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Topic · Electrical and Electronic Engineering

Advancements in Photolithography Techniques

Advancements in Photolithography Techniques is a research topic within Electrical and Electronic Engineering. Science Explorer counts 22k research works in it since 1950. 9.3% of them reached the world's top 10% most cited for their field and year.

This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography.

  • Electron Beam Lithography
  • Nanofabrication
  • Resolution Limits
  • Chemically Amplified Resists
  • Extreme Ultraviolet Lithography
  • Line Edge Roughness
  • Nanolithography Techniques
  • Patterning Materials
  • High-Resolution Patterning
  • Mask Design
Research works
22k
fractional, since 1950
In the world top 10%
2.1k
per year above
Top-10% rate
9.3%
share of its works in the world top 10%
Growth, 2013–17 → 2018–22
-26%
the tick is no change

Which countries lead Advancements in Photolithography Techniques research?

By volume, China and the United States publish the most (495 and 416 works in 2022–2025).

By volume, 2022–2025

  1. 1 China 495 works
  2. 2 United States 416 works
  3. 3 Japan 197 works
  4. 4 Germany 136 works
  5. 5 South Korea 135 works
  6. 6 Belgium 85 works
  7. 7 Taiwan 67 works
  8. 8 India 57 works
  9. 9 France 57 works
  10. 10 Netherlands 51 works

How concentrated that is

The same countries as shares of everything the list above accounts for. A node where two countries do two thirds of the work and one spread evenly across twelve read alike as a ranking and not at all alike here.

China: 29.2%United States: 24.5%Japan: 11.6%Germany: 8.0%6 others listed: 26.7%29%largest
China495 · 29.2%United States416 · 24.5%Japan197 · 11.6%Germany136 · 8.0%6 others listed453 · 26.7%

Shares of the rows listed above, not of the whole node.

Which institutions lead Advancements in Photolithography Techniques research?

By volume in 2022–2025, IMEC publishes the most Advancements in Photolithography Techniques research, followed by Samsung (South Korea) and ASML (Netherlands).

By volume, 2022–2025

  1. 1 IMECBelgium 62 works
  2. 2 Samsung (South Korea)South Korea 38 works
  3. 3 ASML (Netherlands)Netherlands 30 works
  4. 4 University of Chinese Academy of SciencesChina 27 works
  5. 5 Chinese Academy of SciencesChina 26 works
  6. 6 Zhejiang UniversityChina 18 works
  7. 7 Intel (United States)United States 16 works
  8. 8 Beijing Institute of TechnologyChina 15 works
  9. 9 Hanyang UniversitySouth Korea 14 works
  10. 10 Fudan UniversityChina 14 works

Where is Advancements in Photolithography Techniques research done?

The largest centres of Advancements in Photolithography Techniques research in 2022–2025 are Beijing (China), Tokyo (Japan), Seoul (South Korea) and Shanghai (China). Among places with at least 20 works in it, it is an unusually large share of all research in Veldhoven, Santa Clara and Leuven.

Largest cities, 2022–2025

  1. 1 Beijing China 142 works
  2. 2 Tokyo Japan 104 works
  3. 3 Seoul South Korea 93 works
  4. 4 Shanghai China 84 works
  5. 5 Leuven Belgium 73 works
  6. 6 Santa Clara United States 34 works
  7. 7 Veldhoven Netherlands 30 works
  8. 8 Hsinchu Taiwan 29 works
  9. 9 Hangzhou China 27 works
  10. 10 Hefei China 23 works

Where it is the local speciality

  1. VeldhovenNL · 30.3 works731×
  2. Santa ClaraUS · 33.6 works65×
  3. LeuvenBE · 73.1 works34×
← less than its size predicts1×more →

Location quotient: how much more of its research is in Advancements in Photolithography Techniques than the world average.

See Advancements in Photolithography Techniques on the map

Where is the best place to study Advancements in Photolithography Techniques?

Among universities, judged by research, Chinese University of Hong Kong, Sungkyunkwan University and University of Chinese Academy of Sciences score highest, combining excellence, specialisation, size, growth and international reach. Research strength is one signal when choosing where to study; it does not measure teaching.

0%10%20%mean 7.9%fractional works in this node (log) →share in the world top 10% →Chinese University of Hong Kong: 11, 11.3%Sungkyunkwan University: 9, 17.4%University of Chinese Academy of Sciences: 27, 7.0%Hanyang University: 14, 4.0%Korea Advanced Institute of Science and Technology: 8, 5.2%Fudan University: 14, 7.2%The University of Osaka: 13, 3.5%Tsinghua University: 13, 14.9%Zhejiang University: 18, 8.5%University of Hyogo: 10, 0.0%Sungkyunkwan Univers…Chinese University o…University of Chines…Hanyang University
above the meannear itbelow it

One dot per university in the table below. The upper left is the interesting corner: small places doing unusually strong work.

#UniversityScoreTop 10%SpecialisationWorksGrowth
1 Chinese University of Hong KongHong Kong 65.111.3%7.9×11 +198.1%
2 Sungkyunkwan UniversitySouth Korea 57.317.4%8.6×9 -11.6%
3 University of Chinese Academy of SciencesChina 53.97.0%8.3×27 +88.4%
4 Hanyang UniversitySouth Korea 44.94.0%17.5×14 +14.9%
5 Korea Advanced Institute of Science and TechnologySouth Korea 41.35.2%9.2×8 +53.3%
6 Fudan UniversityChina 39.97.2%6.3×14 +65.2%
7 The University of OsakaJapan 39.43.5%11.0×13 -38.3%
8 Tsinghua UniversityChina 36.114.9%3.4×13 -51.7%
9 Zhejiang UniversityChina 31.78.5%4.5×18 -67.4%
10 University of HyogoJapan 30.50.0%87.2×10 -25.4%

Universities only. Score blends excellence (30%), specialisation (25%), size (20%), growth (15%) and international reach (10%), 2015–2022; growth compares 2010–14 with 2015–19.

Is Advancements in Photolithography Techniques research growing?

Output in 2018–2022 was 26% lower than in 2013–2017, peaking in 2002.

19801990200020102020
grewheldshrank

The same series as a ribbon — one cell per year, darker for more. The line above answers how much; this answers when.

Which topics inside it are moving

Growth and decline on one axis around a shared zero. Two lists side by side hide the thing that matters: whether the growth dwarfs the decline, or the other way round.