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Company · Corvallis · United States

Inpria (United States)

inpria.comROR OpenAlex
Research works
26
▼ 9% vs 2018-21
Citations
396
15.5 per fractional work
Top-10% rate
12.8%
all institutions 10.0%
Open access
14%
world 40%
International
42%
world 18%
Inpria (United States)

Not ranked overall: Inpria (United States) is under the volume floor below which an excellence rate is noise. Not ranked is not the same as ranked last.

Which fields of science does Inpria (United States) work in?

In all years, 100% of research at Inpria (United States) is in Physical Sciences, 0% in Social Sciences. Its largest fields are Engineering (71%), Materials Science (24%), Physics and Astronomy (2%). It does 2.1× the world's share of Physical Sciences.

Physical Sciences: 26 fractional works · 99.6% of its workEngineering: 18 fractional works · 70.6% of its workElectrical and Electronic Engineering: 16 fractional works · 62.7% of its workBiomedical Engineering: 1 fractional works · 5.3% of its workIndustrial and Manufacturing Engineering: 0 fractional works · 1.5% of its workComputational Mechanics: 0 fractional works · 0.7% of its workMechanical Engineering: 0 fractional works · 0.4% of its workMaterials Science: 6 fractional works · 24.1% of its workSurfaces, Coatings and Films: 5 fractional works · 19.0% of its workMaterials Chemistry: 1 fractional works · 2.4% of its workPolymers and Plastics: 0 fractional works · 1.7% of its workElectronic, Optical and Magnetic Materials: 0 fractional works · 1.0% of its workPhysics and Astronomy: 1 fractional works · 2.5% of its workRadiation: 1 fractional works · 2.2% of its workAtomic and Molecular Physics, and Optics: 0 fractional works · 0.3% of its workEnvironmental Science: 0 fractional works · 2.0% of its workManagement, Monitoring, Policy and Law: 0 fractional works · 2.0% of its workChemistry: 0 fractional works · 0.4% of its workOrganic Chemistry: 0 fractional works · 0.4% of its workSocial Sciences: 0 fractional works · 0.4% of its workArts and Humanities: 0 fractional works · 0.4% of its workArcheology: 0 fractional works · 0.4% of its workALL ITS WORKInpria (UnitedStates)26fractional works, all years
Physical Sciences100%Social Sciences0%

Each ring splits the one inside it: the four domains of science, their fields, their subfields. Size is fractional works in all years. Every slice is a page; the interactive view zooms down to single topics and colours each by how much more of it this institution does than the world.

Its 2 domains and 6 fields, with their numbers
    1. Engineering1870.6%
    2. Materials Science624.1%
    3. Physics and Astronomy12.5%
    4. Environmental Science02.0%
    5. Chemistry00.4%
    1. Arts and Humanities00.4%
All of science, and how each field's share has moved since 1950: the Science domain explorer

Field profile

Location quotient across every field it publishes in: outside the ring is more than an institution of this size would be expected to publish, inside it is less.

Who are the top researchers at Inpria (United States)?

Ranked on the quality score, Stephen T. Meyers, Jason K. Stowers and Craig D. Needham lead among researchers whose main affiliation is Inpria (United States).

  1. 1 Stephen T. Meyers United States · #1,992,019 worldwide 976 citations · 28 works
  2. 2 Jason K. Stowers United States · #2,481,303 worldwide 678 citations · 29 works
  3. 3 Craig D. Needham United States · #2,759,083 worldwide 268 citations · 16 works
All ranked researchers at Inpria (United States)

What are the most cited papers from Inpria (United States)?

The most cited paper from Inpria (United States) is "Integrated fab process for metal oxide EUV photoresist" (Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al., 2015), with 87 citations. Next come "Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet" (81) and "Competitive device performance of low-temperature and all-solution-processed metal-oxide thin-film transistors" (74).

Most cited papers
#PaperReleasedCitations
1 Integrated fab process for metal oxide EUV photoresist Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 23 Mar 2015 87
2 Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet Roberto Fallica, Jason K. Stowers, Andrew Grenville et al. · Journal of Micro/Nanolithography MEMS and MOEMS Open access 8 Aug 2016 81
3 Competitive device performance of low-temperature and all-solution-processed metal-oxide thin-film transistors Kyung Min Kim, Chi Wan Kim, Jaeseok Heo et al. · Applied Physics Letters 12 Dec 2011 74
4 Directly patterned inorganic hardmask for EUV lithography Jason K. Stowers, Alan Telecky, Michael K. Kocsis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 17 Mar 2011 67
5 A numeric model for the imaging mechanism of metal oxide EUV resists William D. Hinsberg, Stephen T. Meyers · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 27 Mar 2017 66
All 53 most cited papers, with filters and sorting

Which keywords describe research at Inpria (United States)?

