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Researcher · Fraunhofer Institute for Integrated Systems and Device Technology · Germany

Tobias Erlbacher

Tobias Erlbacher publishes mostly in Electrical and Electronic Engineering, Condensed Matter Physics and Biomedical Engineering, on topics such as Silicon Carbide Semiconductor Technologies, Semiconductor materials and devices and GaN-based semiconductor devices and materials.

ORCID 0000-0002-3835-618X OpenAlex
World rank
#1,277,501
of 1,633,909 ranked researchers
Rank in Germany
#71,706
of 86,443
Works
30
Citations
37
Citations per work
1.2

What does Tobias Erlbacher research?

Electrical and Electronic Engineering: 66.7%Condensed Matter Physics: 7.1%Biomedical Engineering: 7.1%Atomic and Molecular Physics, and Optics: 4.8%other fields: 14.3%67%top field
Electrical and Electronic Engineering66.7%Condensed Matter Physics7.1%Biomedical Engineering7.1%Atomic and Molecular Physics, and Optics4.8%other fields14.3%

Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.

  1. 1Electrical and Electronic Engineering67% of their works
  2. 2Condensed Matter Physics7% of their works
  3. 3Biomedical Engineering7% of their works
  4. 4Atomic and Molecular Physics, and Optics5% of their works
  5. 5Automotive Engineering2% of their works
  6. 6Surfaces, Coatings and Films2% of their works

Research topics

Which keywords describe Tobias Erlbacher's research?

The keywords of their largest research topics: Thermal Management, Reliability, Wide Bandgap Semiconductors, Atomic Layer Deposition, High-k Dielectrics, III-Nitrides, Semiconductors and Electromagnetic Compatibility.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.

All 17 words, with their numbers
  1. Thermal Management102 topics
  2. Reliability91 topic
  3. Wide Bandgap Semiconductors91 topic
  4. Atomic Layer Deposition61 topic
  5. High-k Dielectrics61 topic
  6. III-Nitrides31 topic
  7. Semiconductors31 topic
  8. EMI21 topic
  9. Electromagnetic Compatibility21 topic
  10. Nanowire Transistors21 topic
  11. Plasmonics21 topic
  12. Thin-Film Transistors21 topic
  13. Tunnel Field-Effect Transistors21 topic
  14. Battery Management Systems11 topic
  15. Hypersonic Effect11 topic
  16. Lithium-ion Batteries11 topic
  17. Ultrasonic Perception11 topic

Where does Tobias Erlbacher work?

Tobias Erlbacher's main affiliation in the publication record is Fraunhofer Institute for Integrated Systems and Device Technology, Germany.

How many publications and citations does Tobias Erlbacher have?

Science Explorer counts 30 works and 37 citations for Tobias Erlbacher, ranking #1,277,501 of 1,633,909 researchers worldwide on the composite score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.