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Researcher · Analytical Services · United States

J. L. Hurd

J. L. Hurd publishes mostly in Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry, on topics such as Copper Interconnects and Reliability, Silicon and Solar Cell Technologies and Metal and Thin Film Mechanics.

OpenAlex
World rank
#4,754,757
of 7,710,434 ranked researchers
Rank in United States
#1,249,082
of 1,627,098
Works
24
Citations
239
Citations per work
10.0
h-index
7
i10-index 6Top 74% in Electrical and Electronic Engineering
J. L. Hurd

What does J. L. Hurd research?

J. L. Hurd's work is mostly in Engineering (53%), Materials Science (25%).

Physical Sciences: 19 works · 78.0% of their workEngineering: 13 works · 53.0% of their workElectrical and Electronic Engineering: 7 works · 30.9% of their workBiomedical Engineering: 2 works · 8.8% of their workMechanics of Materials: 2 works · 7.4% of their workMechanical Engineering: 1 works · 5.9% of their workMaterials Science: 6 works · 25.0% of their workElectronic, Optical and Magnetic Materials: 3 works · 13.2% of their workMaterials Chemistry: 3 works · 11.8% of their workEverything else: 5 works · 22.0% of their workTHEIR WORKJ. L. Hurd24works
Physical Sciences78%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1353.0%
    2. Materials Science625.0%
  2. Everything else522.0%
  1. 1Electrical and Electronic Engineering31% of their works
  2. 2Electronic, Optical and Magnetic Materials13% of their works
  3. 3Materials Chemistry12% of their works
  4. 4Biomedical Engineering9% of their works
  5. 5Mechanics of Materials7% of their works
  6. 6Mechanical Engineering6% of their works

Research topics

Which keywords describe J. L. Hurd's research?

The keywords of their largest research topics: Thin Films, Solar Cells, Low-k Dielectrics, Microelectronics, Efficiency, Silicon, Mechanical Properties and Coatings.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 19 words, with their numbers
  1. Thin Films142 topics
  2. Solar Cells123 topics
  3. Low-k Dielectrics91 topic
  4. Microelectronics91 topic
  5. Efficiency81 topic
  6. Silicon81 topic
  7. Mechanical Properties72 topics
  8. Coatings51 topic
  9. Nanoindentation51 topic
  10. Atomic Layer Deposition41 topic
  11. Chemical Mechanical Planarization41 topic
  12. High-k Dielectrics41 topic
  13. Material Removal Mechanism41 topic
  14. Aerospace Applications21 topic
  15. Aluminium Alloys21 topic
  16. Nanosensors21 topic
  17. Nanowire21 topic
  18. Plasmonics21 topic
  19. Thin-Film Transistors21 topic

Where does J. L. Hurd work?

J. L. Hurd's main affiliation in the publication record is Analytical Services, United States.

How many publications and citations does J. L. Hurd have?

OpenAlex counts 24 works and 239 citations for J. L. Hurd, an h-index of 7, ranking #4,754,757 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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