A.R. Shul'man
A.R. Shul'man publishes mostly in Surfaces, Coatings and Films, Materials Chemistry and Electrical and Electronic Engineering, on topics such as Electron and X-Ray Spectroscopy Techniques, Plasma Diagnostics and Applications and Catalytic Processes in Materials Science.
- World rank
- #6,426,095 of 7,710,434 ranked researchers
- Rank in Germany
- #324,096 of 364,343
- Works
- 17
- Citations
- 7
- Citations per work
- 0.4
What does A.R. Shul'man research?
A.R. Shul'man's work is mostly in Materials Science (37%), Engineering (26%), Chemistry (8%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1271.1%
- Materials Science636.8%
- Engineering426.4%
- Chemistry17.9%
- Everything else528.9%
- 1Surfaces, Coatings and Films18% of their works
- 2Materials Chemistry18% of their works
- 3Electrical and Electronic Engineering13% of their works
- 4Aerospace Engineering8% of their works
- 5Organic Chemistry8% of their works
- 6Mechanical Engineering5% of their works
Research topics
- Electron and X-Ray Spectroscopy Techniques
- Plasma Diagnostics and Applications
- Catalytic Processes in Materials Science
- Cultural Heritage Materials Analysis
- Synthesis and biological activity
- Chemical Thermodynamics and Molecular Structure
- Photopolymerization techniques and applications
- Advanced Physical and Chemical Molecular Interactions
Which keywords describe A.R. Shul'man's research?
The keywords of their largest research topics: Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Catalysis, Nanoparticles, Plasma Etching, Raman Spectroscopy, Semiconductor Industry and X-Ray Fluorescence.
- Vaporization
- Photoinitiation
- Medicinal Chemistry
- Enthalpies
- X-Ray Fluorescence
- Raman Spectroscopy
- Nanoparticles
- X-ray Photoelectron Spectroscopy
- Scanning Electron Microscopy
- Catalysis
- Plasma Etching
- Semiconductor Industry
- Computational Chemistry
- Heterocyclic Compounds
- Molecular Simulation
- Polymerization
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 16 words, with their numbers
- Scanning Electron Microscopy71 topic
- X-ray Photoelectron Spectroscopy71 topic
- Catalysis21 topic
- Nanoparticles21 topic
- Plasma Etching21 topic
- Raman Spectroscopy21 topic
- Semiconductor Industry21 topic
- X-Ray Fluorescence21 topic
- Computational Chemistry11 topic
- Enthalpies11 topic
- Heterocyclic Compounds11 topic
- Medicinal Chemistry11 topic
- Molecular Simulation11 topic
- Photoinitiation11 topic
- Polymerization11 topic
- Vaporization11 topic
Where does A.R. Shul'man work?
A.R. Shul'man's main affiliation in the publication record is Technicolor (Germany), Germany.
How many publications and citations does A.R. Shul'man have?
OpenAlex counts 17 works and 7 citations for A.R. Shul'man, an h-index of 2, ranking #6,426,095 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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