Donghwan Son
Donghwan Son publishes mostly in Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering, on topics such as Advancements in Photolithography Techniques, Electron and X-Ray Spectroscopy Techniques and Industrial Vision Systems and Defect Detection.
- World rank
- #4,460,437 of 7,710,434 ranked researchers
- Rank in United States
- #1,189,083 of 1,627,098
- Works
- 17
- Citations
- 216
- Citations per work
- 12.7
What does Donghwan Son research?
Donghwan Son's work is mostly in Engineering (65%), Materials Science (12%), Computer Science (4%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences1481.4%
- Engineering1164.7%
- Materials Science212.5%
- Computer Science14.2%
- Everything else318.6%
- 1Electrical and Electronic Engineering42% of their works
- 2Surfaces, Coatings and Films12% of their works
- 3Industrial and Manufacturing Engineering12% of their works
- 4Media Technology6% of their works
- 5Computer Vision and Pattern Recognition4% of their works
- 6Biomedical Engineering4% of their works
Research topics
- Advancements in Photolithography Techniques
- Electron and X-Ray Spectroscopy Techniques
- Industrial Vision Systems and Defect Detection
- Image Processing Techniques and Applications
- VLSI and FPGA Design Techniques
- Advanced Multi-Objective Optimization Algorithms
- Energy Efficient Wireless Sensor Networks
- Optical measurement and interference techniques
Which keywords describe Donghwan Son's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Machine Vision, Scanning Electron Microscopy, X-ray Photoelectron Spectroscopy, Fabric Defect Detection, Texture Analysis and Autofocusing.
- Structured Light
- Evolutionary Algorithms
- Camera Calibration
- ASIC
- Autofocusing
- Fabric Defect Detection
- Scanning Electron Microscopy
- Nanofabrication
- Electron Beam Lithography
- Machine Vision
- X-ray Photoelectron Spectroscopy
- Texture Analysis
- Depth Estimation
- FPGA
- Energy-Efficient Protocols
- Multiobjective Optimization
- Wireless Sensor Networks
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 17 words, with their numbers
- Electron Beam Lithography131 topic
- Nanofabrication131 topic
- Machine Vision82 topics
- Scanning Electron Microscopy61 topic
- X-ray Photoelectron Spectroscopy61 topic
- Fabric Defect Detection51 topic
- Texture Analysis51 topic
- Autofocusing31 topic
- Depth Estimation31 topic
- ASIC21 topic
- FPGA21 topic
- Camera Calibration11 topic
- Energy-Efficient Protocols11 topic
- Evolutionary Algorithms11 topic
- Multiobjective Optimization11 topic
- Structured Light11 topic
- Wireless Sensor Networks11 topic
Where does Donghwan Son work?
Donghwan Son's main affiliation in the publication record is Luminex (United States), United States.
How many publications and citations does Donghwan Son have?
OpenAlex counts 17 works and 216 citations for Donghwan Son, an h-index of 5, ranking #4,460,437 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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