Hans Loeschner
Hans Loeschner publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Advanced Surface Polishing Techniques and Ion-surface interactions and analysis.
- World rank
- #1,075,841 of 1,633,909 ranked researchers
- Rank in Austria
- #7,169 of 10,230
- Works
- 26
- Citations
- 33
- Citations per work
- 1.3
What does Hans Loeschner research?
Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.
- 1Electrical and Electronic Engineering42% of their works
- 2Biomedical Engineering25% of their works
- 3Surfaces, Coatings and Films11% of their works
- 4Computational Mechanics8% of their works
- 5Mechanics of Materials6% of their works
- 6Media Technology3% of their works
Research topics
- Advancements in Photolithography Techniques
- Advanced Surface Polishing Techniques
- Ion-surface interactions and analysis
- Plasma Diagnostics and Applications
- Electron and X-Ray Spectroscopy Techniques
- Nanofabrication and Lithography Techniques
- Metal and Thin Film Mechanics
- Optical measurement and interference techniques
Which keywords describe Hans Loeschner's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Chemical Mechanical Planarization, Material Removal Mechanism, Nanoscale Patterning, X-ray Photoelectron Spectroscopy and Electron Inelastic Mean Free Paths.
- Camera Calibration
- Soft Lithography
- Nanoindentation
- Semiconductor Industry
- Plasma Etching
- Electron Inelastic Mean Free Paths
- Nanoscale Patterning
- Chemical Mechanical Planarization
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- Material Removal Mechanism
- X-ray Photoelectron Spectroscopy
- Ion Beam
- Scanning Electron Microscopy
- Surface Analysis
- Nanolithography
- Thin Films
- Structured Light
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 19 words, with their numbers
- High-Resolution Patterning122 topics
- Electron Beam Lithography101 topic
- Nanofabrication101 topic
- Chemical Mechanical Planarization51 topic
- Material Removal Mechanism51 topic
- Nanoscale Patterning52 topics
- X-ray Photoelectron Spectroscopy52 topics
- Electron Inelastic Mean Free Paths31 topic
- Ion Beam31 topic
- Plasma Etching31 topic
- Scanning Electron Microscopy31 topic
- Semiconductor Industry31 topic
- Surface Analysis31 topic
- Nanoindentation21 topic
- Nanolithography21 topic
- Soft Lithography21 topic
- Thin Films21 topic
- Camera Calibration11 topic
- Structured Light11 topic
Where does Hans Loeschner work?
Hans Loeschner's main affiliation in the publication record is IMS Nanofabrication (Austria), Austria.
How many publications and citations does Hans Loeschner have?
Science Explorer counts 26 works and 33 citations for Hans Loeschner, ranking #1,075,841 of 1,633,909 researchers worldwide on the composite score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.