Science Explorer Back to mapMap
Discussion
Researcher · Oerlikon (Liechtenstein) · Liechtenstein

Hans Karl Pulker

Hans Karl Pulker publishes mostly in Mechanics of Materials, Electrical and Electronic Engineering and Computational Mechanics, on topics such as Metal and Thin Film Mechanics, Copper Interconnects and Reliability and Semiconductor materials and devices.

OpenAlex
World rank
#2,796,662
of 7,710,434 ranked researchers
Rank in Liechtenstein
#53
of 161
Works
125
Citations
2.4k
Citations per work
19.2
h-index
24
i10-index 42Top 11% in Mechanics of Materials
Hans Karl Pulker

What does Hans Karl Pulker research?

Hans Karl Pulker's work is mostly in Engineering (44%), Materials Science (28%).

Physical Sciences: 89 works · 71.4% of their workEngineering: 55 works · 43.8% of their workMechanics of Materials: 22 works · 17.8% of their workElectrical and Electronic Engineering: 19 works · 15.3% of their workComputational Mechanics: 13 works · 10.7% of their workMaterials Science: 34 works · 27.6% of their workMaterials Chemistry: 13 works · 10.4% of their workSurfaces, Coatings and Films: 12 works · 9.5% of their workElectronic, Optical and Magnetic Materials: 10 works · 7.7% of their workEverything else: 36 works · 28.6% of their workTHEIR WORKHans Karl Pulker125works
Physical Sciences71%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering5543.8%
    2. Materials Science3427.6%
  2. Everything else3628.6%
  1. 1Mechanics of Materials18% of their works
  2. 2Electrical and Electronic Engineering15% of their works
  3. 3Computational Mechanics11% of their works
  4. 4Materials Chemistry10% of their works
  5. 5Surfaces, Coatings and Films10% of their works
  6. 6Electronic, Optical and Magnetic Materials8% of their works

Research topics

Which keywords describe Hans Karl Pulker's research?

The keywords of their largest research topics: Thin Films, Coatings, Nanoindentation, Nanowires, Low-k Dielectrics, Microelectronics, Atomic Layer Deposition and High-k Dielectrics.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 18 words, with their numbers
  1. Thin Films712 topics
  2. Coatings461 topic
  3. Nanoindentation461 topic
  4. Nanowires342 topics
  5. Low-k Dielectrics251 topic
  6. Microelectronics251 topic
  7. Atomic Layer Deposition221 topic
  8. High-k Dielectrics221 topic
  9. Antireflective Coatings211 topic
  10. Nanostructures211 topic
  11. Nanodiamonds181 topic
  12. Quantum Sensing181 topic
  13. Roughness Measurement181 topic
  14. Surface Characterization181 topic
  15. Acoustic Wave Biosensors91 topic
  16. III-Nitrides91 topic
  17. Semiconductors91 topic
  18. Thin Film Resonators91 topic

Where does Hans Karl Pulker work?

Hans Karl Pulker's main affiliation in the publication record is Oerlikon (Liechtenstein), Liechtenstein.

How many publications and citations does Hans Karl Pulker have?

OpenAlex counts 125 works and 2,399 citations for Hans Karl Pulker, an h-index of 24, ranking #2,796,662 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

Ask a question or share a note about Hans Karl Pulker. Keep it to the research: no personal attacks, advertising or links. Any reader can report a post, which collapses it for everyone until it is opened.