T. W. Haas
T. W. Haas publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics, on topics such as Electron and X-Ray Spectroscopy Techniques, Semiconductor materials and devices and Electronic and Structural Properties of Oxides.
- World rank
- #768,996 of 1,633,909 ranked researchers
- Rank in United States
- #223,206 of 358,040
- Works
- 17
- Citations
- 85
- Citations per work
- 5.0
What does T. W. Haas research?
Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.
- 1Electrical and Electronic Engineering29% of their works
- 2Materials Chemistry25% of their works
- 3Atomic and Molecular Physics, and Optics21% of their works
- 4Surfaces, Coatings and Films17% of their works
- 5Electrochemistry4% of their works
- 6Radiation4% of their works
Research topics
- Electron and X-Ray Spectroscopy Techniques
- Semiconductor materials and devices
- Electronic and Structural Properties of Oxides
- Semiconductor materials and interfaces
- Electrochemical Analysis and Applications
- Plasma Diagnostics and Applications
- Gas Sensing Nanomaterials and Sensors
- Chalcogenide Semiconductor Thin Films
Which keywords describe T. W. Haas's research?
The keywords of their largest research topics: Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Atomic Layer Deposition, High-k Dielectrics, Metal-Semiconductor Contacts, Oxide Interfaces, Schottky Barrier and Two-Dimensional Electron Gases.
- Thin-Film Solar Cells
- Plasma Etching
- Gas Sensors
- Efficiency
- Two-Dimensional Electron Gases
- Oxide Interfaces
- High-k Dielectrics
- X-ray Photoelectron Spectroscopy
- Scanning Electron Microscopy
- Atomic Layer Deposition
- Metal-Semiconductor Contacts
- Schottky Barrier
- Detection
- Electrochemical
- Metal Oxide
- Semiconductor Industry
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 16 words, with their numbers
- Scanning Electron Microscopy41 topic
- X-ray Photoelectron Spectroscopy41 topic
- Atomic Layer Deposition31 topic
- High-k Dielectrics31 topic
- Metal-Semiconductor Contacts21 topic
- Oxide Interfaces21 topic
- Schottky Barrier21 topic
- Two-Dimensional Electron Gases21 topic
- Detection11 topic
- Efficiency11 topic
- Electrochemical11 topic
- Gas Sensors11 topic
- Metal Oxide11 topic
- Plasma Etching11 topic
- Semiconductor Industry11 topic
- Thin-Film Solar Cells11 topic
Where does T. W. Haas work?
T. W. Haas's main affiliation in the publication record is Wright-Patterson Air Force Base, United States.
How many publications and citations does T. W. Haas have?
Science Explorer counts 17 works and 85 citations for T. W. Haas, ranking #768,996 of 1,633,909 researchers worldwide on the composite score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.