Matthew J. Sendelbach
Matthew J. Sendelbach publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering, on topics such as Optical Coatings and Gratings, Advancements in Photolithography Techniques and Surface Roughness and Optical Measurements.
- World rank
- #7,276,463 of 7,710,434 ranked researchers
- Rank in Israel
- #37,530 of 38,292
- Works
- 53
- Citations
- 520
- Citations per work
- 9.8
What does Matthew J. Sendelbach research?
Matthew J. Sendelbach's work is mostly in Engineering (67%), Materials Science (22%), Physics and Astronomy (3%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences4992.7%
- Engineering3566.9%
- Materials Science1222.5%
- Physics and Astronomy23.3%
- Everything else47.3%
- 1Electrical and Electronic Engineering37% of their works
- 2Surfaces, Coatings and Films22% of their works
- 3Biomedical Engineering13% of their works
- 4Computational Mechanics9% of their works
- 5Mechanical Engineering8% of their works
- 6Atomic and Molecular Physics, and Optics3% of their works
Research topics
- Optical Coatings and Gratings
- Advancements in Photolithography Techniques
- Surface Roughness and Optical Measurements
- Advanced Surface Polishing Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices
- Advanced Measurement and Metrology Techniques
- Advancements in Semiconductor Devices and Circuit Design
Which keywords describe Matthew J. Sendelbach's research?
The keywords of their largest research topics: Nanofabrication, Antireflective Coatings, Nanostructures, Electron Beam Lithography, Resolution Limits, Roughness Measurement, Surface Characterization and Chemical Mechanical Planarization.
- Nanowire Transistors
- Error Compensation
- Atomic Layer Deposition
- Integrated Circuits
- Chemical Mechanical Planarization
- Roughness Measurement
- Electron Beam Lithography
- Antireflective Coatings
- Nanofabrication
- Nanostructures
- Resolution Limits
- Surface Characterization
- Failure Analysis
- Material Removal Mechanism
- Dimensional Metrology
- High-k Dielectrics
- Tunnel Field-Effect Transistors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 17 words, with their numbers
- Nanofabrication482 topics
- Antireflective Coatings321 topic
- Nanostructures321 topic
- Electron Beam Lithography161 topic
- Resolution Limits161 topic
- Roughness Measurement141 topic
- Surface Characterization141 topic
- Chemical Mechanical Planarization131 topic
- Failure Analysis131 topic
- Integrated Circuits131 topic
- Material Removal Mechanism131 topic
- Atomic Layer Deposition101 topic
- Dimensional Metrology101 topic
- Error Compensation101 topic
- High-k Dielectrics101 topic
- Nanowire Transistors41 topic
- Tunnel Field-Effect Transistors41 topic
Where does Matthew J. Sendelbach work?
Matthew J. Sendelbach's main affiliation in the publication record is Nova Measuring Instruments (Israel), Israel.
How many publications and citations does Matthew J. Sendelbach have?
OpenAlex counts 53 works and 520 citations for Matthew J. Sendelbach, an h-index of 14, ranking #7,276,463 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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