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Researcher · Munich University of Applied Sciences · Germany

Alfred Kersch

Alfred Kersch publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics, on topics such as Ferroelectric and Negative Capacitance Devices, Semiconductor materials and devices and MXene and MAX Phase Materials.

ORCID 0000-0003-4407-555X OpenAlex
World rank
#495,007
of 7,710,434 ranked researchers
Rank in Germany
#24,341
of 364,343
Works
125
Citations
6k
Citations per work
47.6
h-index
36
i10-index 70Top 4.5% in Electrical and Electronic Engineering
Alfred Kersch

What does Alfred Kersch research?

Alfred Kersch's work is mostly in Engineering (50%), Materials Science (22%), Physics and Astronomy (10%).

Physical Sciences: 103 works · 82.2% of their workEngineering: 62 works · 50.0% of their workElectrical and Electronic Engineering: 56 works · 45.2% of their workComputational Mechanics: 6 works · 4.8% of their workMaterials Science: 28 works · 22.0% of their workMaterials Chemistry: 24 works · 18.9% of their workElectronic, Optical and Magnetic Materials: 4 works · 3.1% of their workPhysics and Astronomy: 13 works · 10.2% of their workAtomic and Molecular Physics, and Optics: 8 works · 6.5% of their workNuclear and High Energy Physics: 5 works · 3.7% of their workEverything else: 22 works · 17.8% of their workTHEIR WORKAlfred Kersch125works
Physical Sciences82%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering6250.0%
    2. Materials Science2822.0%
    3. Physics and Astronomy1310.2%
  2. Everything else2217.8%
  1. 1Electrical and Electronic Engineering45% of their works
  2. 2Materials Chemistry19% of their works
  3. 3Atomic and Molecular Physics, and Optics6% of their works
  4. 4Computational Mechanics5% of their works
  5. 5Nuclear and High Energy Physics4% of their works
  6. 6Electronic, Optical and Magnetic Materials3% of their works

Research topics

Which keywords describe Alfred Kersch's research?

The keywords of their largest research topics: Thin Films, Neuromorphic Computing, Ferroelectricity, Hafnium Oxide, Atomic Layer Deposition, High-k Dielectrics, MXenes and Two-Dimensional Materials.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 18 words, with their numbers
  1. Thin Films672 topics
  2. Neuromorphic Computing652 topics
  3. Ferroelectricity571 topic
  4. Hafnium Oxide571 topic
  5. Atomic Layer Deposition541 topic
  6. High-k Dielectrics541 topic
  7. MXenes311 topic
  8. Two-Dimensional Materials311 topic
  9. Ferroelectric Materials181 topic
  10. Lead-free Piezoceramics181 topic
  11. Low-k Dielectrics101 topic
  12. Microelectronics101 topic
  13. Inverse Analysis91 topic
  14. Radiative Heat Transfer91 topic
  15. Memristor81 topic
  16. Plasma Etching81 topic
  17. Resistive Switching81 topic
  18. Semiconductor Industry81 topic

Where does Alfred Kersch work?

Alfred Kersch's main affiliation in the publication record is Munich University of Applied Sciences, Germany.

How many publications and citations does Alfred Kersch have?

OpenAlex counts 125 works and 5,954 citations for Alfred Kersch, an h-index of 36, ranking #495,007 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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