Clarence H. Hinrichs
Clarence H. Hinrichs publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Biomedical Engineering, on topics such as Semiconductor materials and devices, Plasma Applications and Diagnostics and Advanced Materials Characterization Techniques.
- World rank
- #3,446,620 of 7,710,434 ranked researchers
- Rank in United States
- #966,899 of 1,627,098
- Works
- 21
- Citations
- 323
- Citations per work
- 15.4
What does Clarence H. Hinrichs research?
Clarence H. Hinrichs's work is mostly in Engineering (40%), Materials Science (24%), Medicine (7%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1569.2%
- Engineering840.1%
- Materials Science523.6%
- Physics and Astronomy15.5%
- Everything else523.5%
- Health Sciences27.3%
- Medicine27.3%
- 1Electrical and Electronic Engineering26% of their works
- 2Materials Chemistry24% of their works
- 3Biomedical Engineering9% of their works
- 4Radiology, Nuclear Medicine and Imaging7% of their works
- 5Atomic and Molecular Physics, and Optics6% of their works
- 6Computational Mechanics6% of their works
Research topics
- Semiconductor materials and devices
- Plasma Applications and Diagnostics
- Advanced Materials Characterization Techniques
- Ion-surface interactions and analysis
- Plasma Diagnostics and Applications
- Silicon Carbide Semiconductor Technologies
- Intermetallics and Advanced Alloy Properties
- Thermal properties of materials
Which keywords describe Clarence H. Hinrichs's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanostructures, Thermal Management, Atmospheric Pressure Plasmas, Plasma Medicine, Atom Probe Tomography and Ion Beam.
- TiAl Alloys
- Intermetallic Alloys
- Wide Bandgap Semiconductors
- Surface Analysis
- Reliability
- Ion Beam
- Plasma Medicine
- Thermal Management
- High-k Dielectrics
- Atomic Layer Deposition
- Nanostructures
- Atmospheric Pressure Plasmas
- Atom Probe Tomography
- Plasma Etching
- Semiconductor Industry
- Three-Dimensional Analysis
- Graphene
- Thermal Conductivity
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Atomic Layer Deposition51 topic
- High-k Dielectrics51 topic
- Nanostructures52 topics
- Thermal Management52 topics
- Atmospheric Pressure Plasmas41 topic
- Plasma Medicine41 topic
- Atom Probe Tomography31 topic
- Ion Beam31 topic
- Plasma Etching31 topic
- Reliability31 topic
- Semiconductor Industry31 topic
- Surface Analysis31 topic
- Three-Dimensional Analysis31 topic
- Wide Bandgap Semiconductors31 topic
- Graphene21 topic
- Intermetallic Alloys21 topic
- Thermal Conductivity21 topic
- TiAl Alloys21 topic
Where does Clarence H. Hinrichs work?
Clarence H. Hinrichs's main affiliation in the publication record is Linfield College, United States.
How many publications and citations does Clarence H. Hinrichs have?
OpenAlex counts 21 works and 323 citations for Clarence H. Hinrichs, an h-index of 8, ranking #3,446,620 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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