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Advanced Surface Polishing Techniques

Advanced Surface Polishing Techniques is a research topic within Biomedical Engineering. Science Explorer counts 65k research works in it since 1950. 9.9% of them reached the world's top 10% most cited for their field and year.

This cluster of papers focuses on the techniques, mechanisms, and simulations related to chemical mechanical polishing (CMP) in the context of microelectronics manufacturing. It covers topics such as material removal mechanisms, molecular dynamics simulation, ultra-precision grinding, surface and subsurface damage, nanometric cutting, magnetorheological finishing, polishing slurry chemistry, and tool wear.

  • Chemical Mechanical Planarization
  • Material Removal Mechanism
  • Molecular Dynamics Simulation
  • Ultra-Precision Grinding
  • Surface Damage
  • Nanometric Cutting
  • Magnetorheological Finishing
  • Subsurface Damage
  • Polishing Slurry Chemistry
  • Tool Wear
Research works
65k
fractional, since 1950
In the world top 10%
6.4k
per year above
Top-10% rate
9.9%
share of its works in the world top 10%
Growth, 2018-21 → 2022-25
+5%
the tick is no change
Largest producer
China
56% of the 10 largest, 2022-now
Advanced Surface Polishing Techniques
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