Institution · Gigaphoton Inc (Japan)
Most cited papers from Gigaphoton Inc (Japan)
What are the most cited papers from Gigaphoton Inc (Japan)?
The most cited paper from Gigaphoton Inc (Japan) is "High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution" (Shinji Okazaki, 2014), with 118 citations. Next come "High-Power, Solid-State, Deep Ultraviolet Laser Generation" (63) and "Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources" (54).
Showing 50 of 60 papers. Every paper with more than 8 citations is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution Shinji Okazaki · Microelectronic Engineering | 29 Nov 2014 | 118 |
| 2 | High-Power, Solid-State, Deep Ultraviolet Laser Generation Hongwen Xuan, Hironori Igarashi, Shinji Ito et al. · Applied Sciences | 3 Feb 2018 | 63 |
| 3 | Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources Kentaro Tomita, Yuta Sato, Syouichi Tsukiyama et al. · Scientific Reports | 20 Sep 2017 | 54 |
| 4 | First generation laser-produced plasma source system for HVM EUV lithography Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 11 Mar 2010 | 51 |
| 5 | Analytical model for CO_2 laser ablation of fused quartz Krzysztof Michał Nowak, Howard J. Baker, Denis R. Hall · Applied Optics | 5 Oct 2015 | 48 |
| 6 | Performance of one hundred watt HVM LPP-EUV source Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 13 Mar 2015 | 46 |
| 7 | CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology Kacper Nowak, T. Ohta, Takashi Suganuma et al. · Opto-Electronics Review | 2013 | 39 |
| 8 | 100W 1st generation laser-produced plasma light source system for HVM EUV lithography Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Mar 2011 | 38 |
| 9 | Observation of vacuum-ultraviolet Kr_2^* laser oscillation pumped by a compact discharge device Wataru Sasaki, Takahiro Shirai, Shoichi Kubodera et al. · Optics Letters | 15 Apr 2001 | 36 |
| 10 | Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography Junichi Fujimoto, Tamotsu Abe, Satoshi Tanaka et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 29 May 2012 | 34 |
| 11 | Efficient extreme ultraviolet emission from one-dimensional spherical plasmas produced by multiple lasers Kensuke Yoshida, Shinsuke Fujioka, Takeshi Higashiguchi et al. · Applied Physics Express | 30 Jul 2014 | 34 |
| 12 | Influence of pulse frequency on synthesis of nano and submicrometer spherical particles by pulsed laser melting in liquid Shota Sakaki, Hiroshi Ikenoue, Takeshi Tsuji et al. · Applied Surface Science | 4 Nov 2017 | 32 |
| 13 | LPP-EUV light source development for high volume manufacturing lithography Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 8 Apr 2013 | 32 |
| 14 | 1 W solid-state 193 nm coherent light by sum-frequency generation Hongwen Xuan, Chen Qu, Zhigang Zhao et al. · Optics Express | 8 Nov 2017 | 29 |
| 15 | 300-mW narrow-linewidth deep-ultraviolet light generation at 193 nm by frequency mixing between Yb-hybrid and Er-fiber lasers Hongwen Xuan, Zhigang Zhao, Hironori Igarashi et al. · Optics Express | 15 Apr 2015 | 29 |
| 16 | High-power and high-conversion efficiency deep ultraviolet (DUV) laser at 258 nm generation in the CsLiB_6O_10 (CLBO) crystal with a beam quality of M^2<15 Hongwen Xuan, Chen Qu, Shinji Ito et al. · Optics Letters | 4 Aug 2017 | 28 |
| 17 | Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography Junichi Fujimoto, Tsukasa Hori, Tatsuya Yanagida et al. · Physics Research International | 5 Sep 2012 | 27 |
| 18 | Performance of new high-power HVM LPP-EUV source Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 18 Mar 2016 | 26 |
| 19 | Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source Tatsuya Yanagida, Hitoshi Nagano, Y. Wada et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Mar 2011 | 25 |
| 20 | Sub-hundred Watt operation demonstration of HVM LPP-EUV source Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Apr 2014 | 25 |
| 21 | Long-Pulse-Discharge XeF and KrF Lasers Pumped by a Generator with Inductive Energy Storage Evgenii H. Baksht, Alexei N. Panchenko, В. Ф. Тарасенко et al. · Japanese Journal of Applied Physics | 15 Jun 2002 | 24 |
| 22 | Development of a collective Thomson scattering system for laser-produced tin plasmas for extreme-ultraviolet light sources Kentaro Tomita, Yuta Sato, Kazutaka Nishikawa et al. · Applied Physics Express | 9 Nov 2015 | 23 |
| 23 | Development of high coherence high power 193nm laser Satoshi Tanaka, Masaki Arakawa, Atsushi Fuchimukai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 16 Mar 2016 | 23 |
| 24 | Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source Junichi Fujimoto, T. Ohta, Krzysztof Michał Nowak et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Mar 2011 | 22 |
