J. Felsteiner
J. Felsteiner publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry, on topics such as Plasma Diagnostics and Applications, Gyrotron and Vacuum Electronics Research and Pulsed Power Technology Applications.
- World rank
- #2,582,513 of 7,710,434 ranked researchers
- Rank in Israel
- #16,855 of 38,292
- Works
- 251
- Citations
- 3.7k
- Citations per work
- 14.9
What does J. Felsteiner research?
J. Felsteiner's work is mostly in Engineering (27%), Physics and Astronomy (22%), Materials Science (9%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences14658.3%
- Engineering6826.9%
- Physics and Astronomy5622.2%
- Materials Science239.2%
- Everything else9336.9%
- Health Sciences124.8%
- Medicine124.8%
- 1Electrical and Electronic Engineering20% of their works
- 2Atomic and Molecular Physics, and Optics16% of their works
- 3Materials Chemistry9% of their works
- 4Control and Systems Engineering7% of their works
- 5Condensed Matter Physics6% of their works
- 6Radiology, Nuclear Medicine and Imaging5% of their works
Research topics
Which keywords describe J. Felsteiner's research?
The keywords of their largest research topics: Plasma Etching, Semiconductor Industry, High Power Terahertz Sources, Vacuum Electronics, Electron Beam, Pulsed Power, Atmospheric Pressure Plasmas and Plasma Medicine.
- Thin Film Resonators
- Neutron Imaging
- Thin Films
- Superconducting Cavities
- Plasma Medicine
- Pulsed Power
- Vacuum Electronics
- Semiconductor Industry
- Plasma Etching
- High Power Terahertz Sources
- Electron Beam
- Atmospheric Pressure Plasmas
- Negative Ion Sources
- Nanoindentation
- Acoustic Wave Biosensors
- Small-Angle Scattering
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 16 words, with their numbers
- Plasma Etching1021 topic
- Semiconductor Industry1021 topic
- High Power Terahertz Sources721 topic
- Vacuum Electronics721 topic
- Electron Beam501 topic
- Pulsed Power501 topic
- Atmospheric Pressure Plasmas291 topic
- Plasma Medicine291 topic
- Negative Ion Sources231 topic
- Superconducting Cavities231 topic
- Nanoindentation161 topic
- Thin Films161 topic
- Acoustic Wave Biosensors141 topic
- Neutron Imaging141 topic
- Small-Angle Scattering141 topic
- Thin Film Resonators141 topic
Where does J. Felsteiner work?
J. Felsteiner's main affiliation in the publication record is Technion – Israel Institute of Technology, Israel.
How many publications and citations does J. Felsteiner have?
OpenAlex counts 251 works and 3,737 citations for J. Felsteiner, an h-index of 31, ranking #2,582,513 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
Discussion
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