Institution · Inpria (United States)
Most cited papers from Inpria (United States)
What are the most cited papers from Inpria (United States)?
The most cited paper from Inpria (United States) is "Integrated fab process for metal oxide EUV photoresist" (Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al., 2015), with 87 citations. Next come "Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet" (81) and "Competitive device performance of low-temperature and all-solution-processed metal-oxide thin-film transistors" (74).
Showing 50 of 53 papers. Every paper is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | Integrated fab process for metal oxide EUV photoresist Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 23 Mar 2015 | 87 |
| 2 | Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet Roberto Fallica, Jason K. Stowers, Andrew Grenville et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 8 Aug 2016 | 81 |
| 3 | Competitive device performance of low-temperature and all-solution-processed metal-oxide thin-film transistors Kyung Min Kim, Chi Wan Kim, Jaeseok Heo et al. · Applied Physics Letters | 12 Dec 2011 | 74 |
| 4 | Directly patterned inorganic hardmask for EUV lithography Jason K. Stowers, Alan Telecky, Michael K. Kocsis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 17 Mar 2011 | 67 |
| 5 | A numeric model for the imaging mechanism of metal oxide EUV resists William D. Hinsberg, Stephen T. Meyers · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 27 Mar 2017 | 66 |
| 6 | Mechanistic Advantages of Organotin Molecular EUV Photoresists H. Jonathan, Craig D. Needham, Han Wang et al. · ACS Applied Materials & Interfaces | 25 Jan 2022 | 52 |
| 7 | Metal oxide EUV photoresist performance for N7 relevant patterns and processes Jason K. Stowers, Jeremy T. Anderson, Brian Cardineau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 25 Mar 2016 | 45 |
| 8 | Dynamic absorption coefficients of CAR and non-CAR resists at EUV Roberto Fallica, Jason K. Stowers, Andrew Grenville et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 18 Mar 2016 | 30 |
| 9 | Photopatternable inorganic hardmask Alan Telecky, Peng Xie, Jason K. Stowers et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena | Nov 2010 | 30 |
| 10 | 28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography Danilo D. Simone et al. | 19 Feb 2021 | 25 |
| 11 | The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm Chris N. G. Anderson, Dominic Ashworth, Lorie Mae Baclea-an et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 15 Mar 2012 | 22 |
| 12 | Molecular organometallic resists for EUV (MORE) Brian Cardineau · Frontiers of nanoscience | 2016 | 21 |
| 13 | Demonstration of an N7 integrated fab process for metal oxide EUV photoresist Danilo D. Simone, Ming Mao, Michael K. Kocsis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 18 Mar 2016 | 21 |
| 14 | Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope Markus P. Benk, Kenneth A. Goldberg, Antoine Wojdyla et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena | 26 Aug 2015 | 18 |
| 15 | Characterizing and modeling electrical response to light for metal-based EUV photoresists Alessandro Vaglio Pret, Mike Kocsis, Danilo D. Simone et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 25 Mar 2016 | 16 |
| 16 | Nanoimprinting for diffractive light trapping in solar cells Dirk N. Weiss, Hao‐Chih Yuan, Benjamin G. Lee et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena | Nov 2010 | 16 |
| 17 | EUV metal oxide resists: impact of the environment composition on CD during post-exposure delay Sonia Castellanos, Peter De Schepper, Maireyee Bhattacharya et al. | 10 Apr 2024 | 14 |
| 18 | Chemically Amplified Dehydration of Thin Oxide Films Jeremy T. Anderson, Wei Wang, Kai Jiang et al. · ACS Sustainable Chemistry & Engineering | 30 Apr 2015 | 14 |
| 19 | Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond Vivek Bakshi, Hakaru Mizoguchi, Ted Liang et al. · Journal of Micro/Nanolithography MEMS and MOEMS | 27 Dec 2017 | 13 |
| 20 | Alternative smoothing techniques to mitigate EUV substrate defectivity Ranganath Teki, Arun John Kadaksham, Matt House et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 15 Mar 2012 | 13 |
| 21 | Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography Xaver Thrun, Kang‐Hoon Choi, Martin Freitag et al. · Microelectronic Engineering | 20 Jul 2012 | 13 |
| 22 | Mainstreaming inorganic metal-oxide resists for high-resolution lithography Deirdre L. Olynick, Adam M. Schwartzberg, Douglas A. Keszler · Frontiers of nanoscience | 2016 | 12 |
| 23 | In‐situ characterization of aqueous‐based hafnium oxide hydroxide sulfate thin films Brendan T. Flynn, Daeho Kim, Benjamin L. Clark et al. · Surface and Interface Analysis | 10 Jan 2013 | 12 |
