C. Barratt
C. Barratt publishes mostly in Electrical and Electronic Engineering, Condensed Matter Physics and Materials Chemistry, on topics such as Semiconductor materials and devices, Plasma Diagnostics and Applications and GaN-based semiconductor devices and materials.
- World rank
- #3,419,204 of 7,710,434 ranked researchers
- Rank in United States
- #960,452 of 1,627,098
- Works
- 19
- Citations
- 657
- Citations per work
- 34.6
What does C. Barratt research?
C. Barratt's work is mostly in Engineering (62%), Physics and Astronomy (16%), Materials Science (13%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1790.9%
- Engineering1261.8%
- Physics and Astronomy316.4%
- Materials Science212.7%
- Everything else29.1%
- 1Electrical and Electronic Engineering58% of their works
- 2Condensed Matter Physics11% of their works
- 3Materials Chemistry9% of their works
- 4Atomic and Molecular Physics, and Optics6% of their works
- 5Mechanics of Materials4% of their works
- 6Surfaces, Coatings and Films4% of their works
Research topics
- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- GaN-based semiconductor devices and materials
- ZnO doping and properties
- Electrostatic Discharge in Electronics
- Advancements in Semiconductor Devices and Circuit Design
- Silicon Carbide Semiconductor Technologies
- Metal and Thin Film Mechanics
Which keywords describe C. Barratt's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowires, Semiconductors, Plasma Etching, Semiconductor Industry, III-Nitrides and Light-Emitting Diodes.
- Wide Bandgap Semiconductors
- Thin Films
- Nanowire Transistors
- ESD Protection
- Zinc Oxide
- Light-Emitting Diodes
- Semiconductor Industry
- Semiconductors
- High-k Dielectrics
- Atomic Layer Deposition
- Nanowires
- Plasma Etching
- III-Nitrides
- Nanostructures
- CMOS Technology
- Nanoindentation
- Reliability
- Tunnel Field-Effect Transistors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Atomic Layer Deposition141 topic
- High-k Dielectrics141 topic
- Nanowires92 topics
- Semiconductors92 topics
- Plasma Etching81 topic
- Semiconductor Industry81 topic
- III-Nitrides61 topic
- Light-Emitting Diodes61 topic
- Nanostructures31 topic
- Zinc Oxide31 topic
- CMOS Technology21 topic
- ESD Protection21 topic
- Nanoindentation21 topic
- Nanowire Transistors21 topic
- Reliability21 topic
- Thin Films21 topic
- Tunnel Field-Effect Transistors21 topic
- Wide Bandgap Semiconductors21 topic
Where does C. Barratt work?
C. Barratt's main affiliation in the publication record is Plasma Processes (United States), United States.
How many publications and citations does C. Barratt have?
OpenAlex counts 19 works and 657 citations for C. Barratt, an h-index of 12, ranking #3,419,204 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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