Science Explorer Back to mapMap

Advancements in Photolithography Techniques

Advancements in Photolithography Techniques is a research topic within Electrical and Electronic Engineering. Science Explorer counts 22k research works in it since 1950. 10.0% of them reached the world's top 10% most cited for their field and year.

This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography.

  • Electron Beam Lithography
  • Nanofabrication
  • Resolution Limits
  • Chemically Amplified Resists
  • Extreme Ultraviolet Lithography
  • Line Edge Roughness
  • Nanolithography Techniques
  • Patterning Materials
  • High-Resolution Patterning
  • Mask Design
Research works
22k
fractional, since 1950
In the world top 10%
2.2k
per year above
Top-10% rate
10.0%
share of its works in the world top 10%
Growth, 2018-21 → 2022-25
+22%
the tick is no change
Largest producer
China
31% of the 10 largest, 2022-now
Advancements in Photolithography Techniques

Which countries lead Advancements in Photolithography Techniques research?

By volume, China and the United States publish the most (575 and 451 works in 2022-now).

By volume, 2022-now

  1. 1 China 575 works
  2. 2 United States 451 works
  3. 3 Japan 209 works
  4. 4 South Korea 152 works
  5. 5 Germany 143 works
  6. 6 Belgium 91 works
  7. 7 Taiwan 72 works
  8. 8 India 62 works
  9. 9 France 58 works
  10. 10 Netherlands 56 works

How concentrated that is

The same countries as shares of everything the list above accounts for. A node where two countries do two thirds of the work and one spread evenly across twelve read alike as a ranking and not at all alike here.

China: 30.8%United States: 24.1%Japan: 11.2%South Korea: 8.1%6 others listed: 25.8%31%largest
China575 · 30.8%United States451 · 24.1%Japan209 · 11.2%South Korea152 · 8.1%6 others listed483 · 25.8%

Shares of the rows listed above, not of the whole node.

Which institutions lead Advancements in Photolithography Techniques research?

By volume in 2022-now, Chinese Academy of Sciences publishes the most Advancements in Photolithography Techniques research, followed by IMEC and Samsung (South Korea).

Who are the leading researchers in Advancements in Photolithography Techniques?

The most-cited researchers publishing on Advancements in Photolithography Techniques include Zhong Lin Wang, Stephan Windecker and George M. Whitesides.

  1. 1 Zhong Lin Wang United States 491k citations
  2. 2 Stephan Windecker Switzerland 338k citations
  3. 3 George M. Whitesides United States 267k citations
  4. 4 Kenji Watanabe Japan 237k citations
  5. 5 Rodney S. Ruoff United States 231k citations
  6. 6 Takashi Taniguchi Japan 227k citations
  7. 7 Kai You Wang China 224k citations
  8. 8 Lei Jiang China 214k citations
  9. 9 M. Costa France 207k citations
  10. 10 Younan Xia United States 207k citations

Ranked by citations received across their whole record, among researchers with at least three works on this topic.

What are the most cited papers in Advancements in Photolithography Techniques?

The most cited paper in Advancements in Photolithography Techniques is "IMPROVEMENTS IN EPOXY RESIN EMBEDDING METHODS" (John H. Luft, 1961), with 10,256 citations. Next come "A SIMPLIFIED LEAD CITRATE STAIN FOR USE IN ELECTRON MICROSCOPY" (4,625) and "Soft Lithography" (4,275).

Most cited papers
#PaperReleasedCitations
1 IMPROVEMENTS IN EPOXY RESIN EMBEDDING METHODS John H. Luft · The Journal of Cell Biology Open access Feb 1961 10,256
2 A SIMPLIFIED LEAD CITRATE STAIN FOR USE IN ELECTRON MICROSCOPY John H. Venable, Richard E. Coggeshall · The Journal of Cell Biology Open access May 1965 4,625
3 Soft Lithography Younan Xia, George M. Whitesides · Angewandte Chemie International Edition 16 Mar 1998 4,275
4 Imprint of sub-25 nm vias and trenches in polymers Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters 20 Nov 1995 2,715
5 X-ray photoelectron spectroscopy: Towards reliable binding energy referencing Grzegorz Greczyński, Lars Hultman · Progress in Materials Science Open access 30 Jul 2019 2,534
All 100 most cited papers, with filters and sorting

Where is Advancements in Photolithography Techniques research done?