| 24 | Calibration of a MOx-specific EUV photoresist lithography model Craig D. Needham, Amrit K. Narasimhan, Ulrich Welling et al. | 23 Mar 2020 | 8 |
| 25 | Patterning with metal-oxide EUV photoresist: patterning capability, resist smoothing, trimming, and selective stripping Ming Mao, Frédéric Lazzarino, Peter De Schepper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 27 Mar 2017 | 8 |
| 26 | Coater/developer process integration of metal-oxide based photoresist Benjamin L. Clark, Michael K. Kocsis, Michael Greer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 23 Mar 2015 | 8 |
| 27 | Advanced simulations using an improved metal oxide photoresist model Craig D. Needham, Ulrich Welling, Amrit K. Narasimhan et al. | 10 Apr 2024 | 7 |
| 28 | How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive Christopher N. Anderson et al. | 23 Mar 2020 | 6 |
| 29 | Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab Christopher N. Anderson, Arnaud P. Allezy, Weilun L. Chao et al. | 14 Mar 2019 | 5 |
| 30 | Coat-develop track process for inorganic EUV resist Masahiko Harumoto, Tadashi Miyagi, Koji Kaneyama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 23 Mar 2012 | 5 |
| 31 | Electrical test demonstration for 0.55 NA EUV single patterning damascene process Stéphane Larivière, Víctor M. Blanco Carballo, K. Vandersmissen et al. | 2 Jun 2025 | 4 |
| 32 | Stable stitching: impact and mitigation of environment on metal-oxide resist imaging Patricia P. Marin San Roman, Sonia Castellanos, Gijsbert Rispens et al. · Journal of Micro/Nanopatterning Materials and Metrology | 22 Jan 2025 | 4 |
| 33 | Advanced development methods for high-NA EUV lithography Cong Que Dinh et al. | May 2023 | 4 |
| 34 | Advances in defect performance in metal oxide photoresists for EUV lithography Stephen T. Meyers, Jan Doise, Michael K. Kocsis et al. | 19 Feb 2021 | 4 |
| 35 | Enabling 0.33NA EUV lithography patterning towards MP16 SADP semi-damascene metallization, setting the benchmark for High-NA EUV Yannick Hermans, Stefan Decoster, Chen Wu et al. | 12 Nov 2024 | 3 |
| 36 | Advanced processes in metal-oxide resists for high-NA EUV lithography Cong Que Dinh et al. | 9 Apr 2024 | 3 |
| 37 | Advances in metal oxide resist performance and production (Conference Presentation) Jason K. Stowers, Peter De Schepper, Michael K. Kocsis et al. | 25 Mar 2019 | 3 |
| 38 | Lloyd’s mirror interference lithography below a 22-nm pitch with an accessible, tabletop, 13.5 nm high-harmonic EUV source Kevin M. Dorney, Sonia Castellanos, Esben Witting Larsen et al. | 19 Feb 2021 | 3 |
| 39 | Delivering metal oxide photoresists for EUV: overcoming challenges to scaling (Conference Presentation) Andrew Grenville, Benjamin L. Clark, Peter De Schepper et al. | 24 Mar 2020 | 3 |
| 40 | Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer Adam Lyons, David del Rio, Sook Lee et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 27 Mar 2017 | 2 |
| 41 | Demonstration of 22nm SRAM features with patternable hafnium oxide-based resist material using electron-beam lithography Xaver Thrun, Kang‐Hoon Choi, Martin Freitag et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | 8 Mar 2012 | 2 |
| 42 | Metal oxide resist formulation and process advancements towards high-NA EUV lithography Amrit K. Narasimhan, Alexander C. Marwitz, Kanta Yanagi et al. | 22 Apr 2025 | 1 |
| 43 | An update on the improvement in optimization of point-of-use filtration of metal oxide photoresists Tetsu Kohyama, Kashif Choudry, Jan Doise et al. | 9 Apr 2024 | 1 |
| 44 | Continued optimization of point-of-use filtration for metal oxide photoresists to reduce defect density Tetsu Kohyama, Shu-Hao Chang, Jan Doise et al. | May 2023 | 1 |
| 45 | Optimization of point-of-use filtration for metal oxide photoresist Aiwen Wu, Harvey Tang, Gregg Conner et al. | 19 Feb 2021 | 1 |
| 46 | Defect improvement for an EUV process Masahiko Harumoto, Harold W Stokes, Shu Hao Chang et al. | 5 May 2020 | 1 |
| 47 | Population statistics of EUV printed MOx resist features (Conference Presentation) Peter De Schepper, Jason K. Stowers, Michael Greer et al. | 19 Mar 2018 | 1 |
| 48 | EUV quantum yield of organotin molecular resists: a first principles study Roberto Longo, Shyam Sridhar, Peter Ventzek et al. | 10 Apr 2026 | 0 |
| 49 | Development methods for metal oxide photoresists: a fundamental investigation using lithography simulations Craig D. Needham, Ulrich Welling, Amrit K. Narasimhan et al. | 9 Apr 2026 | 0 |
| 50 | Unraveling crosslinking effects in EUV metal oxide photoresist performance via large-scale atomistic simulations Ching-Yu Huang, Gyeong Soon Hwang, Peter Ventzek et al. | 9 Apr 2026 | 0 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.