 33 | Disruptive C-band Corrugated Horn Antenna in Additive Manufacturing Laura Foucaud, Erwan Cartaillac, Florent Lebrun et al. | 26 Mar 2023 | 3 |
| 34 | Experimental validation of stochastic modeling for negative-tone develop EUV resists Itaru Kamohara, Weimin Gao, Ulrich K. Klostermann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 19 Mar 2015 | 3 |
| 35 | A 10-bit SAR ADC with two redundant decisions and splitted-MSB-cap DAC array Wen-Lan Wu, Sai‐Weng Sin, U Seng‐Pan et al. | Dec 2012 | 3 |
| 36 | Patterning process exploration of metal 1 layer in 7nm node with 3D patterning flow simulations Weimin Gao, Ivan Ciofi, Yves Saad et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 18 Mar 2015 | 3 |
| 37 | Mapping Optimisation for Scalable Multi-core ARchiTecture: The MOSART Approach B. Candaele et al. | Jul 2010 | 3 |
| 38 | Efficient Implementation of Application-Aware Spinlock Control in MPSoCs Diandian Zhang, Li Lu, Jerónimo Castrillón et al. · International Journal of Embedded and Real-Time Communication Systems | 2013 | 3 |
| 39 | Resist and etch modeling for the 45nm node Martin Drapeau, Dan Beale · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 4 May 2006 | 3 |
| 40 | Designing Primary Care Ecosystems in Belgium: Early Reflections Ezra Dessers, Mieke Van Gramberen | 2019 | 2 |
| 41 | Parallel paradigms and run-time management techniques for many-core architectures Cristina Silvano et al. | 24 Jan 2012 | 2 |
| 42 | Simulation study of CD variation caused by field edge effects and out-of-band radiation in EUVL Weimin Gao, Ardavan Niroomand, Gian Francesco Lorusso et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | Oct 2013 | 2 |
| 43 | Binary modeling method to check the sub-resolution assist features (SRAFs) printability Jianliang Li, Weimin Gao, Yongfa Fan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 21 Feb 2012 | 2 |
| 44 | Invited paper: Parallel programming and run-time resource management framework for many-core platforms: The 2PARMA approach Cristina Silvano et al. | Jun 2011 | 2 |
| 45 | The MOSART Mapping Optimization for Multi-Core ARchiTectures B. Candaele et al. · Lecture notes in electrical engineering | 2011 | 2 |
| 46 | Machine learning enhanced optical proximity correction modeling for high-NA EUV lithography Chih-I Wei, Zachary A. Levinson, Philip C. W. Ng et al. | 10 Apr 2026 | 1 |
| 47 | Prediction of EUV stochastic microbridge probabilities by lithography simulations Erik A. Verduijn, Ulrich Welling, Jiuzhou Tang et al. | 23 Mar 2020 | 1 |
| 48 | Impact of EUV absorber variations on wafer patterning Lawrence S. Melvin, Yudhishthir Kandel, Tim Fühner et al. | 14 Mar 2019 | 1 |
| 49 | Extreme ultraviolet mask multilayer material variation impact on horizontal to vertical pattern bias Qiliang Yan, Lawrence S. Melvin, Yudhishthir Kandel et al. | 19 Mar 2018 | 1 |
| 50 | OPC model enhancement using parameter sensitivity methodology Brian S. Ward, Martin Drapeau · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 19 May 2008 | 1 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.