By fractional works in all years, weighted toward what it does more of than the world: High-Resolution Patterning, Nanofabrication, Electron Beam Lithography, Resolution Limits, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Failure Analysis and Integrated Circuits.

▲ more of its work than of the world's◆ about the world's share▼ less than the world's

Size is fractional works in all years in the topics tagged with each word; colour is the word's share of this institution's work against its share of the world's. The 11 words are chosen for being large and distinctive. Each links to the topic it comes from most.

All 11 words, with their numbers
  1. High-Resolution Patterning8▲ 807×2 topics
  2. Nanofabrication8▲ 349×2 topics
  3. Electron Beam Lithography8▲ 1471×1 topic
  4. Resolution Limits8▲ 1471×1 topic
  5. Scanning Electron Microscopy5▲ 292×1 topic
  6. X-ray Photoelectron Spectroscopy5▲ 127×1 topic
  7. Failure Analysis4▲ 127×1 topic
  8. Integrated Circuits4▲ 74×1 topic
  9. Atomic Layer Deposition3▲ 81×1 topic
  10. High-k Dielectrics3▲ 81×1 topic
  11. Solar Cells1▲ 16×3 topics

Which research topics does Inpria (United States) publish most on?

By volume in 2022-now: Advancements in Photolithography Techniques, Integrated Circuits and Semiconductor Failure Analysis, Electron and X-Ray Spectroscopy Techniques and Semiconductor materials and devices.

Advancements in Photolit…2Advancements in Photolithography Techniques: 2 fractional worksIntegrated Circuits and …2Integrated Circuits and Semiconductor Failure Analysis: 2 fractional worksElectron and X-Ray Spect…1Electron and X-Ray Spectroscopy Techniques: 1 fractional worksSemiconductor materials …1Semiconductor materials and devices: 1 fractional worksAdvanced Surface Polishing Techniques: 0 fractional worksTransition Metal Oxide Nanomaterials: 0 fractional worksCopper Interconnects and Reliability: 0 fractional worksNanofabrication and Lithography Techniques: 0 fractional worksMolecular Junctions and Nanostructures: 0 fractional worksIndustrial Vision Systems and Defect Detection: 0 fractional works
Electrical and Electronic EngineeringSurfaces, Coatings and FilmsBiomedical EngineeringPolymers and Plastics2 others

Area is fractional works; colour is the subfield each topic belongs to.

  1. 1 Advancements in Photolithography Techniques Electrical and Electronic Engineering 2 works
  2. 2 Integrated Circuits and Semiconductor Failure Analysis Electrical and Electronic Engineering 2 works
  3. 3 Electron and X-Ray Spectroscopy Techniques Surfaces, Coatings and Films 1 works
  4. 4 Semiconductor materials and devices Electrical and Electronic Engineering 1 works
  5. 5 Advanced Surface Polishing Techniques Biomedical Engineering 0 works
  6. 6 Transition Metal Oxide Nanomaterials Polymers and Plastics 0 works
  7. 7 Copper Interconnects and Reliability Electronic, Optical and Magnetic Materials 0 works
  8. 8 Nanofabrication and Lithography Techniques Biomedical Engineering 0 works
  9. 9 Molecular Junctions and Nanostructures Electrical and Electronic Engineering 0 works
  10. 10 Industrial Vision Systems and Defect Detection Industrial and Manufacturing Engineering 0 works

How open and international is its research?

Against the world's own shares: the tick on each track. Both are shares of its output, so they sit on one scale and can be read against each other as well as against the world.

openly available13.7%not open86.3%

World: 40% of research is openly available.

with international co-authors41.5%domestic only58.5%

World: 18% is written across borders.

How has Inpria (United States)'s research output changed?

Output in 2022-2025 was 9% lower than in 2018-2021.

still counting201520202025
grewheldshrank

The same series as a ribbon: one cell per year, darker for more. The line above answers how much; this answers when.

Its share of all research

Growing output can still be a shrinking share: all of science grows. This is Inpria (United States) as a percentage of every work published that year, 0.000054% in 2024.

still counting0.000050%0.00010%Inpria (United States)0.000035% in 20252020

Fractional works of Inpria (United States) over all fractional works that year. How the balance of science has shifted.

Other research institutions in Corvallis

All research institutions in Corvallis

Research measures only: rankings here say nothing about teaching, admissions or student experience. Comparable institutions and collaboration partners have tabs of their own, above.

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