Akira Ohsawa
Akira Ohsawa publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics, on topics such as Silicon and Solar Cell Technologies, Semiconductor materials and devices and Silicon Nanostructures and Photoluminescence.
- World rank
- #2,520,963 of 7,710,434 ranked researchers
- Rank in Japan
- #51,269 of 383,136
- Works
- 61
- Citations
- 944
- Citations per work
- 15.5
What does Akira Ohsawa research?
Akira Ohsawa's work is mostly in Engineering (49%), Materials Science (22%), Physics and Astronomy (8%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences4878.9%
- Engineering3048.7%
- Materials Science1422.2%
- Physics and Astronomy58.0%
- Everything else1321.1%
- 1Electrical and Electronic Engineering40% of their works
- 2Materials Chemistry15% of their works
- 3Atomic and Molecular Physics, and Optics8% of their works
- 4Electronic, Optical and Magnetic Materials7% of their works
- 5Biomedical Engineering5% of their works
- 6Computational Mechanics4% of their works
Research topics
- Silicon and Solar Cell Technologies
- Semiconductor materials and devices
- Silicon Nanostructures and Photoluminescence
- Semiconductor materials and interfaces
- Advanced Surface Polishing Techniques
- Thin-Film Transistor Technologies
- Integrated Circuits and Semiconductor Failure Analysis
- Magnetic and transport properties of perovskites and related materials
Which keywords describe Akira Ohsawa's research?
The keywords of their largest research topics: Solar Cells, Efficiency, Silicon, Atomic Layer Deposition, High-k Dielectrics, Nanoparticles, Porous Silicon and Metal-Semiconductor Contacts.
- Magnetocaloric Materials
- Plasmonics
- Integrated Circuits
- Chemical Mechanical Planarization
- Metal-Semiconductor Contacts
- Nanoparticles
- Atomic Layer Deposition
- Efficiency
- Solar Cells
- Silicon
- High-k Dielectrics
- Porous Silicon
- Schottky Barrier
- Failure Analysis
- Material Removal Mechanism
- Thin-Film Transistors
- Perovskites
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Solar Cells433 topics
- Efficiency261 topic
- Silicon261 topic
- Atomic Layer Deposition171 topic
- High-k Dielectrics171 topic
- Nanoparticles111 topic
- Porous Silicon111 topic
- Metal-Semiconductor Contacts91 topic
- Schottky Barrier91 topic
- Chemical Mechanical Planarization81 topic
- Failure Analysis81 topic
- Integrated Circuits81 topic
- Material Removal Mechanism81 topic
- Plasmonics81 topic
- Thin-Film Transistors81 topic
- Magnetocaloric Materials41 topic
- Perovskites41 topic
Where does Akira Ohsawa work?
Akira Ohsawa's main affiliation in the publication record is Fujitsu (Japan), Japan.
How many publications and citations does Akira Ohsawa have?
OpenAlex counts 61 works and 944 citations for Akira Ohsawa, an h-index of 17, ranking #2,520,963 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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