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Researcher · ASML (Netherlands) · Netherlands

Diane C. McCafferty

Diane C. McCafferty publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Mechanical Engineering, on topics such as Advancements in Photolithography Techniques, Advanced Surface Polishing Techniques and Nanofabrication and Lithography Techniques.

OpenAlex
World rank
#6,844,639
of 7,710,434 ranked researchers
Rank in Netherlands
#103,877
of 107,149
Works
16
Citations
66
Citations per work
4.1
h-index
5
i10-index 3Top 89% in Electrical and Electronic Engineering
Diane C. McCafferty

What does Diane C. McCafferty research?

Diane C. McCafferty's work is mostly in Engineering (93%), Computer Science (2%).

Physical Sciences: 15 works · 95.3% of their workEngineering: 15 works · 92.9% of their workElectrical and Electronic Engineering: 7 works · 45.2% of their workBiomedical Engineering: 6 works · 35.7% of their workComputational Mechanics: 1 works · 4.8% of their workMechanical Engineering: 1 works · 4.8% of their workMedia Technology: 0 works · 2.4% of their workComputer Science: 0 works · 2.4% of their workComputer Vision and Pattern Recognition: 0 works · 2.4% of their workEverything else: 1 works · 4.7% of their workTHEIR WORKDiane C.McCafferty16works
Physical Sciences95%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1592.9%
    2. Computer Science02.4%
  2. Everything else14.7%
  1. 1Electrical and Electronic Engineering45% of their works
  2. 2Biomedical Engineering36% of their works
  3. 3Mechanical Engineering5% of their works
  4. 4Computational Mechanics5% of their works
  5. 5Media Technology2% of their works
  6. 6Computer Vision and Pattern Recognition2% of their works

Research topics

Which keywords describe Diane C. McCafferty's research?

The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Chemical Mechanical Planarization, Material Removal Mechanism, Nanolithography, Soft Lithography and Failure Analysis.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 17 words, with their numbers
  1. High-Resolution Patterning202 topics
  2. Electron Beam Lithography151 topic
  3. Nanofabrication151 topic
  4. Chemical Mechanical Planarization91 topic
  5. Material Removal Mechanism91 topic
  6. Nanolithography51 topic
  7. Soft Lithography51 topic
  8. Failure Analysis31 topic
  9. Integrated Circuits31 topic
  10. Dimensional Metrology21 topic
  11. Error Compensation21 topic
  12. Roughness Measurement21 topic
  13. Surface Characterization21 topic
  14. Camera Calibration11 topic
  15. Compound Eyes11 topic
  16. Freeform Optics11 topic
  17. Structured Light11 topic

Where does Diane C. McCafferty work?

Diane C. McCafferty's main affiliation in the publication record is ASML (Netherlands), Netherlands.

How many publications and citations does Diane C. McCafferty have?

OpenAlex counts 16 works and 66 citations for Diane C. McCafferty, an h-index of 5, ranking #6,844,639 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

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