Nuflare Technology, Inc. (Japan)

Research works: 0
Citations: 0

Not ranked overall: Nuflare Technology, Inc. (Japan) is under the volume floor below which an excellence rate is noise. Not ranked is not the same as ranked last.

What are the most cited papers from Nuflare Technology, Inc. (Japan)?

The most cited paper from Nuflare Technology, Inc. (Japan) is "RESCAN: an actinic lensless microscope for defect inspection of EUV reticles" (Iacopo Mochi, Patrick Helfenstein, István Mohacsi et al., 2017), with 35 citations. Next come "Multi-beam mask writer MBM-1000 and its application field" (35) and "Development of a 150 mm 4H-SiC epitaxial reactor with high-speed wafer rotation" (33).

Most cited papers
#	Paper	Released	Citations
1	RESCAN: an actinic lensless microscope for defect inspection of EUV reticles Iacopo Mochi, Patrick Helfenstein, István Mohacsi et al. · Journal of Micro/Nanolithography MEMS and MOEMS Open access	27 Jul 2017	35
2	Multi-beam mask writer MBM-1000 and its application field Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper	10 May 2016	35
3	Development of a 150 mm 4H-SiC epitaxial reactor with high-speed wafer rotation Hiroaki Fujibayashi, Masahiko Ito, Hideki Ito et al. · Applied Physics Express Open access	18 Dec 2013	33
4	High-Accuracy Proximity Effect Correction for Mask Writing Takayuki Abe, Yoshiaki Hattori, Tomohiro Iijima et al. · Japanese Journal of Applied Physics	Feb 2007	32
5	Resist thickness dependence of line width roughness of chemically amplified resists used for electron beam lithography Naoki Maeda, Akihiro Konda, Kazumasa Okamoto et al. · Japanese Journal of Applied Physics Open access	14 Jul 2020	23

All 57 most cited papers, with filters and sorting

Research measures only: rankings here say nothing about teaching, admissions or student experience. Comparable institutions and collaboration partners have tabs of their own, above.

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