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Researcher · AT&T (United States) · United States

William R. Knolle

William R. Knolle publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Ceramics and Composites, on topics such as Semiconductor materials and devices, Thin-Film Transistor Technologies and Silicon Nanostructures and Photoluminescence.

OpenAlex
World rank
#5,837,997
of 7,710,434 ranked researchers
Rank in United States
#1,438,570
of 1,627,098
Works
30
Citations
441
Citations per work
14.7
h-index
13
i10-index 14Top 37% in Electrical and Electronic Engineering
William R. Knolle

What does William R. Knolle research?

William R. Knolle's work is mostly in Engineering (44%), Materials Science (20%), Chemistry (8%).

Physical Sciences: 23 works · 76.0% of their workEngineering: 13 works · 44.3% of their workElectrical and Electronic Engineering: 13 works · 44.3% of their workMaterials Science: 6 works · 20.4% of their workMaterials Chemistry: 5 works · 15.9% of their workCeramics and Composites: 1 works · 4.5% of their workChemistry: 2 works · 7.9% of their workPhysical and Theoretical Chemistry: 1 works · 4.5% of their workOrganic Chemistry: 1 works · 3.4% of their workEnvironmental Science: 1 works · 3.4% of their workIndustrial and Manufacturing Engineering: 1 works · 3.4% of their workEverything else: 7 works · 24.0% of their workTHEIR WORKWilliam R. Knolle30works
Physical Sciences76%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1344.3%
    2. Materials Science620.4%
    3. Chemistry27.9%
    4. Environmental Science13.4%
  2. Everything else724.0%
  1. 1Electrical and Electronic Engineering44% of their works
  2. 2Materials Chemistry16% of their works
  3. 3Ceramics and Composites4% of their works
  4. 4Physical and Theoretical Chemistry4% of their works
  5. 5Industrial and Manufacturing Engineering3% of their works
  6. 6Organic Chemistry3% of their works

Research topics

Which keywords describe William R. Knolle's research?

The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Plasmonics, Thin-Film Transistors, Nanoparticles, Porous Silicon, Field-Effect Transistors and Ceramic Materials.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.

All 17 words, with their numbers
  1. Atomic Layer Deposition161 topic
  2. High-k Dielectrics161 topic
  3. Plasmonics111 topic
  4. Thin-Film Transistors111 topic
  5. Nanoparticles61 topic
  6. Porous Silicon61 topic
  7. Field-Effect Transistors52 topics
  8. Ceramic Materials41 topic
  9. Plasma Etching41 topic
  10. Semiconductor Industry41 topic
  11. Sintering41 topic
  12. Gallium Oxide31 topic
  13. Semiconductor31 topic
  14. Excited-State Proton Transfer21 topic
  15. Intramolecular Charge Transfer21 topic
  16. Ion-Selective Electrodes21 topic
  17. Optical Sensors21 topic

Where does William R. Knolle work?

William R. Knolle's main affiliation in the publication record is AT&T (United States), United States.

How many publications and citations does William R. Knolle have?

OpenAlex counts 30 works and 441 citations for William R. Knolle, an h-index of 13, ranking #5,837,997 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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