Science Explorer Back to mapMap
Discussion
Institution · Nuflare Technology, Inc. (Japan)

Most cited papers from Nuflare Technology, Inc. (Japan)

Nuflare Technology, Inc. (Japan)

What are the most cited papers from Nuflare Technology, Inc. (Japan)?

The most cited paper from Nuflare Technology, Inc. (Japan) is "RESCAN: an actinic lensless microscope for defect inspection of EUV reticles" (Iacopo Mochi, Patrick Helfenstein, István Mohacsi et al., 2017), with 35 citations. Next come "Multi-beam mask writer MBM-1000 and its application field" (35) and "Development of a 150 mm 4H-SiC epitaxial reactor with high-speed wafer rotation" (33).

Showing 50 of 57 papers. Every paper with more than 5 citations is listed.

Most cited papers, sortable by citations and release date
#Paper
1 RESCAN: an actinic lensless microscope for defect inspection of EUV reticles Iacopo Mochi, Patrick Helfenstein, István Mohacsi et al. · Journal of Micro/Nanolithography MEMS and MOEMS Open access 27 Jul 2017 35
2 Multi-beam mask writer MBM-1000 and its application field Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 10 May 2016 35
3 Development of a 150 mm 4H-SiC epitaxial reactor with high-speed wafer rotation Hiroaki Fujibayashi, Masahiko Ito, Hideki Ito et al. · Applied Physics Express Open access 18 Dec 2013 33
4 High-Accuracy Proximity Effect Correction for Mask Writing Takayuki Abe, Yoshiaki Hattori, Tomohiro Iijima et al. · Japanese Journal of Applied Physics Feb 2007 32
5 Resist thickness dependence of line width roughness of chemically amplified resists used for electron beam lithography Naoki Maeda, Akihiro Konda, Kazumasa Okamoto et al. · Japanese Journal of Applied Physics Open access 14 Jul 2020 23
6 Recent progress and future of electron multi-beam mask writer Jumpei Yasuda, Haruyuki Nomura, Hiroshi Matsumoto et al. · Japanese Journal of Applied Physics 26 Jan 2023 21
7 Actinic inspection of EUV reticles with arbitrary pattern design Iacopo Mochi, Patrick Helfenstein, Yasin Ekinci et al. Conference paperOpen access 16 Oct 2017 19
8 450 mm Silicon Wafers Challenges - Wafer Thickness Scaling Michael Goldstein, Masaharu Watanabe · ECS Transactions Conference paperOpen access 6 Oct 2008 19
9 Development of a new mask pattern inspection tool NPI-7000 and applied results to EUV mask inspection H Hashimoto, Nobutaka Kikuiri, Ikunao Isomura et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 21 Jun 2012 18
10 EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 28 Jul 2014 17
11 Study of EUV mask inspection technique using DUV light source for hp22nm and beyond Ryoichi Hirano, Nobutaka Kikuiri, H Hashimoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 28 Sep 2010 17
12 Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000 Takashi Kamikubo, Takayuki Ohnishi, Shigehiro Hara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 28 Sep 2010 17
13 Modeling of charging effect and its correction by EB mask writer EBM-6000 Noriaki Nakayamada, Seiji Wake, Takashi Kamikubo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 13 May 2008 17
14 Impacts of surface C/Si ratio on in-wafer uniformity and defect density of 4H-SiC homo-epitaxial films grown by high-speed wafer rotation vertical CVD Yoshiaki Daigo, Shigeaki Ishii, Takehiko Kobayashi · Japanese Journal of Applied Physics Open access 27 Mar 2019 16
15 Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN Rajeev Rajendran, Iacopo Mochi, Patrick Helfenstein et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paperOpen access 28 Mar 2017 16
16 Influence and Suppression of Harmful Effects Due to By-Product in CVD Reactor for 4H-SiC Epitaxy Yoshiaki Daigo, Tôru Watanabe, Akio Ishiguro et al. · IEEE Transactions on Semiconductor Manufacturing Open access 5 May 2021 15
17 Global Critical Dimension Correction: I. Fogging Effect Correction Takayuki Abe, Junichi Suzuki, Jun Yashima et al. · Japanese Journal of Applied Physics Open access Jun 2007 15
18 Quick Cleaning Process for Silicon Carbide Chemical Vapor Deposition Reactor Kohei Shioda, Keisuke Kurashima, Hitoshi Habuka et al. · ECS Journal of Solid State Science and Technology Open access 2017 14
19 Electron beam mask writer EBM-9500 for logic 7nm node generation Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 5 Oct 2016 14
20 Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists Yuta Ikari, Kazumasa Okamoto, Akihiro Konda et al. · Japanese Journal of Applied Physics 21 Jul 2020 13
21 Multibeam mask writer MBM-1000 Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita et al. · Journal of Micro/Nanolithography MEMS and MOEMS 24 Sep 2018 12
22 High In-Wafer Uniformity of Growth Rate and Carrier Concentration on n-Type 4H-SiC Epitaxial Films Achieved by High Speed Wafer Rotation Vertical CVD Tool Yoshiaki Daigo, Akio Ishiguro, Shigeaki Ishii et al. · Materials science forum Open access 5 Jun 2018 12
23 Curvilinear mask process correction embedded on multi-beam mask writer Noriaki Nakayamada, Haruyuki Nomura, Yasuo Kato et al. · Journal of Micro/Nanopatterning Materials and Metrology 14 Feb 2024 11
24 GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000 Harold R. Zable, Hironobu Matsumoto, Kenichi Yasui et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 13 Jul 2017 11
