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Researcher · Semiconductor Energy Laboratory (Japan) · Japan

Ken Fujino

Ken Fujino publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Aerospace Engineering, on topics such as Semiconductor materials and devices, Thin-Film Transistor Technologies and Copper Interconnects and Reliability.

ORCID 0009-0006-2649-8670 OpenAlex
World rank
#3,593,435
of 7,710,434 ranked researchers
Rank in Japan
#89,598
of 383,136
Works
22
Citations
362
Citations per work
16.5
h-index
10
i10-index 11Top 52% in Electrical and Electronic Engineering
Ken Fujino

What does Ken Fujino research?

Ken Fujino's work is mostly in Engineering (56%), Materials Science (33%).

Physical Sciences: 20 works · 89.5% of their workEngineering: 12 works · 56.1% of their workElectrical and Electronic Engineering: 9 works · 39.4% of their workAerospace Engineering: 2 works · 10.6% of their workComputational Mechanics: 1 works · 6.1% of their workMaterials Science: 7 works · 33.4% of their workMaterials Chemistry: 4 works · 16.7% of their workCeramics and Composites: 2 works · 9.1% of their workElectronic, Optical and Magnetic Materials: 2 works · 7.6% of their workEverything else: 2 works · 10.5% of their workTHEIR WORKKen Fujino22works
Physical Sciences90%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1256.1%
    2. Materials Science733.4%
  2. Everything else210.5%
  1. 1Electrical and Electronic Engineering39% of their works
  2. 2Materials Chemistry17% of their works
  3. 3Aerospace Engineering11% of their works
  4. 4Ceramics and Composites9% of their works
  5. 5Electronic, Optical and Magnetic Materials8% of their works
  6. 6Computational Mechanics6% of their works

Research topics

Which keywords describe Ken Fujino's research?

The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowires, Plasmonics, Thin-Film Transistors, Low-k Dielectrics, Microelectronics and Ceramic Materials.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 17 words, with their numbers
  1. Atomic Layer Deposition111 topic
  2. High-k Dielectrics111 topic
  3. Nanowires82 topics
  4. Plasmonics81 topic
  5. Thin-Film Transistors81 topic
  6. Low-k Dielectrics51 topic
  7. Microelectronics51 topic
  8. Ceramic Materials41 topic
  9. Sintering41 topic
  10. Nanostructures31 topic
  11. Organic Light-Emitting Diodes31 topic
  12. Phosphorescent Materials31 topic
  13. Zinc Oxide31 topic
  14. Ammonia Synthesis21 topic
  15. Electrocatalysts21 topic
  16. Jet Noise21 topic
  17. Turbulent Flow21 topic

Where does Ken Fujino work?

Ken Fujino's main affiliation in the publication record is Semiconductor Energy Laboratory (Japan), Japan.

How many publications and citations does Ken Fujino have?

OpenAlex counts 22 works and 362 citations for Ken Fujino, an h-index of 10, ranking #3,593,435 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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