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Researcher · Fraunhofer-Gesellschaft · Germany

R. Leutenecker

R. Leutenecker publishes mostly in Mechanics of Materials, Computational Mechanics and Materials Chemistry, on topics such as Metal and Thin Film Mechanics, Ion-surface interactions and analysis and Semiconductor materials and devices.

OpenAlex
World rank
#4,391,713
of 7,710,434 ranked researchers
Rank in Germany
#222,825
of 364,343
Works
20
Citations
344
Citations per work
17.2
h-index
9
i10-index 8Top 56% in Mechanics of Materials
R. Leutenecker

What does R. Leutenecker research?

R. Leutenecker's work is mostly in Engineering (67%), Materials Science (18%).

Physical Sciences: 17 works · 85.0% of their workEngineering: 13 works · 66.6% of their workMechanics of Materials: 6 works · 30.0% of their workComputational Mechanics: 4 works · 20.0% of their workElectrical and Electronic Engineering: 2 works · 8.3% of their workMechanical Engineering: 2 works · 8.3% of their workMaterials Science: 4 works · 18.4% of their workMaterials Chemistry: 2 works · 11.7% of their workElectronic, Optical and Magnetic Materials: 1 works · 6.7% of their workEverything else: 3 works · 15.0% of their workTHEIR WORKR. Leutenecker20works
Physical Sciences85%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1366.6%
    2. Materials Science418.4%
  2. Everything else315.0%
  1. 1Mechanics of Materials30% of their works
  2. 2Computational Mechanics20% of their works
  3. 3Materials Chemistry12% of their works
  4. 4Mechanical Engineering8% of their works
  5. 5Electrical and Electronic Engineering8% of their works
  6. 6Electronic, Optical and Magnetic Materials7% of their works

Research topics

Which keywords describe R. Leutenecker's research?

The keywords of their largest research topics: Thin Films, Coatings, Nanoindentation, Ion Beam, Surface Analysis, Atomic Layer Deposition, High-k Dielectrics and Low-k Dielectrics.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 17 words, with their numbers
  1. Thin Films202 topics
  2. Coatings161 topic
  3. Nanoindentation161 topic
  4. Ion Beam101 topic
  5. Surface Analysis101 topic
  6. Atomic Layer Deposition41 topic
  7. High-k Dielectrics41 topic
  8. Low-k Dielectrics41 topic
  9. Microelectronics41 topic
  10. Nanodiamonds41 topic
  11. Quantum Sensing41 topic
  12. Chemical Mechanical Planarization21 topic
  13. Material Removal Mechanism21 topic
  14. fusion materials21 topic
  15. radiation damage21 topic
  16. Atom Probe Tomography11 topic
  17. Three-Dimensional Analysis11 topic

Where does R. Leutenecker work?

R. Leutenecker's main affiliation in the publication record is Fraunhofer-Gesellschaft, Germany.

How many publications and citations does R. Leutenecker have?

OpenAlex counts 20 works and 344 citations for R. Leutenecker, an h-index of 9, ranking #4,391,713 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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