A. Heft
A. Heft publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Biomedical Engineering, on topics such as Semiconductor materials and devices, ZnO doping and properties and Silicon Carbide Semiconductor Technologies.
- World rank
- #4,094,832 of 7,710,434 ranked researchers
- Rank in Germany
- #206,537 of 364,343
- Works
- 39
- Citations
- 713
- Citations per work
- 18.3
What does A. Heft research?
A. Heft's work is mostly in Engineering (39%), Materials Science (33%), Energy (5%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3077.4%
- Engineering1539.2%
- Materials Science1333.3%
- Energy24.9%
- Everything else922.6%
- 1Electrical and Electronic Engineering34% of their works
- 2Materials Chemistry26% of their works
- 3Biomedical Engineering5% of their works
- 4Renewable Energy, Sustainability and the Environment5% of their works
- 5Ceramics and Composites4% of their works
- 6Polymers and Plastics4% of their works
Research topics
- Semiconductor materials and devices
- ZnO doping and properties
- Silicon Carbide Semiconductor Technologies
- Gas Sensing Nanomaterials and Sensors
- Catalytic Processes in Materials Science
- Thin-Film Transistor Technologies
- Integrated Circuits and Semiconductor Failure Analysis
- Copper-based nanomaterials and applications
Which keywords describe A. Heft's research?
The keywords of their largest research topics: Nanostructures, Semiconductors, Atomic Layer Deposition, High-k Dielectrics, Ferromagnetism, Zinc Oxide, Reliability and Wide Bandgap Semiconductors.
- Thin-Film Transistors
- Nanocrystals
- Failure Analysis
- Nanoparticles
- Metal Oxide
- Wide Bandgap Semiconductors
- Zinc Oxide
- High-k Dielectrics
- Semiconductors
- Nanostructures
- Atomic Layer Deposition
- Ferromagnetism
- Reliability
- Gas Sensors
- Catalysis
- CuO
- Integrated Circuits
- Plasmonics
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Nanostructures183 topics
- Semiconductors142 topics
- Atomic Layer Deposition91 topic
- High-k Dielectrics91 topic
- Ferromagnetism81 topic
- Zinc Oxide81 topic
- Reliability71 topic
- Wide Bandgap Semiconductors71 topic
- Gas Sensors61 topic
- Metal Oxide61 topic
- Catalysis51 topic
- Nanoparticles51 topic
- CuO41 topic
- Failure Analysis41 topic
- Integrated Circuits41 topic
- Nanocrystals41 topic
- Plasmonics41 topic
- Thin-Film Transistors41 topic
Where does A. Heft work?
A. Heft's main affiliation in the publication record is Innovent, Germany.
How many publications and citations does A. Heft have?
OpenAlex counts 39 works and 713 citations for A. Heft, an h-index of 16, ranking #4,094,832 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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