Most cited papers in Advancements in Photolithography Techniques
What are the most cited papers in Advancements in Photolithography Techniques?
The most cited paper in Advancements in Photolithography Techniques is "IMPROVEMENTS IN EPOXY RESIN EMBEDDING METHODS" (John H. Luft, 1961), with 10,256 citations. Next come "A SIMPLIFIED LEAD CITRATE STAIN FOR USE IN ELECTRON MICROSCOPY" (4,625) and "Soft Lithography" (4,275).
Showing 50 of 100 papers. Every paper with more than 327 citations is listed.
| # | Paper | ||
|---|---|---|---|
| 1 | IMPROVEMENTS IN EPOXY RESIN EMBEDDING METHODS John H. Luft · The Journal of Cell Biology | Feb 1961 | 10,256 |
| 2 | A SIMPLIFIED LEAD CITRATE STAIN FOR USE IN ELECTRON MICROSCOPY John H. Venable, Richard E. Coggeshall · The Journal of Cell Biology | May 1965 | 4,625 |
| 3 | Soft Lithography Younan Xia, George M. Whitesides · Angewandte Chemie International Edition | 16 Mar 1998 | 4,275 |
| 4 | Imprint of sub-25 nm vias and trenches in polymers Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters | 20 Nov 1995 | 2,715 |
| 5 | X-ray photoelectron spectroscopy: Towards reliable binding energy referencing Grzegorz Greczyński, Lars Hultman · Progress in Materials Science | 30 Jul 2019 | 2,534 |
| 6 | Soft lithography for micro- and nanoscale patterning Dong Qin, Younan Xia, George M. Whitesides · Nature Protocols | 18 Feb 2010 | 2,368 |
| 7 | Imprint Lithography with 25-Nanometer Resolution Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Science | 5 Apr 1996 | 2,272 |
| 8 | Radiation damage in the TEM and SEM Ray F. Egerton, P. Li, Marek Malac · Micron | 6 Mar 2004 | 2,141 |
| 9 | Nanoimprint Lithography: Methods and Material Requirements L. Jay Guo · Advanced Materials | 25 Jan 2007 | 1,837 |
| 10 | Nanoimprint lithography Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena | Nov 1996 | 1,723 |
| 11 | CASINO V2.42—A Fast and Easy‐to‐use Modeling Tool for Scanning Electron Microscopy and Microanalysis Users Dominique Drouin, Alexandre Réal Couture, Dany Joly et al. · Scanning | 23 Apr 2007 | 1,546 |
| 12 | New spectral methods for ratio cut partitioning and clustering L. Hagen, Andrew B. Kahng · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | 1992 | 1,300 |
| 13 | Electron beam lithography: resolution limits and applications Christophe Vieu, F. Carcenac, A. Pépin et al. · Applied Surface Science | Sep 2000 | 1,139 |
| 14 | Sub-10 nm imprint lithography and applications Stephen Y. Chou, Peter R. Krauss, Wei Zhang et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena | Nov 1997 | 1,117 |
| 15 | Secondary electron emission in the scanning electron microscope Hellmut Seiler · Journal of Applied Physics | Nov 1983 | 1,028 |
| 16 | SU-8: a low-cost negative resist for MEMS H. Lorenz, M. Despont, N. Fahrni et al. · Journal of Micromechanics and Microengineering | Sep 1997 | 982 |
| 17 | The reconstruction of a three-dimensional structure from projections and its application to electron microscopy Richard Anthony Crowther, David J. DeRosier, Aaron Klug · Proceedings of the Royal Society of London A Mathematical and Physical Sciences | 23 Jun 1970 | 979 |
| 18 | Pushing the limits of lithography Takashi Ito, Shinji Okazaki · Nature | Aug 2000 | 897 |
| 19 | Nanofabrication by electron beam lithography and its applications: A review Yifang Chen · Microelectronic Engineering | Mar 2015 | 859 |
| 20 | New Generation of Predictive Technology Model for Sub-45 nm Early Design Exploration Wei Ping Zhao, Yu Kevin Cao · IEEE Transactions on Electron Devices | 30 Oct 2006 | 858 |
| 21 | SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography Aránzazu del Campo, Christian Greiner · Journal of Micromechanics and Microengineering | 15 May 2007 | 824 |
| 22 | AN IMPROVED STAINING METHOD FOR ELECTRON MICROSCOPY Jerome G. Stempak, Robert T. Ward · The Journal of Cell Biology | Sep 1964 | 806 |
| 23 | ASAP7: A 7-nm finFET predictive process design kit Lawrence T. Clark, Vinay Vashishtha, L. Shifren et al. · Microelectronics Journal | 3 May 2016 | 777 |
| 24 | Recent progress in nanoimprint technology and its applications L. Jay Guo · Journal of Physics D Applied Physics | 12 May 2004 | 734 |
