Most cited papers from Beneq (Finland)
What are the most cited papers from Beneq (Finland)?
The most cited paper from Beneq (Finland) is "20.8% industrial PERC solar cell: ALD Al2O3 rear surface passivation, efficiency loss mechanisms analysis and roadmap to 24%" (Haibing Huang, Jun Lv, Yameng Bao et al., 2016), with 136 citations. Next come "Properties of AlN grown by plasma enhanced atomic layer deposition" (127) and "Atomic layer deposition of lithium containing thin films" (90).
Showing 50 of 60 papers. Every paper with more than 6 citations is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | 20.8% industrial PERC solar cell: ALD Al2O3 rear surface passivation, efficiency loss mechanisms analysis and roadmap to 24% Haibing Huang, Jun Lv, Yameng Bao et al. · Solar Energy Materials and Solar Cells | 23 Nov 2016 | 136 |
| 2 | Properties of AlN grown by plasma enhanced atomic layer deposition Markus Bosund, Timo Sajavaara, Mikko Laitinen et al. · Applied Surface Science | 20 Apr 2011 | 127 |
| 3 | Atomic layer deposition of lithium containing thin films Matti I. Putkonen, Titta Aaltonen, Mari Alnes et al. · Journal of Materials Chemistry | 2009 | 90 |
| 4 | Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors Matti I. Putkonen, Markus Bosund, Oili M. E. Ylivaara et al. · Thin Solid Films | 13 Mar 2014 | 79 |
| 5 | Atomic layer deposition and characterization of biocompatible hydroxyapatite thin films Matti I. Putkonen, Timo Sajavaara, Paavo Rahkila et al. · Thin Solid Films | 14 Mar 2009 | 75 |
| 6 | Advanced process technologies: Plasma, direct-write, atmospheric pressure, and roll-to-roll ALD W. M. M. Kessels, Matti I. Putkonen · MRS Bulletin | Nov 2011 | 71 |
| 7 | Roll-to-roll atomic layer deposition process for flexible electronics encapsulation applications Philipp S. Maydannik, Tommi Kääriäinen, Kimmo Lahtinen et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 19 Aug 2014 | 66 |
| 8 | Chemical and electrochemical characterization of hybrid PVD+ALD hard coatings on tool steel Elia Marin, Luis Americo Guzman, Alex Lanzutti et al. · Electrochemistry Communications | 4 Sep 2009 | 66 |
| 9 | Protection of silver surfaces against tarnishing by means of alumina/titania-nanolayers L. Paussa, Luis Americo Guzman, Elia Marin et al. · Surface and Coatings Technology | 15 Apr 2011 | 66 |
| 10 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study Maarit Kariniemi, Jaakko Niinistö, Marko Vehkamäki et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 11 Nov 2011 | 65 |
| 11 | Atomic Layer Deposition Al2O3 Coatings Significantly Improve Thermal, Chemical, and Mechanical Stability of Anodic TiO2 Nanotube Layers Raúl Zazpe, Jan Přikryl, V. Gärtnerová et al. · Langmuir | 14 Mar 2017 | 61 |
| 12 | Conformal Transparent Conducting Oxides on Black Silicon Martin R. Otto, Matthias Kröll, Thomas Käsebier et al. · Advanced Materials | 21 Sep 2010 | 57 |
| 13 | Atomic Layer Deposition of HfO2 Thin Films Exploiting Novel Cyclopentadienyl Precursors at High Temperatures Jaakko Niinistö, Matti I. Putkonen, Lauri Niinistö et al. · Chemistry of Materials | Jun 2007 | 57 |
| 14 | EDGAR v4.3.2 Global Atlas of the three major Greenhouse Gas Emissions for the period 1970–2012 Greet Janssens‐Maenhout, Monica Crippa, Diego Guizzardi et al. | 28 Jan 2019 | 49 |
| 15 | HOR Activity of Pt-TiO 2-Y at Unconventionally High Potentials Explained: The Influence of SMSI on the Electrochemical Behavior of Pt Timon N. Geppert, Markus Bosund, Matti I. Putkonen et al. · Journal of The Electrochemical Society | 5 Jan 2020 | 46 |
