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Institution · ProMOS Technologies (Taiwan)

Most cited papers from ProMOS Technologies (Taiwan)

ProMOS Technologies (Taiwan)

What are the most cited papers from ProMOS Technologies (Taiwan)?

The most cited paper from ProMOS Technologies (Taiwan) is "�ber die Eigenschaften, Herkunft und physiologischen Funktionen der die H-Ionenkonzentration bestimmenden Wirkstoffe in der verhornten Epidermis" (Alexander Szakáll, 1955), with 99 citations. Next come "High density metal-insulator-metal capacitor based on ZrO2∕Al2O3∕ZrO2 laminate dielectric" (74) and "Effects of O2 thermal annealing on the properties of CVD Ta2O5 thin films" (43).

Showing 50 of 61 papers. Every paper with more than 1 citations is listed.

Most cited papers, sortable by citations and release date
#Paper
1 �ber die Eigenschaften, Herkunft und physiologischen Funktionen der die H-Ionenkonzentration bestimmenden Wirkstoffe in der verhornten Epidermis Alexander Szakáll · Archives of Dermatological Research 1955 99
2 High density metal-insulator-metal capacitor based on ZrO2∕Al2O3∕ZrO2 laminate dielectric Yung‐Hsien Wu, Chien-Kang Kao, Bo‐Yu Chen et al. · Applied Physics Letters 21 Jul 2008 74
3 Effects of O2 thermal annealing on the properties of CVD Ta2O5 thin films J. S. Lee, Shoou‐Jinn Chang, J.F. Chen et al. · Materials Chemistry and Physics 14 Oct 2002 43
4 Nitrided Tetragonal $\hbox{ZrO}_{2}$ as the Charge-Trapping Layer for Nonvolatile Memory Application Yung‐Hsien Wu, Lun-Lun Chen, Yuan-Sheng Lin et al. · IEEE Electron Device Letters 13 Nov 2009 37
5 Tests for resistive and capacitive defects in address decoders M. Klaus, A.J. van de Goor Conference paper 14 Nov 2002 32
6 Tetragonal $\hbox{ZrO}_{2}/\hbox{Al}_{2}\hbox{O}_{3}$ Stack as High-$\kappa$ Gate Dielectric for Si-Based MOS Devices Yung‐Hsien Wu, Lun-Lun Chen, Rong-Jhe Lyu et al. · IEEE Electron Device Letters 22 Jul 2010 30
7 Augmented reachability trees for 1-place-unbounded generalized Petri nets Mu Der Jeng, Peng Mao · IEEE Transactions on Systems Man and Cybernetics - Part A Systems and Humans Mar 1999 29
8 Nonmetric Camera Calibration for Underwater Laser Scanning System Chau‐Chang Wang, Cheng Min-Shine · IEEE Journal of Oceanic Engineering Apr 2007 26
9 The impact of acceleration/deceleration on travel-time models in class-based automated S/R systems U.P. Wen, Ding‐Tsair Chang, S.P. CHEN · IIE Transactions Jul 2001 25
10 Effect of Process Pressure on Atomic Layer Deposition of Al[sub 2]O[sub 3] Ming-Yen Li, Yung-Yuan Chang, Hsiao-Che Wu et al. · Journal of The Electrochemical Society Open access 2007 25
11 A Novel Cross-Spacer Phase Change Memory with Ultra-Small Lithography Independent Contact Area W.S. Chen et al. Conference paper Dec 2007 25
12 Tungsten oxide/tungsten nanocrystals for nonvolatile memory devices C. H. Chen, T. C. Chang, I. H. Liao et al. · Applied Physics Letters 7 Jan 2008 25
13 Synthesis and luminescence properties of YInGe2O7 phosphors activated by dysprosium ions Pin-Lun Dai, Bin‐Siang Tsai, Yeou-Yih Tsai et al. · Optical Materials 3 Nov 2009 21
14 An analytical threshold voltage model of NMOSFETs with hot-carrier induced interface charge effect Chia-Tung Ho, Kuo-Yin Huang, Ming Tang et al. · Microelectronics Reliability Open access 13 Dec 2004 21
15 An analytical subthreshold current model for pocket-implanted NMOSFETs Chia-Tung Ho, Juin Jei Liou, Kuo-Yin Huang et al. · IEEE Transactions on Electron Devices Open access Jun 2003 18
