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Researcher · AT&T (United States) · United States

Thomas R. Fullowan

Thomas R. Fullowan publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Condensed Matter Physics, on topics such as Semiconductor materials and devices, Semiconductor Quantum Structures and Devices and Advancements in Semiconductor Devices and Circuit Design.

OpenAlex
World rank
#6,619,834
of 7,710,434 ranked researchers
Rank in United States
#1,538,604
of 1,627,098
Works
93
Citations
1.1k
Citations per work
12.2
h-index
22
i10-index 36Top 15% in Electrical and Electronic Engineering
Thomas R. Fullowan

What does Thomas R. Fullowan research?

Thomas R. Fullowan's work is mostly in Engineering (72%), Physics and Astronomy (21%), Materials Science (4%).

Physical Sciences: 90 works · 97.1% of their workEngineering: 67 works · 71.6% of their workElectrical and Electronic Engineering: 63 works · 68.0% of their workBiomedical Engineering: 2 works · 1.8% of their workComputational Mechanics: 2 works · 1.8% of their workPhysics and Astronomy: 20 works · 21.2% of their workAtomic and Molecular Physics, and Optics: 15 works · 15.8% of their workCondensed Matter Physics: 5 works · 5.4% of their workMaterials Science: 4 works · 4.3% of their workMaterials Chemistry: 4 works · 4.3% of their workEverything else: 3 works · 2.9% of their workTHEIR WORKThomas R.Fullowan93works
Physical Sciences97%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering6771.6%
    2. Physics and Astronomy2021.2%
    3. Materials Science44.3%
  2. Everything else32.9%
  1. 1Electrical and Electronic Engineering68% of their works
  2. 2Atomic and Molecular Physics, and Optics16% of their works
  3. 3Condensed Matter Physics5% of their works
  4. 4Materials Chemistry4% of their works
  5. 5Computational Mechanics2% of their works
  6. 6Biomedical Engineering2% of their works

Research topics

Which keywords describe Thomas R. Fullowan's research?

The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Band Parameters, Nanowires, Quantum Dots, Semiconductor, Integrated Circuits and Nanowire Transistors.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.

All 19 words, with their numbers
  1. Atomic Layer Deposition651 topic
  2. High-k Dielectrics651 topic
  3. Band Parameters492 topics
  4. Nanowires492 topics
  5. Quantum Dots341 topic
  6. Semiconductor341 topic
  7. Integrated Circuits242 topics
  8. Nanowire Transistors221 topic
  9. Tunnel Field-Effect Transistors221 topic
  10. III-Nitrides151 topic
  11. Optical Interconnects151 topic
  12. Semiconductor Lasers151 topic
  13. Semiconductors151 topic
  14. CMOS121 topic
  15. Failure Analysis121 topic
  16. Oscillators121 topic
  17. Photon Emission Microscopy121 topic
  18. Plasma Etching111 topic
  19. Semiconductor Industry111 topic

Where does Thomas R. Fullowan work?

Thomas R. Fullowan's main affiliation in the publication record is AT&T (United States), United States.

How many publications and citations does Thomas R. Fullowan have?

OpenAlex counts 93 works and 1,130 citations for Thomas R. Fullowan, an h-index of 22, ranking #6,619,834 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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