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Researcher · University of Latvia · Latvia

I. Tāle

I. Tāle publishes mostly in Materials Chemistry, Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics, on topics such as Ga2O3 and related materials, GaN-based semiconductor devices and materials and Inorganic Chemistry and Materials.

OpenAlex
World rank
#1,205,197
of 1,633,909 ranked researchers
Rank in Latvia
#259
of 618
Works
15
Citations
44
Citations per work
2.9

What does I. Tāle research?

Materials Chemistry: 22.2%Electrical and Electronic Engineering: 11.1%Atomic and Molecular Physics, and Optics: 11.1%Electronic, Optical and Magnetic Materials: 11.1%other fields: 44.5%22%top field
Materials Chemistry22.2%Electrical and Electronic Engineering11.1%Atomic and Molecular Physics, and Optics11.1%Electronic, Optical and Magnetic Materials11.1%other fields44.5%

Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.

  1. 1Materials Chemistry22% of their works
  2. 2Electrical and Electronic Engineering11% of their works
  3. 3Atomic and Molecular Physics, and Optics11% of their works
  4. 4Electronic, Optical and Magnetic Materials11% of their works
  5. 5Condensed Matter Physics11% of their works
  6. 6Biomedical Engineering6% of their works

Research topics

Which keywords describe I. Tāle's research?

The keywords of their largest research topics: Semiconductor, Gallium Oxide, III-Nitrides, Semiconductors, Ultrawide Bandgap, Acoustic Wave Biosensors, Atomic Layer Deposition and High-k Dielectrics.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.

All 17 words, with their numbers
  1. Semiconductor32 topics
  2. Gallium Oxide21 topic
  3. III-Nitrides21 topic
  4. Semiconductors21 topic
  5. Ultrawide Bandgap21 topic
  6. Acoustic Wave Biosensors11 topic
  7. Atomic Layer Deposition11 topic
  8. High-k Dielectrics11 topic
  9. Inorganic Clusters11 topic
  10. Ion Beam11 topic
  11. Oxynitride Perovskites11 topic
  12. Photocatalyst11 topic
  13. Plasma Etching11 topic
  14. Semiconductor Industry11 topic
  15. Surface Analysis11 topic
  16. Thin Film Resonators11 topic
  17. Visible Light11 topic

Where does I. Tāle work?

I. Tāle's main affiliation in the publication record is University of Latvia, Latvia.

How many publications and citations does I. Tāle have?

Science Explorer counts 15 works and 44 citations for I. Tāle, ranking #1,205,197 of 1,633,909 researchers worldwide on the composite score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.