| 16 | Effective passivation of p+ and n+ emitters using SiO2/Al2O3/SiNx stacks: Surface passivation mechanisms and application to industrial p-PERT bifacial Si solar cells Haibing Huang, Chiara Modanese, Shenghua Sun et al. · Solar Energy Materials and Solar Cells | 19 Jul 2018 | 46 |
| 17 | Atomic layer deposition of metal fluorides through oxide chemistry Matti I. Putkonen, Adriana Viorica Szeghalmi, Eckhard Pippel et al. · Journal of Materials Chemistry | 2011 | 43 |
| 18 | Ytterbium-doped fibers fabricated with atomic layer deposition method Joan J. Montiel i Ponsoda, Lars Norin, Changgeng Ye et al. · Optics Express | 18 Oct 2012 | 43 |
| 19 | Silicon Surface Passivation by Al2O3: Effect of ALD Reactants Päivikki Repo, Heli Talvitie, Shuo Li et al. · Energy Procedia | 2011 | 42 |
| 20 | Advanced cyclopentadienyl precursors for atomic layer deposition of ZrO2 thin films Jaakko Niinistö, Kaupo Kukli, Aile Tamm et al. · Journal of Materials Chemistry | 2008 | 42 |
| 21 | Atomic Layer Deposition Arto Pakkala, Matti I. Putkonen · Elsevier eBooks | 19 Dec 2009 | 38 |
| 22 | Rare earth scandate thin films by atomic layer deposition: effect of the rare earth cation size Pia Myllymäki, Martin Roeckerath, J. M. J. Lopes et al. · Journal of Materials Chemistry | 2010 | 34 |
| 23 | Atomic layer deposition of ZrO2 and HfO2 on deep trenched and planar silicon Kaupo Kukli, Jaakko Niinistö, Aile Tamm et al. · Microelectronic Engineering | 31 May 2007 | 33 |
| 24 | Characterization and electrical properties of high-k GdScO3 thin films grown by atomic layer deposition Pia Myllymäki, Martin Roeckerath, Matti I. Putkonen et al. · Applied Physics A | 14 Jun 2007 | 28 |
| 25 | Nanostructured coatings by liquid flame spraying Joe Pimenoff, A.K. Hovinen, Markku Rajala · Thin Solid Films | 21 Nov 2008 | 25 |
| 26 | Comparison of Collection Schemes of Municipal Solid Waste Metallic Fraction: The Impacts on Global Warming Potential for the Case of the Helsinki Metropolitan Area, Finland Timo Kuusiola, Maaria Wierink, Kari Heiskanen · Sustainability | 12 Oct 2012 | 24 |
| 27 | Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100 °C for moisture barrier applications Zhen Zhu, Perttu Sippola, Harri K. Lipsanen et al. · Japanese Journal of Applied Physics | 26 Oct 2018 | 23 |
| 28 | First measurements of the number size distribution of 1–2 nm aerosol particles released from manufacturing processes in a cleanroom environment Lauri Reino Ahonen, Juha Kangasluoma, J. Lammi et al. · Aerosol Science and Technology | 14 Feb 2017 | 23 |
| 29 | Atomic layer deposition of ytterbium oxide using -diketonate and ozone precursors Markus Bosund, Kenichiro Mizohata, Teppo Hakkarainen et al. · Applied Surface Science | 28 Aug 2009 | 23 |
| 30 | Excellent passivation and low reflectivity Al2O3 /TiO2 bilayer coatings for n-wafer silicon solar cells Benjamin G. Lee, Jarmo I. Skarp, Ville Malinen et al. | Jun 2012 | 22 |
| 31 | Ozone-based Batch Atomic Layer Deposited Al2O3 for Effective Surface Passivation Guillaume von Gastrow, Shuo Li, Päivikki Repo et al. · Energy Procedia | 2013 | 22 |
| 32 | Exposure to CeO2nanoparticles during flame spray process Maija Leppänen, Jussi Lyyränen, Merja Järvelä et al. · Nanotoxicology | 19 Jul 2011 | 21 |
| 33 | High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning Henri Jussila, Pasi Mattila, Joel Oksanen et al. · Applied Physics Letters | 13 Feb 2012 | 20 |