25 The development of full field high resolution imprint templates Shusuke Yoshitake, H. Sunaoshi, Kenichi Yasui et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 5 Oct 2007 11
26 Study of heating effect on CAR in electron beam mask writing Takashi Kamikubo, Makoto Hiramoto, Jun Yashima et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 3 May 2007 11
27 EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond Shusuke Yoshitake et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 6 Oct 2011 10
28 Theoretical study of interfacial effects on low-energy electron dynamics in chemically amplified resist processes of photomask fabrication Takahiro Kozawa, Takao Tamura · Japanese Journal of Applied Physics Open access 20 Jul 2021 10
29 Reduction of Surface and PL Defects on n-Type 4H-SiC Epitaxial Films Grown Using a High Speed Wafer Rotation Vertical CVD Tool Yoshiaki Daigo, Akio Ishiguro, Shigeaki Ishii et al. · Materials science forum Open access 5 Jun 2018 10
30 Susceptor Coating Materials Applicable for SiC Reactor Cleaning Kohei Shioda, Hitoshi Habuka, Hideki Ito et al. · Materials science forum Open access 15 May 2017 10
31 A novel defect detection optical system using 199-nm light source for EUVL mask Ryoichi Hirano, Nobutaka Kikuiri, Masatoshi Hirono et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 11 Mar 2010 10
32 EBM-5000: electron-beam mask writer for 45-nm node H. Sunaoshi, Yuichi Tachikawa, Hitoshi Higurashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 4 May 2006 10
33 Electron-beam mask writer EBM-6000 for 45 nm HP node Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 3 May 2007 9
34 Evaluation of EUVL-mask pattern defect inspection using 199-nm inspection optics Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 5 Oct 2007 9
35 Electron beam mask writer EBM-7000 for hp 32nm generation Takashi Kamikubo, Kenji Ohtoshi, Noriaki Nakayamada et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 29 Sep 2009 9
36 Multi-beam mask writer MBM-2000PLUS Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi et al. Conference paper 25 May 2022 8
37 Scanning coherent scattering methods for actinic EUV mask inspection Yasin Ekinci, Patrick Helfenstein, R. Rajeev et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paperOpen access 5 Oct 2016 8
38 Advancing the charging effect correction with time-dependent discharging model Noriaki Nakayamada, Takashi Kamikubo, Hirohito Anze et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 29 Apr 2011 8
39 The trouble starts with using electrons: putting charging effect correction models to the test Timo Wandel, Clemens S. Utzny, Noriaki Nakayamada · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 23 Sep 2011 8
40 Highly reliable 198-nm light source for semiconductor inspection based on dual fiber lasers Shinichi Imai, Kazuto Matsuki, Nobutaka Kikuiri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 5 Feb 2010 8
41 First-principles and thermodynamic analysis for gas phase reactions and structures of the SiC(0001) surface under conventional CVD and Halide CVD environments Kenta Chokawa, Yoshiaki Daigo, Ichiro Mizushima et al. · Japanese Journal of Applied Physics Open access 5 Jul 2021 7
42 Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging Sara García Fernández, Dimitrios Kazazis, Rajeev Rajendran et al. · Journal of Micro/Nanolithography MEMS and MOEMS Open access 18 Mar 2019 7
43 Global Critical Dimension Correction: II Takayuki Abe, Junichi Suzuki, Jun Yashima et al. · Japanese Journal of Applied Physics Jun 2007 7
44 Structure and reduction of large bumps formed on 4H-SiC epitaxial film originated from dislocations in substrate Yoshiaki Daigo, Akio Ishiguro, Yoshikazu Moriyama et al. · Journal of Crystal Growth Sep 2021 6
45 Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning Yuqing Jin, Takahiro Kozawa, Takao Tamura · Japanese Journal of Applied Physics 21 Jun 2021 6
46 Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in photomask production by electron beam lithography Takahiro Kozawa, Takao Tamura · Japanese Journal of Applied Physics Open access 21 May 2019 6
47 Extreme Ultraviolet Lithography Simulation by Tracing Photoelectron Trajectories in Resist Masatoshi Kotera, Kei Yagura, Hiroyuki Tanaka et al. · Japanese Journal of Applied Physics Open access Jun 2008 6
48 Model-based mask data preparation (MB-MDP) and its impact on resist heating Aki Fujimura, Takashi Kamikubo, Ingo Bork · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 17 Mar 2011 6
49 Study on modeling of resist heating effect correction in EB mask writer EBM-9000 Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Conference paper 9 Jul 2015 6
50 Vacancy-type defects in AlInN/AlN/GaN structures probed by monoenergetic positron beam Akira Uedono, Yasuki Kimura, Takuya Hoshii et al. · Journal of Applied Physics 8 Jun 2023 5

Citations are OpenAlex's own counts, from its 2026-09-23 snapshot, so the ranking can differ from Google Scholar or Web of Science. A paper is listed for an institution when any of its authors gave it as an affiliation; retracted papers and papers whose citation count cannot be traced to citing works are left out, and a preprint and the article it became are shown once. Release dates are OpenAlex's: where a source gave only a month or a year, that is what is shown. How the lists are chosen.