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Researcher · ASML (Netherlands) · Netherlands

Evert C. Mos

Evert C. Mos publishes mostly in Electrical and Electronic Engineering, Artificial Intelligence and Mechanical Engineering, on topics such as Semiconductor Lasers and Optical Devices, Neural Networks and Reservoir Computing and Advancements in Photolithography Techniques.

OpenAlex
World rank
#6,726,706
of 7,710,434 ranked researchers
Rank in Netherlands
#103,350
of 107,149
Works
19
Citations
140
Citations per work
7.4
h-index
7
i10-index 7Top 74% in Electrical and Electronic Engineering
Evert C. Mos

What does Evert C. Mos research?

Evert C. Mos's work is mostly in Engineering (67%), Computer Science (18%), Materials Science (4%).

Physical Sciences: 17 works · 90.9% of their workEngineering: 13 works · 67.3% of their workElectrical and Electronic Engineering: 9 works · 47.3% of their workMechanical Engineering: 2 works · 12.7% of their workBiomedical Engineering: 1 works · 7.3% of their workComputer Science: 3 works · 18.2% of their workArtificial Intelligence: 3 works · 18.2% of their workMaterials Science: 1 works · 3.6% of their workSurfaces, Coatings and Films: 1 works · 3.6% of their workPhysics and Astronomy: 0 works · 1.8% of their workAtomic and Molecular Physics, and Optics: 0 works · 1.8% of their workEverything else: 2 works · 9.1% of their workTHEIR WORKEvert C. Mos19works
Physical Sciences91%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1367.3%
    2. Computer Science318.2%
    3. Materials Science13.6%
    4. Physics and Astronomy01.8%
  2. Everything else29.1%
  1. 1Electrical and Electronic Engineering47% of their works
  2. 2Artificial Intelligence18% of their works
  3. 3Mechanical Engineering13% of their works
  4. 4Biomedical Engineering7% of their works
  5. 5Surfaces, Coatings and Films4% of their works
  6. 6Atomic and Molecular Physics, and Optics2% of their works

Research topics

Which keywords describe Evert C. Mos's research?

The keywords of their largest research topics: Semiconductor Lasers, Optical Interconnects, Vertical-Cavity Surface-Emitting Lasers (VCSELs), Electron Beam Lithography, Nanofabrication, Neuromorphic Photonics, Photonic Reservoir Computing and Chemical Mechanical Planarization.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 17 words, with their numbers
  1. Semiconductor Lasers172 topics
  2. Optical Interconnects91 topic
  3. Vertical-Cavity Surface-Emitting Lasers (VCSELs)91 topic
  4. Electron Beam Lithography81 topic
  5. Nanofabrication81 topic
  6. Neuromorphic Photonics81 topic
  7. Photonic Reservoir Computing81 topic
  8. Chemical Mechanical Planarization41 topic
  9. Dimensional Metrology41 topic
  10. Error Compensation41 topic
  11. Material Removal Mechanism41 topic
  12. Optical Modulators41 topic
  13. Silicon Photonics41 topic
  14. Coherent Detection21 topic
  15. Neural Networks21 topic
  16. Optical Fiber21 topic
  17. Self-Organizing Maps21 topic

Where does Evert C. Mos work?

Evert C. Mos's main affiliation in the publication record is ASML (Netherlands), Netherlands.

How many publications and citations does Evert C. Mos have?

OpenAlex counts 19 works and 140 citations for Evert C. Mos, an h-index of 7, ranking #6,726,706 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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