D. Roan
D. Roan publishes mostly in Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #887,198 of 7,710,434 ranked researchers
- Rank in United States
- #293,140 of 1,627,098
- Works
- 27
- Citations
- 1.5k
- Citations per work
- 54.9
What does D. Roan research?
D. Roan's work is mostly in Engineering (86%), Materials Science (11%), Environmental Science (1%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2798.7%
- Engineering2386.4%
- Materials Science311.1%
- Environmental Science01.2%
- 1Electrical and Electronic Engineering84% of their works
- 2Materials Chemistry9% of their works
- 3Electronic, Optical and Magnetic Materials2% of their works
- 4Global and Planetary Change1% of their works
- 5Mechanics of Materials1% of their works
- 6Computational Mechanics1% of their works
Research topics
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Integrated Circuits and Semiconductor Failure Analysis
- Ferroelectric and Negative Capacitance Devices
- Electronic and Structural Properties of Oxides
- Copper Interconnects and Reliability
- Turbomachinery Performance and Optimization
- Combustion and flame dynamics
Which keywords describe D. Roan's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Nanowire Transistors, Tunnel Field-Effect Transistors, Thin Films, Failure Analysis, Ferroelectricity and Hafnium Oxide.
- Turbine
- Combustion Instabilities
- Low-k Dielectrics
- Heat Transfer
- Oxide Interfaces
- Hafnium Oxide
- Failure Analysis
- Tunnel Field-Effect Transistors
- High-k Dielectrics
- Atomic Layer Deposition
- Nanowire Transistors
- Thin Films
- Ferroelectricity
- Integrated Circuits
- Two-Dimensional Electron Gases
- Large-Eddy Simulation
- Microelectronics
- Film Cooling
- Turbulent Flames
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 19 words, with their numbers
- Atomic Layer Deposition261 topic
- High-k Dielectrics261 topic
- Nanowire Transistors161 topic
- Tunnel Field-Effect Transistors161 topic
- Thin Films142 topics
- Failure Analysis121 topic
- Ferroelectricity121 topic
- Hafnium Oxide121 topic
- Integrated Circuits121 topic
- Oxide Interfaces71 topic
- Two-Dimensional Electron Gases71 topic
- Heat Transfer22 topics
- Large-Eddy Simulation22 topics
- Low-k Dielectrics21 topic
- Microelectronics21 topic
- Combustion Instabilities11 topic
- Film Cooling11 topic
- Turbine11 topic
- Turbulent Flames11 topic
Where does D. Roan work?
D. Roan's main affiliation in the publication record is Motorola (United States), United States.
How many publications and citations does D. Roan have?
OpenAlex counts 27 works and 1,483 citations for D. Roan, an h-index of 17, ranking #887,198 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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