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Researcher · Charles University · Czechia

Tomáš Ibehej

Tomáš Ibehej publishes mostly in Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics, on topics such as Plasma Diagnostics and Applications, Dust and Plasma Wave Phenomena and Metal and Thin Film Mechanics.

ORCID 0000-0002-9127-1046 OpenAlex
World rank
#6,741,942
of 7,710,434 ranked researchers
Rank in Czechia
#29,721
of 39,303
Works
15
Citations
14
Citations per work
0.9
h-index
2
i10-index 0Top 99.1% in Electrical and Electronic Engineering
Tomáš Ibehej

What does Tomáš Ibehej research?

Tomáš Ibehej's work is mostly in Engineering (72%), Physics and Astronomy (19%).

Physical Sciences: 14 works · 90.5% of their workEngineering: 11 works · 71.5% of their workElectrical and Electronic Engineering: 5 works · 35.7% of their workMechanics of Materials: 4 works · 23.8% of their workAerospace Engineering: 1 works · 4.8% of their workMechanical Engineering: 1 works · 4.8% of their workComputational Mechanics: 0 works · 2.4% of their workPhysics and Astronomy: 3 works · 19.0% of their workAtomic and Molecular Physics, and Optics: 3 works · 19.0% of their workEverything else: 1 works · 9.5% of their workTHEIR WORKTomáš Ibehej15works
Physical Sciences90%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1171.5%
    2. Physics and Astronomy319.0%
  2. Everything else19.5%
  1. 1Electrical and Electronic Engineering36% of their works
  2. 2Mechanics of Materials24% of their works
  3. 3Atomic and Molecular Physics, and Optics19% of their works
  4. 4Mechanical Engineering5% of their works
  5. 5Aerospace Engineering5% of their works
  6. 6Computational Mechanics2% of their works

Research topics

Which keywords describe Tomáš Ibehej's research?

The keywords of their largest research topics: Plasma Etching, Semiconductor Industry, Dusty Plasmas, Quantum Plasma Physics, Nanoindentation, Thin Films, Material Analysis and Spectroscopy.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.

All 16 words, with their numbers
  1. Plasma Etching141 topic
  2. Semiconductor Industry141 topic
  3. Dusty Plasmas71 topic
  4. Quantum Plasma Physics71 topic
  5. Nanoindentation61 topic
  6. Thin Films61 topic
  7. Material Analysis41 topic
  8. Spectroscopy41 topic
  9. Negative Ion Sources21 topic
  10. Superconducting Cavities21 topic
  11. CNC Systems11 topic
  12. Electrohydrodynamic Jet Printing11 topic
  13. Ion Beam11 topic
  14. Machine Tools11 topic
  15. Nanoparticle Encapsulation11 topic
  16. Surface Analysis11 topic

Where does Tomáš Ibehej work?

Tomáš Ibehej's main affiliation in the publication record is Charles University, Czechia.

How many publications and citations does Tomáš Ibehej have?

OpenAlex counts 15 works and 14 citations for Tomáš Ibehej, an h-index of 2, ranking #6,741,942 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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