C. Lustig
C. Lustig publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Nuclear and High Energy Physics, on topics such as Plasma Diagnostics and Applications, Magnetic properties of thin films and Particle accelerators and beam dynamics.
- World rank
- #3,930,073 of 7,710,434 ranked researchers
- Rank in United States
- #1,075,923 of 1,627,098
- Works
- 71
- Citations
- 269
- Citations per work
- 3.8
What does C. Lustig research?
C. Lustig's work is mostly in Engineering (42%), Physics and Astronomy (22%), Materials Science (6%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences5070.5%
- Engineering3042.3%
- Physics and Astronomy1521.8%
- Materials Science56.4%
- Everything else2129.5%
- 1Electrical and Electronic Engineering31% of their works
- 2Atomic and Molecular Physics, and Optics15% of their works
- 3Nuclear and High Energy Physics6% of their works
- 4Aerospace Engineering6% of their works
- 5Electronic, Optical and Magnetic Materials6% of their works
- 6Computational Mechanics5% of their works
Research topics
- Plasma Diagnostics and Applications
- Magnetic properties of thin films
- Particle accelerators and beam dynamics
- Magnetic confinement fusion research
- Magnetic Field Sensors Techniques
- Plasma Applications and Diagnostics
- Bluetooth and Wireless Communication Technologies
- Surface Roughness and Optical Measurements
Which keywords describe C. Lustig's research?
The keywords of their largest research topics: Plasma Etching, Semiconductor Industry, Skyrmions, Spintronics, Negative Ion Sources, Superconducting Cavities, Tokamak and Turbulence.
- Wireless Technology
- Roughness Measurement
- Plasma Medicine
- Fluxgate Sensors
- Turbulence
- Superconducting Cavities
- Spintronics
- Semiconductor Industry
- Plasma Etching
- Skyrmions
- Negative Ion Sources
- Tokamak
- Atmospheric Pressure Plasmas
- Magnetic Sensors
- Bluetooth Low Energy
- Surface Characterization
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 16 words, with their numbers
- Plasma Etching131 topic
- Semiconductor Industry131 topic
- Skyrmions51 topic
- Spintronics51 topic
- Negative Ion Sources41 topic
- Superconducting Cavities41 topic
- Tokamak41 topic
- Turbulence41 topic
- Atmospheric Pressure Plasmas31 topic
- Fluxgate Sensors31 topic
- Magnetic Sensors31 topic
- Plasma Medicine31 topic
- Bluetooth Low Energy21 topic
- Roughness Measurement21 topic
- Surface Characterization21 topic
- Wireless Technology21 topic
Where does C. Lustig work?
C. Lustig's main affiliation in the publication record is RAND Corporation, United States.
How many publications and citations does C. Lustig have?
OpenAlex counts 71 works and 269 citations for C. Lustig, an h-index of 9, ranking #3,930,073 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
Discussion
Ask a question or share a note about C. Lustig. Posts are plain text and can be reported.