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Researcher · Applied Materials (United States) · United States

John C. Forster

John C. Forster publishes mostly in Electrical and Electronic Engineering, Mechanics of Materials and Electronic, Optical and Magnetic Materials, on topics such as Plasma Diagnostics and Applications, Metal and Thin Film Mechanics and Copper Interconnects and Reliability.

OpenAlex
World rank
#770,157
of 7,710,434 ranked researchers
Rank in United States
#258,001
of 1,627,098
Works
51
Citations
2.1k
Citations per work
41.2
h-index
18
i10-index 24Top 22% in Electrical and Electronic Engineering
John C. Forster

What does John C. Forster research?

John C. Forster's work is mostly in Engineering (49%), Physics and Astronomy (15%), Materials Science (9%).

Physical Sciences: 37 works · 72.2% of their workEngineering: 25 works · 48.8% of their workElectrical and Electronic Engineering: 17 works · 32.8% of their workMechanics of Materials: 5 works · 10.2% of their workAerospace Engineering: 3 works · 5.8% of their workPhysics and Astronomy: 7 works · 14.6% of their workAtomic and Molecular Physics, and Optics: 4 works · 7.3% of their workNuclear and High Energy Physics: 4 works · 7.3% of their workMaterials Science: 4 works · 8.8% of their workElectronic, Optical and Magnetic Materials: 4 works · 8.8% of their workEverything else: 14 works · 27.8% of their workTHEIR WORKJohn C. Forster51works
Physical Sciences72%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering2548.8%
    2. Physics and Astronomy714.6%
    3. Materials Science48.8%
  2. Everything else1427.8%
  1. 1Electrical and Electronic Engineering33% of their works
  2. 2Mechanics of Materials10% of their works
  3. 3Electronic, Optical and Magnetic Materials9% of their works
  4. 4Atomic and Molecular Physics, and Optics7% of their works
  5. 5Nuclear and High Energy Physics7% of their works
  6. 6Aerospace Engineering6% of their works

Research topics

Which keywords describe John C. Forster's research?

The keywords of their largest research topics: Thin Films, Plasma Etching, Semiconductor Industry, Coatings, Low-k Dielectrics, Microelectronics, Nanoindentation and Atomic Layer Deposition.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.

All 17 words, with their numbers
  1. Thin Films242 topics
  2. Plasma Etching231 topic
  3. Semiconductor Industry231 topic
  4. Coatings121 topic
  5. Low-k Dielectrics121 topic
  6. Microelectronics121 topic
  7. Nanoindentation121 topic
  8. Atomic Layer Deposition101 topic
  9. High-k Dielectrics101 topic
  10. Tokamak81 topic
  11. Turbulence81 topic
  12. Negative Ion Sources61 topic
  13. Superconducting Cavities61 topic
  14. Ionosphere51 topic
  15. Magnetosphere51 topic
  16. Ionization31 topic
  17. Mass Spectrometry31 topic

Where does John C. Forster work?

John C. Forster's main affiliation in the publication record is Applied Materials (United States), United States.

How many publications and citations does John C. Forster have?

OpenAlex counts 51 works and 2,099 citations for John C. Forster, an h-index of 18, ranking #770,157 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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