Alvin H. Feingold
Alvin H. Feingold publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry, on topics such as Semiconductor materials and devices, Semiconductor Quantum Structures and Devices and Semiconductor Lasers and Optical Devices.
- World rank
- #6,241,662 of 7,710,434 ranked researchers
- Rank in United States
- #1,493,902 of 1,627,098
- Works
- 47
- Citations
- 337
- Citations per work
- 7.2
What does Alvin H. Feingold research?
Alvin H. Feingold's work is mostly in Engineering (54%), Physics and Astronomy (16%), Materials Science (14%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences4084.4%
- Engineering2654.5%
- Physics and Astronomy715.7%
- Materials Science714.2%
- Everything else715.6%
- 1Electrical and Electronic Engineering45% of their works
- 2Atomic and Molecular Physics, and Optics16% of their works
- 3Materials Chemistry10% of their works
- 4Mechanical Engineering5% of their works
- 5Electronic, Optical and Magnetic Materials4% of their works
- 6Mechanics of Materials4% of their works
Research topics
- Semiconductor materials and devices
- Semiconductor Quantum Structures and Devices
- Semiconductor Lasers and Optical Devices
- Semiconductor materials and interfaces
- Thin-Film Transistor Technologies
- Electrical and Thermal Properties of Materials
- Copper Interconnects and Reliability
- Metal and Thin Film Mechanics
Which keywords describe Alvin H. Feingold's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowires, Thin Films, Electrical Properties, Solar Cells, Quantum Dots and Semiconductor.
- Nanoindentation
- Thin-Film Transistors
- Plasmonics
- Low-k Dielectrics
- Semiconductor Lasers
- Optical Interconnects
- Semiconductor
- Solar Cells
- Thin Films
- High-k Dielectrics
- Atomic Layer Deposition
- Nanowires
- Electrical Properties
- Quantum Dots
- Metal-Semiconductor Contacts
- Schottky Barrier
- Ceramics
- Microelectronics
- Thermistors
- Coatings
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 20 words, with their numbers
- Atomic Layer Deposition201 topic
- High-k Dielectrics201 topic
- Nanowires172 topics
- Thin Films173 topics
- Electrical Properties152 topics
- Solar Cells152 topics
- Quantum Dots111 topic
- Semiconductor111 topic
- Metal-Semiconductor Contacts91 topic
- Optical Interconnects91 topic
- Schottky Barrier91 topic
- Semiconductor Lasers91 topic
- Ceramics61 topic
- Low-k Dielectrics61 topic
- Microelectronics61 topic
- Plasmonics61 topic
- Thermistors61 topic
- Thin-Film Transistors61 topic
- Coatings51 topic
- Nanoindentation51 topic
Where does Alvin H. Feingold work?
Alvin H. Feingold's main affiliation in the publication record is AT&T (United States), United States.
How many publications and citations does Alvin H. Feingold have?
OpenAlex counts 47 works and 337 citations for Alvin H. Feingold, an h-index of 9, ranking #6,241,662 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
Discussion
Ask a question or share a note about Alvin H. Feingold. Posts are plain text and can be reported.