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Researcher · Symetrix (United States) · United States

Gary F. Derbenwick

Gary F. Derbenwick publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Biomedical Engineering, on topics such as Semiconductor materials and devices, Ferroelectric and Piezoelectric Materials and Advancements in Semiconductor Devices and Circuit Design.

OpenAlex
World rank
#2,190,183
of 7,710,434 ranked researchers
Rank in United States
#657,481
of 1,627,098
Works
36
Citations
834
Citations per work
23.2
h-index
14
i10-index 16Top 33% in Electrical and Electronic Engineering
Gary F. Derbenwick

What does Gary F. Derbenwick research?

Gary F. Derbenwick's work is mostly in Engineering (70%), Materials Science (16%), Computer Science (4%).

Physical Sciences: 33 works · 92.4% of their workEngineering: 25 works · 69.8% of their workElectrical and Electronic Engineering: 22 works · 60.4% of their workBiomedical Engineering: 3 works · 9.4% of their workMaterials Science: 6 works · 16.0% of their workMaterials Chemistry: 6 works · 16.0% of their workComputer Science: 1 works · 3.8% of their workComputer Networks and Communications: 1 works · 1.9% of their workHardware and Architecture: 1 works · 1.9% of their workPhysics and Astronomy: 1 works · 2.8% of their workAtomic and Molecular Physics, and Optics: 1 works · 2.8% of their workEverything else: 3 works · 7.6% of their workTHEIR WORKGary F.Derbenwick36works
Physical Sciences92%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering2569.8%
    2. Materials Science616.0%
    3. Computer Science13.8%
    4. Physics and Astronomy12.8%
  2. Everything else37.6%
  1. 1Electrical and Electronic Engineering60% of their works
  2. 2Materials Chemistry16% of their works
  3. 3Biomedical Engineering9% of their works
  4. 4Atomic and Molecular Physics, and Optics3% of their works
  5. 5Computer Networks and Communications2% of their works
  6. 6Hardware and Architecture2% of their works

Research topics

Which keywords describe Gary F. Derbenwick's research?

The keywords of their largest research topics: Nanoelectronics, Atomic Layer Deposition, High-k Dielectrics, Ferroelectric Materials, Lead-free Piezoceramics, Nanowire Transistors, Radiation Effects and Soft Errors.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 17 words, with their numbers
  1. Nanoelectronics332 topics
  2. Atomic Layer Deposition221 topic
  3. High-k Dielectrics221 topic
  4. Ferroelectric Materials121 topic
  5. Lead-free Piezoceramics121 topic
  6. Nanowire Transistors111 topic
  7. Radiation Effects111 topic
  8. Soft Errors111 topic
  9. Tunnel Field-Effect Transistors111 topic
  10. Acoustic Wave Biosensors81 topic
  11. Thin Film Resonators81 topic
  12. Failure Analysis51 topic
  13. Integrated Circuits51 topic
  14. Dielectric41 topic
  15. Microwave41 topic
  16. Silicon31 topic
  17. Solar Cells31 topic

Where does Gary F. Derbenwick work?

Gary F. Derbenwick's main affiliation in the publication record is Symetrix (United States), United States.

How many publications and citations does Gary F. Derbenwick have?

OpenAlex counts 36 works and 834 citations for Gary F. Derbenwick, an h-index of 14, ranking #2,190,183 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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