| 34 | Zn(O,S) buffer prepared by atomic layer deposition for sequentially grown Cu(In,Ga)(Se,S)2 solar cells and modules Saoussen Merdes, Ville Malinen, Florian Ziem et al. · Solar Energy Materials and Solar Cells | 16 Apr 2014 | 19 |
| 35 | Red Y2O3:Eu-Based Electroluminescent Device Prepared by Atomic Layer Deposition for Transparent Display Applications José Rosa, Mikko Heikkilä, Mika Sirkiä et al. · Materials | 19 Mar 2021 | 17 |
| 36 | Wettability and compositional analysis of hydroxyapatite films modified by low and high energy ion irradiation A.R. Ananda Sagari, Paavo Rahkila, Markku Väisänen et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms | 17 Mar 2008 | 16 |
| 37 | Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3 Shuo Li, Yameng Bao, Mikko Laitinen et al. · physica status solidi (a) | 16 Mar 2015 | 15 |
| 38 | Batch processing of aluminum nitride by atomic layer deposition from AlCl3 and NH3 Zhenzi Chen, Zhen Zhu, Kari Härkönen et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 13 Feb 2019 | 14 |
| 39 | Efficient surface passivation of black silicon using spatial atomic layer deposition Ismo T. S. Heikkinen, Päivikki Repo, Ville Vähänissi et al. · Energy Procedia | Sep 2017 | 13 |
| 40 | Effect of ALD reactants on blistering of aluminum oxide films on crystalline silicon Shuo Li, Päivikki Repo, Guillaume von Gastrow et al. | Jun 2013 | 13 |
| 41 | Hafnium Aluminate–Polymer Bilayer Dielectrics for Organic Light-Emitting Transistors (OLETs) Katherine Gallegos-Rosas, Pia Myllymäki, Mikael Saarniheimo et al. · ACS Applied Electronic Materials | 2 Feb 2024 | 12 |
| 42 | Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide Zhen Zhu, Perttu Sippola, Oili M. E. Ylivaara et al. · Nanoscale Research Letters | 12 Feb 2019 | 12 |
| 43 | Tribological properties of thin films made by atomic layer deposition sliding against silicon Lauri Kilpi, Oili M. E. Ylivaara, Antti Vaajoki et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 29 Dec 2017 | 11 |
| 44 | Ultra-thin atomic-layer deposited alumina incorporating silica sol makes ultra-durable antireflection coatings Jia Ming Li, Pinjun Lan, Hua Xu et al. · Journal of Applied Physics | Nov 2012 | 11 |
| 45 | Excellent passivation and low reflectivity with atomic layer deposited bilayer coatings for n-type silicon solar cells Benjamin G. Lee, Shuo Li, Guillaume von Gastrow et al. · Thin Solid Films | 6 Nov 2013 | 11 |
| 46 | Impact of black silicon on light‐ and elevated temperature‐induced degradation in industrial passivated emitter and rear cells Toni P. Pasanen, Chiara Modanese, Ville Vähänissi et al. · Progress in Photovoltaics Research and Applications | 4 Dec 2018 | 9 |
| 47 | Metal oxide multilayer hard mask system for 3D nanofabrication Zhongmei Han, Emma Salmi, Marko Vehkamäki et al. · Nanotechnology | 7 Dec 2017 | 9 |
| 48 | ALD Applications Beyond Outside IC Technology - Existing and Emerging Possibilities Matti I. Putkonen · ECS Transactions | 25 Sep 2009 | 9 |
| 49 | Mechanical and tribological property comparison of melt-compounded nanocomposites of atomic-layer-deposition-coated polyamide particles and commercial nanofillers Katja Nevalainen, Reija Suihkonen, P. Eteläaho et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films | 30 Jun 2009 | 9 |
| 50 | Control of Eu Oxidation State in Y2O3−xSx:Eu Thin-Film Phosphors Prepared by Atomic Layer Deposition: A Structural and Photoluminescence Study José Rosa, Jonas Deuermeier, Pekka J. Soininen et al. · Materials | 23 Dec 2019 | 8 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.