| 25 | A Dynamical Theory of Diffraction for a Distorted Crystal Satio Takagi · Journal of the Physical Society of Japan | May 1969 | 731 |
| 26 | Nanoimprint lithography: An old story in modern times? A review Helmut Schift · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena | Mar 2008 | 731 |
| 27 | Improved Pattern Transfer in Soft Lithography Using Composite Stamps Teri W. Odom, John Christopher Love, Daniel B. Wolfe et al. · Langmuir | 16 May 2002 | 714 |
| 28 | Surface Chemistry for Atomic Layer Growth Steven M. George, Andrew W. Ott, J. W. Klaus · The Journal of Physical Chemistry | 1996 | 680 |
| 29 | Siloxane Polymers for High-Resolution, High-Accuracy Soft Lithography Heinz Schmid, Bruno Michel · Macromolecules | 25 Mar 2000 | 676 |
| 30 | Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting Se Hyun Ahn, L. Jay Guo · ACS Nano | 2 Jul 2009 | 669 |
| 31 | Advanced scanning probe lithography Ricardo Alexandrino Garcia, Armin W. Knoll, Elisa Riedo · Nature Nanotechnology | Aug 2014 | 664 |
| 32 | Mold-assisted nanolithography: A process for reliable pattern replication Jan Haisma, Martin J. Verheijen, Kees van den Heuvel et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena | Nov 1996 | 664 |
| 33 | Improving resolution in photolithography with a phase-shifting mask M. D. Levenson, N.S. Viswanathan, R. A. Simpson · IEEE Transactions on Electron Devices | Dec 1982 | 654 |
| 34 | X-rays and extreme ultraviolet radiation: principles and applications David T. Attwood, Anne Sakdinawat · CERN Document Server (European Organization for Nuclear Research) | 2016 | 645 |
| 35 | Lithography gets extreme Christian C. Wagner, Noreen Harned · Nature Photonics | 23 Dec 2009 | 641 |
| 36 | Block Copolymer Lithography Christopher M. Bates, Michael J. Maher, Dustin W. Janes et al. · Macromolecules | 7 Nov 2013 | 631 |
| 37 | High‐Speed Roll‐to‐Roll Nanoimprint Lithography on Flexible Plastic Substrates Se Hyun Ahn, L. Jay Guo · Advanced Materials | 24 Apr 2008 | 623 |
| 38 | An ESCA method for determining the oxide thickness on aluminum alloys Brian R. Strohmeier · Surface and Interface Analysis | 1990 | 598 |
| 39 | Electrical Modeling and Characterization of Through Silicon via for Three-Dimensional ICs Guruprasad Katti, Michele Stucchi, Kristin De Meyer et al. · IEEE Transactions on Electron Devices | Dec 2009 | 591 |
| 40 | Determining the optimal PDMS–PDMS bonding technique for microfluidic devices Mark A. Eddings, Michael Austin Johnson, Bruce K. Gale · Journal of Micromechanics and Microengineering | 25 Apr 2008 | 567 |
| 41 | Viscoelastic Properties of Polymers Thomas Hoffmann · Nanostructure science and technology | 2003 | 565 |
| 42 | A SAXS/WAXS/GISAXS Beamline with Multilayer Monochromator Alexander Hexemer, Wim Bras, James M. Glossinger et al. · Journal of Physics Conference Series | Oct 2010 | 544 |
| 43 | Multiple Ink Nanolithography: Toward a Multiple-Pen Nano-Plotter Seunghun Hong, Jin Song Zhu, Chad Alexander Mirkin · Science | 15 Oct 1999 | 542 |
| 44 | Proximity effect in electron-beam lithography T. H. P. Chang · Journal of Vacuum Science and Technology | Nov 1975 | 541 |
| 45 | Polymer Pen Lithography Fengwei Huo, Zijian Zheng, Gengfeng Zheng et al. · Science | 14 Aug 2008 | 537 |
| 46 | Embedded Deterministic Test Janusz Rajski, Jerzy Tyszer, Mark Kassab et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems | May 2004 | 529 |
| 47 | Elastic Scattering Corrections in AES and XPS. II. Estimating Attenuation Lengths and Conditions Required for their Valid Use in Overlayer/Substrate Experiments Peter J. Cumpson, Martin P. Seah · Surface and Interface Analysis | Jun 1997 | 525 |
| 48 | Electron beam lithography in nanoscale fabrication: recent development Ampere A. Tseng, Kuan Chen, C.D. Chen et al. · IEEE Transactions on Electronics Packaging Manufacturing | Apr 2003 | 522 |
| 49 | Block copolymer micelle nanolithography Roman Glass, Martin Mu ̈ller, Joachim Pius Spatz · Nanotechnology | 5 Sep 2003 | 513 |
| 50 | Phase Retrieval via Matrix Completion Emmanuel J. Candès, Yonina C. Eldar, Thomas Strohmer et al. · SIAM Review | 2015 | 513 |
Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for a field when OpenAlex files it under one of the field's topics; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.