Most cited papers from ASM (Japan)
What are the most cited papers from ASM (Japan)?
The most cited paper from ASM (Japan) is "EUV Lithography Technology for High-volume Production of Semiconductor Devices" (Junji Miyazaki, Anthony Yen, 2019), with 55 citations. Next come "Impacts of UV cure for reliable porous PECVD SiOC integration [IC interconnect applications]" (8) and "Selective Hemispherical Grained Polysilicon Transformation for 256 MB, 1 GB Dynamic Random Access Memory and Beyond" (5).
Showing 9 of 9 papers. Every paper is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | EUV Lithography Technology for High-volume Production of Semiconductor Devices Junji Miyazaki, Anthony Yen · Journal of Photopolymer Science and Technology | 24 Jun 2019 | 55 |
| 2 | Impacts of UV cure for reliable porous PECVD SiOC integration [IC interconnect applications] Katsumi Yoneda, Muneharu Kato, Susumu Kondo et al. | 30 Aug 2005 | 8 |
| 3 | Selective Hemispherical Grained Polysilicon Transformation for 256 MB, 1 GB Dynamic Random Access Memory and Beyond Majid Mansoori, Aritra Banerjee, Akito Shimizu et al. · Journal of The Electrochemical Society | Oct 1999 | 5 |
| 4 | Bottom-ARC optimization methodology for 0.25-μm lithography and beyond Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 29 Jun 1998 | 3 |
| 5 | Growing low-temperature, high-quality silicon-dioxide films by neutral-beam enhanced atomic-layer deposition Yi-Ho Chen, Susumu Toko, Daisuke Ohori et al. · Journal of Physics D Applied Physics | 26 Sep 2019 | 2 |
| 6 | Evaluation of TiN hardmask films to prevent line wiggling due to plasma-induced film stress Amelia Turnquist, Naoyuki Kofuji, Joseph Sebastian et al. | May 2023 | 1 |
| 7 | Low-k properties and integration processes enabling reliable interconnect scaling to the 32 nm technology node Atsushi Ikeda et al. | 2006 | 1 |
| 8 | Optimization of pitch walking for Ti-based spacer integration in semi-damascene double patterning at MP18 Vincent Renaud, M.A. Neto, Sungdae Woo et al. | 9 Apr 2026 | 0 |
| 9 | Scaled-down deposited underlayers for EUV lithography Mihir Gupta, Joao Antunes Afonso, Philippe Bézard et al. | May 2023 | 0 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.