16 Structure and property changes of ZrO2/Al2O3/ZrO2 laminate induced by low-temperature NH3 annealing applicable to metal–insulator–metal capacitor Ming-Yen Li, Bin‐Siang Tsai, Pei-Chuen Jiang et al. · Thin Solid Films 15 Apr 2010 16
17 Novel Ultra-Low Voltage and High-Speed Programming/Erasing Schemes for SONOS Flash Memory with Excellent Data Retention Steve Shao-Shiun Chung, Y. H. Tseng, Chao‐Sung Lai et al. Conference paper Dec 2007 15
18 Evaluating MOSFET harmonic distortion by successive integration of the I–V characteristics Ramon B. Salazar, A. Ortíz-Conde, Francisco J. García-Sánchez et al. · Solid-State Electronics Open access 29 May 2008 15
19 A Simple Method to Extract Source/Drain Series Resistance for Advanced MOSFETs Yang-Hua Chang, Yi-Ting Wu, Chia-Tung Ho Conference paper 2007 13
20 Tungsten nanocrystal memory devices improved by supercritical fluid treatment C. H. Chen, Tien‐Chun Chang, I. H. Liao et al. · Applied Physics Letters 3 Dec 2007 13
21 Infinite capacity planning for IC packaging plants James C. Chen, Ling‐Huey Su, Cheng‐Ju Sun et al. · International Journal of Production Research 28 Oct 2009 13
22 Extending storage dielectric scaling limit by reoxidizing nitrided NO dielectric for trench DRAM Yung‐Hsien Wu, E. R. Hsieh, Ren-Jay Kuo et al. · IEEE Electron Device Letters 24 Jan 2005 12
23 Characterization and Improvement in the Corrosion Performance of a Hot-Chamber Diecast Mg Alloy Thin Plate by the Removal of Interdendritic Phases at the Die Chill Layer Jun-Yen Uan, Ching-Fei Li, Bing-Lung Yu · Metallurgical and Materials Transactions A 22 Jan 2008 12
24 Influence of polysilicon-gate depletion on the subthreshold behavior of submicron MOSFETs Juin Jei Liou, Rozina Shireen, A. Ortíz-Conde et al. · Microelectronics Reliability Open access Mar 2002 11
25 Determination of gate-bias dependent source/drain series resistance and effective channel length for advanced MOS devices Chia-Tung Ho, Yu-Wen Lo, Yang-Hua Chang et al. · Solid-State Electronics Open access 28 Oct 2006 10
26 Über die Funktion des Stratum corneum conjunctum der Haut als Wasserbarriere beim lebenden Menschen: Die Rolle der Lipoide Alexander Szakáll · Fette Seifen Anstrichmittel 1959 9
27 Nonvolatile memory effect of tungsten nanocrystals under oxygen plasma treatments Shih-Cheng Chen, Ting‐Chang Chang, Wei-Ren Chen et al. · Thin Solid Films Jun 2010 9
28 PENGARUH PROMOSI, BRAND AMBASSADOR DAN KOREAN WAVE TERHADAP MINAT BELI PRODUK SOMETHINC Nanda Puspitasari, Naila Aphrodite, Eman Sulaeman · Warta Dharmawangsa Open access 8 Feb 2023 8
29 Formation and nonvolatile memory characteristics of W nanocrystals by in-situ steam generation oxidation Shih-Cheng Chen, Ting‐Chang Chang, Chieh‐Ming Hsieh et al. · Thin Solid Films 8 Sep 2010 8
30 Profile control in high aspect ratio contact hole etching by a capacitively coupled plasma source T.F. Yen, Kang J. Chang, Kuo‐Feng Chiu · Microelectronic Engineering 29 Jul 2005 8
31 Investigation of DC Hot-Carrier Degradation at Elevated Temperatures for p-Channel Metal–Oxide–Semiconductor Field-Effect Transistors of 0.13 µm Technology Shuang‐Yuan Chen, Chia-Hao Tu, Jung-Chun Lin et al. · Japanese Journal of Applied Physics Open access Mar 2008 7
32 Quantification issues of trace metals analysis on silicon oxide and nitride films by using VPD‐ICP‐MS and VPD‐GF‐AAS Ming‐Peng Yeh, Casey Hsien, Cheng‐Sung Huang et al. · Surface and Interface Analysis 2008 7
33 Enhancing DRAM printing process window by using inverse lithography technology (ILT) Chih‐Wei Chu, Becky Tsao, Karl Chiou et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 10 Mar 2006 7