The largest centres of Advancements in Photolithography Techniques research in 2022-now are Beijing (China), Tokyo (Japan), Seoul (South Korea) and Shanghai (China). Among places with at least 20 works in it, it is an unusually large share of all research in Veldhoven, Santa Clara and Leuven.

Largest cities, 2022-now

  1. 1 BeijingChina 158 works
  2. 2 TokyoJapan 109 works
  3. 3 SeoulSouth Korea 103 works
  4. 4 ShanghaiChina 92 works
  5. 5 LeuvenBelgium 78 works
  6. 6 Santa ClaraUnited States 36 works
  7. 7 VeldhovenNetherlands 32 works
  8. 8 HsinchuTaiwan 31 works
  9. 9 HangzhouChina 30 works
  10. 10 HefeiChina 26 works

Where it is the local speciality

  1. VeldhovenNL · 32.3 works728×
  2. Santa ClaraUS · 35.5 works64×
  3. LeuvenBE · 78.1 works34×
← less than its size predicts1×more →

Location quotient: how much more of its research is in Advancements in Photolithography Techniques than the world average.

See Advancements in Photolithography Techniques on the map

Where is the best place to study Advancements in Photolithography Techniques?

Among universities, judged by research, Chinese University of Hong Kong, University of Chinese Academy of Sciences and Sungkyunkwan University score highest, combining excellence, specialisation, size, growth and international reach. Research strength is one signal when choosing where to study; it does not measure teaching.

0%20%40%mean 16.97%fractional works in this field (log) →share of work in the world top 10% →Chinese University o…Tsinghua UniversitySungkyunkwan Univers…University of Chines…
above the meannear itbelow it

One dot per university in the first ten of the table below, at the default weights. The upper left is the interesting corner: small places doing unusually strong work.

Excellenceshare of its work in the world top 10%, 2022-now and all time averaged
40%
Specialisationhow much of its work is in this field, counted up to 10× the world share
10%
Sizeits output in this field, on a log scale
30%
Growthoutput growth, counted from -20% to +20%
10%
Internationalshare of its work with a co-author abroad
10%
Each slider sets a weight; the share it gets of the score is beside it.
#UniversityScoreTop 10%SpecialisationWorksGrowth
1Chinese University of Hong KongChina 77.130.3%8.6×12 +38.8%
2University of Chinese Academy of SciencesChina 62.413.6%9.7×30 +64.3%
3Sungkyunkwan UniversitySouth Korea 53.926.0%8.2×11 +79.5%
4Tsinghua UniversityChina 52.427.1%3.7×16 +246.2%
5Zhejiang UniversityChina 49.214.2%3.9×20 +332.6%
6KU LeuvenBelgium 44.720.5%5.3×10 +161.7%
7Beijing Institute of TechnologyChina 43.210.3%6.9×15 +20.2%
8Hanyang UniversitySouth Korea 40.78.7%19.3×16 +37.0%
9Fudan UniversityChina 39.97.5%5.2×16 +71.2%
10The University of OsakaJapan 39.011.5%11.7×14 -11.1%

Universities only. The score blends excellence (40%), size (30%), specialisation (10%), growth (10%), international reach (10%), 2022-now; growth compares 2018-21 with 2022-25 and counts up to +20%, since a jump from a small base is mostly noise.

Every institution in Advancements in Photolithography Techniques, country by country

Is Advancements in Photolithography Techniques research growing?

Output in 2022-2025 was 22% higher than in 2018-2021, peaking in 2002. The fastest-growing topics are Advancements in Photolithography Techniques.

still counting19801990200020102020
grewheldshrank

The same series as a ribbon: one cell per year, darker for more. The line above answers how much; this answers when.

Its share of all research

Growing output can still be a shrinking share: all of science grows. This is Advancements in Photolithography Techniques as a percentage of every work published that year, 0.010% in 2024.

still counting0.020%0.040%0.060%Advancements in Photolithography Techniques0.010% in 202519801990200020102020

Fractional works of Advancements in Photolithography Techniques over all fractional works that year. How the balance of science has shifted.

How much of it reaches the world top 10%

Year by year.

still counting5%10%15%Advancements in Photolithography Techniques9.7% in 2025200020102020

Of each year's works in it, the share that reached the world's 10% most cited for their field and year. A field is the world for its own topics, so there is no other line to hold it against.

Which topics inside it are moving

Growth and decline on one axis around a shared zero. Two lists side by side hide the thing that matters: whether the growth dwarfs the decline, or the other way round.

Discussion

Ask a question or share a note about Advancements in Photolithography Techniques. Posts are plain text and can be reported.