Arie den Boef
Arie den Boef publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering, on topics such as Advancements in Photolithography Techniques, Optical Coatings and Gratings and Digital Holography and Microscopy.
- World rank
- #5,305,088 of 7,710,434 ranked researchers
- Rank in Netherlands
- #92,168 of 107,149
- Works
- 45
- Citations
- 1.1k
- Citations per work
- 25.1
What does Arie den Boef research?
Arie den Boef's work is mostly in Engineering (60%), Physics and Astronomy (17%), Materials Science (14%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences4190.9%
- Engineering2759.8%
- Physics and Astronomy817.1%
- Materials Science614.0%
- Everything else49.1%
- 1Electrical and Electronic Engineering29% of their works
- 2Atomic and Molecular Physics, and Optics17% of their works
- 3Biomedical Engineering16% of their works
- 4Surfaces, Coatings and Films14% of their works
- 5Media Technology10% of their works
- 6Mechanical Engineering5% of their works
Research topics
- Advancements in Photolithography Techniques
- Optical Coatings and Gratings
- Digital Holography and Microscopy
- Advanced Surface Polishing Techniques
- Near-Field Optical Microscopy
- Advanced Optical Imaging Technologies
- Advanced Measurement and Metrology Techniques
- Integrated Circuits and Semiconductor Failure Analysis
Which keywords describe Arie den Boef's research?
The keywords of their largest research topics: Nanofabrication, Electron Beam Lithography, Resolution Limits, Antireflective Coatings, Nanostructures, Digital Holographic Microscopy, Quantitative Phase Imaging and Chemical Mechanical Planarization.
- Failure Analysis
- Dimensional Metrology
- Holographic Displays
- Near-Field Optical Microscopy
- Chemical Mechanical Planarization
- Digital Holographic Microscopy
- Antireflective Coatings
- Electron Beam Lithography
- Nanofabrication
- Resolution Limits
- Nanostructures
- Quantitative Phase Imaging
- Material Removal Mechanism
- Photonic Nanojets
- Stereoscopic Displays
- Error Compensation
- Integrated Circuits
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Nanofabrication392 topics
- Electron Beam Lithography221 topic
- Resolution Limits221 topic
- Antireflective Coatings171 topic
- Nanostructures171 topic
- Digital Holographic Microscopy161 topic
- Quantitative Phase Imaging161 topic
- Chemical Mechanical Planarization111 topic
- Material Removal Mechanism111 topic
- Near-Field Optical Microscopy91 topic
- Photonic Nanojets91 topic
- Holographic Displays81 topic
- Stereoscopic Displays81 topic
- Dimensional Metrology61 topic
- Error Compensation61 topic
- Failure Analysis51 topic
- Integrated Circuits51 topic
Where does Arie den Boef work?
Arie den Boef's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Arie den Boef have?
OpenAlex counts 45 works and 1,131 citations for Arie den Boef, an h-index of 12, ranking #5,305,088 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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