34 Backside Wafer Damage Induced Wafer Front Side Defect and Yield Impact Neng-Cheng Wang, Hui-An Chang, Chunqi Chang et al. Conference paper Jun 2007 6
35 71.2: Distinguished Paper : iMoD™ Display Manufacturing Philip D. Floyd et al. · SID Symposium Digest of Technical Papers Conference paper Jun 2006 6
36 Context-based State Estimation in Semiconductor Manufacturing: Reference Path Based State Transformation Approach An‐Jhih Su, Cheng‐Ching Yu, Jyh‐Cheng Jeng et al. · IFAC Proceedings Volumes Conference paper 2008 5
37 Dielectric response theory for electron energy loss in clad cylindrical systems Y.H. Tu, C.M. Kwei, Y. C. Li et al. · Physical Review B 6 Jul 2006 5
38 Photo-resist trimming for sub 0.1 μm generation integrated circuit devices by Cl2/O2 transform coupled plasma Tsung-Fu Yen Tsung-Fu Yen, C. M. Chiu, Kuo‐Feng Chiu · Microelectronic Engineering 29 Jun 2004 5
39 Influence of hydrogen plasma treatment on charge storage characteristics in high density tungsten nanocrystal nonvolatile memory Shih-Cheng Chen, Ting‐Chang Chang, Wei-Ren Chen et al. · Thin Solid Films 28 Jan 2011 5
40 Augmented Cell Performance of NO-Based Storage Dielectric by N $_2$ O-Treated Nitride Film for Trench DRAM Yung‐Hsien Wu, Chih‐Ming Chang, Chun-Yao Wang et al. · IEEE Electron Device Letters 25 Jan 2008 4
41 Understanding of the Leakage Components and Its Correlation to the Oxide Scaling on the SONOS Cell Endurance and Retention Chin‐Chung Chen, Pei-Wei Chiang, Steve Shao-Shiun Chung et al. · Proceedings of the International Power Modulator Symposium and High Voltage Workshop/Proceedings of the ... International Power Modulator Symposium and ... High Voltage Workshop Conference paper Apr 2006 4
42 Boron-Retarded Gate Dielectric Formed by Dry Oxidation of Thermal Nitride Yung‐Hsien Wu, Chia-Lin Ku, Jiun-Fang Wang · Journal of The Electrochemical Society Open access 19 Dec 2003 4
43 Real-time fault detection and classification for manufacturing etch tools M.F. Chen, T.F. Yen, Barry Coonan Conference paper 21 Mar 2005 4
44 Effect of Process Pressure on Atomic Layer Deposition of Al2O3 Ming-Yen Li, Yung-Yuan Chang, Hsiao-Che Wu et al. · ECS Transactions Conference paper 18 Jul 2007 3
45 High-Density Silicon Nanocrystal Formed on Nitrided Tunnel Oxide for Nonvolatile Memory Application Yung‐Hsien Wu, Chien-Kang Kao, Chun-Yao Wang et al. · Electrochemical and Solid-State Letters Open access 2008 3
46 An analytical threshold voltage model of NMOSFETs with hot-carrier induced interface charge effect Kuo-Yin Huang, Chia-Tung Ho, Ming Tang et al. Conference paperOpen access 2004 3
47 Process window impact of progressive mask defects, its inspection and disposition techniques (go/no-go criteria) via a lithographic detector Jerry Huang, Lan-Hsin Peng, Chih‐Wei Chu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 21 Oct 2005 3
48 A novel approach for hot-spot removal for sub-100nm manufacturing Melody Ma, Melissa S. Anderson, Weinong Lai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 6 Oct 2006 3
49 An integrated photolithography system framework for automatic manufacturing in mass production 300mm Fab Yung-Yao Lee, Cheng-Fa Lin, Pi-Min Hsu et al. Conference paper 2007 2
50 O Homo Calamitatem: a comunicação de riscos e de catástrofes na evolução da insegurança social Carlos Horacio Lozano Ascencio, Márcia Franz Amaral · Animus Revista Interamericana de Comunicação Midiática Open access 22 Dec 2015 2

Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.