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H. Ohyama

H. Ohyama publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Hardware and Architecture, on topics such as Semiconductor materials and devices, Integrated Circuits and Semiconductor Failure Analysis and Silicon and Solar Cell Technologies.

World rank
#839,149
of 1,633,909 ranked researchers
Rank in Japan
#41,273
of 114,622
Works
49
Citations
79
Citations per work
1.6

What does H. Ohyama research?

Electrical and Electronic Engineering: 82.8%Atomic and Molecular Physics, and Optics: 7.8%Hardware and Architecture: 3.1%Materials Chemistry: 3.1%other fields: 3.2%83%top field
Electrical and Electronic Engineering82.8%Atomic and Molecular Physics, and Optics7.8%Hardware and Architecture3.1%Materials Chemistry3.1%other fields3.2%

Shares of their own output, by the field each of their topics belongs to. The grey slice is everything not listed.

  1. 1Electrical and Electronic Engineering83% of their works
  2. 2Atomic and Molecular Physics, and Optics8% of their works
  3. 3Hardware and Architecture3% of their works
  4. 4Materials Chemistry3% of their works
  5. 5Molecular Biology2% of their works
  6. 6Safety, Risk, Reliability and Quality2% of their works

Research topics

Which keywords describe H. Ohyama's research?

The keywords of their largest research topics: Nanoelectronics, Atomic Layer Deposition, High-k Dielectrics, Solar Cells, Failure Analysis, Integrated Circuits, Efficiency and Nanowire Transistors.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.

All 18 words, with their numbers
  1. Nanoelectronics192 topics
  2. Atomic Layer Deposition141 topic
  3. High-k Dielectrics141 topic
  4. Solar Cells112 topics
  5. Failure Analysis101 topic
  6. Integrated Circuits101 topic
  7. Efficiency81 topic
  8. Nanowire Transistors81 topic
  9. Silicon81 topic
  10. Tunnel Field-Effect Transistors81 topic
  11. Radiation Effects51 topic
  12. Soft Errors51 topic
  13. Reliability41 topic
  14. Wide Bandgap Semiconductors41 topic
  15. Metal-Semiconductor Contacts31 topic
  16. Schottky Barrier31 topic
  17. Embedded Cores21 topic
  18. Test Data Compression21 topic

Where does H. Ohyama work?

H. Ohyama's main affiliation in the publication record is National Institute of Technology, Kumamoto College, Japan.

How many publications and citations does H. Ohyama have?

Science Explorer counts 49 works and 79 citations for H. Ohyama, ranking #839,149 of 1,633,909 researchers worldwide on the composite score.

Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Other researchers named H. Ohyama

Papers, co-authors, who cited this work and researchers on the nearest topics are in the interactive view on the map. Is this your page? Request a correction or removal.