| 25 | Observation of plasma inflows in laser-produced Sn plasma and their contribution to extreme-ultraviolet light output enhancement Kentaro Tomita, Yiming Pan, Atsushi Sunahara et al. · Scientific Reports | Feb 2023 | 21 |
| 26 | Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography Junichi Fujimoto, Tsukasa Hori, Tatsuya Yanagida et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 15 Mar 2012 | 20 |
| 27 | Watt-level 193 nm source generation based on compact collinear cascaded sum frequency mixing configuration Zhigang Zhao, Chen Qu, Hironori Igarashi et al. · Optics Express | 17 Jul 2018 | 18 |
| 28 | Key components technology update of the 250W high-power LPP-EUV light source Yasufumi Kawasuji, Krzysztof Michał Nowak, Tsukasa Hori et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 24 Mar 2017 | 18 |
| 29 | Spatial profiles of electron density, electron temperature, average ionic charge, and EUV emission of laser-produced Sn plasmas for EUV lithography Yuta Sato, Kentaro Tomita, Tsukiyama Syoichi et al. · Japanese Journal of Applied Physics | 31 Jan 2017 | 18 |
| 30 | Multiline short-pulse solid-state seeded carbon dioxide laser for extreme ultraviolet employing multipass radio frequency excited slab amplifier Krzysztof Michał Nowak, T. Ohta, Takashi Suganuma et al. · Optics Letters | 8 Mar 2013 | 18 |
| 31 | Deep ultraviolet excimer laser processing for the micro via hole on semiconductor package Yasufumi Kawasuji, Junichi Fujimoto, Masakazu Kobayashi et al. · Journal of Laser Applications | May 2020 | 16 |
| 32 | Density and x-ray emission profile relationships in highly ionized high-Z laser-produced plasmas Kensuke Yoshida, Shinsuke Fujioka, Takeshi Higashiguchi et al. · Applied Physics Letters | 23 Mar 2015 | 16 |
| 33 | Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography Takeshi Asayama, Youichi Sasaki, Takayuki Nagashima et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 12 Apr 2013 | 16 |
| 34 | Correlation between laser absorption and radiation conversion efficiency in laser produced tin plasma Hiraku Matsukuma, Atsushi Sunahara, Tatsuya Yanagida et al. · Applied Physics Letters | 21 Sep 2015 | 16 |
| 35 | Performance of 250W high-power HVM LPP-EUV source Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 27 Mar 2017 | 15 |
| 36 | Wavelength dependence of the Verdet constant in synthetic quartz glass for deep-ultraviolet light sources Yuki Tamaru, Hengjun Chen, Atsushi Fuchimukai et al. · Optical Materials Express | 17 Feb 2021 | 15 |
| 37 | Long-lived neutral-kaon flux measurement for the KOTO experiment Takahiko Masuda et al. · Progress of Theoretical and Experimental Physics | 2016 | 15 |
| 38 | High power injection lock 6 kHz 60 W laser for ArF dry/wet lithography Hakaru Mizoguchi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 10 Mar 2006 | 14 |
| 39 | Development of 250W EUV light source for HVM lithography Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. | Mar 2016 | 13 |
| 40 | Performance of 100-W HVM LPP-EUV source Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. · Advanced Optical Technologies | 30 Jul 2015 | 13 |
| 41 | Evaluation of Hydrogen-Induced Blistering of Mo/Si Multilayers with a Capping Layer Hiroaki Tomuro, Mengran JI, Ryo Nagata et al. · Plasma and Fusion Research | 21 Feb 2022 | 12 |
| 42 | Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. | 23 Mar 2020 | 12 |
| 43 | Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool Toru Suzuki, Kouji Kakizaki, Takashi Matsunaga et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 16 Mar 2007 | 12 |
| 44 | Key technology development progress of the high power LPP-EUV light source Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai et al. | 22 Apr 2022 | 11 |
| 45 | Development of high-power, 6 kHz, single-mode Ti:sapphire laser at 904 nm for generating 193 nm light Mizuki Tsuboi, Tomoharu Nakazato, Takashi Onose et al. · Japanese Journal of Applied Physics | 18 Mar 2015 | 11 |
| 46 | Direct-Drive Oscillation of KrF Excimer Laser Using Pulsed Power Generator Based on LTD Hiroshi Umeda, Taichi Sugai, Weihua Jiang · IEEE Transactions on Plasma Science | 24 Nov 2021 | 10 |
| 47 | 100W EUV light-source key component technology update for HVM Tsukasa Hori, Yasufumi Kawasuji, Hiroshi Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 18 Mar 2016 | 10 |
| 48 | High-power injection lock laser platform for ArF dry/wet lithography Hiroyuki Mizoguchi et al. · Optical Microlithography XVIII | 12 May 2005 | 10 |
| 49 | Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source T. Ohta, Krzysztof Michał Nowak, Takashi Suganuma et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 23 Mar 2012 | 10 |
| 50 | High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography Masaya Yoshino, Hiroaki Nakarai, T. Ohta et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 21 Feb 2008 | 9 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.