Hal L. Edwards
Hal L. Edwards publishes mostly in Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry, on topics such as Semiconductor materials and devices, Integrated Circuits and Semiconductor Failure Analysis and Advancements in Semiconductor Devices and Circuit Design.
- World rank
- #2,561,477 of 7,710,434 ranked researchers
- Rank in United States
- #752,805 of 1,627,098
- Works
- 83
- Citations
- 1.8k
- Citations per work
- 21.9
What does Hal L. Edwards research?
Hal L. Edwards's work is mostly in Engineering (51%), Physics and Astronomy (23%), Materials Science (11%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences7084.8%
- Engineering4250.8%
- Physics and Astronomy1922.8%
- Materials Science911.2%
- Everything else1315.2%
- 1Electrical and Electronic Engineering41% of their works
- 2Atomic and Molecular Physics, and Optics18% of their works
- 3Materials Chemistry11% of their works
- 4Biomedical Engineering6% of their works
- 5Condensed Matter Physics5% of their works
- 6Computational Mechanics4% of their works
Research topics
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- Advancements in Semiconductor Devices and Circuit Design
- Force Microscopy Techniques and Applications
- Advanced Thermoelectric Materials and Devices
- Physics of Superconductivity and Magnetism
- Silicon Carbide Semiconductor Technologies
- Thermal Radiation and Cooling Technologies
Which keywords describe Hal L. Edwards's research?
The keywords of their largest research topics: Atomic Layer Deposition, High-k Dielectrics, Failure Analysis, Integrated Circuits, Nanowire Transistors, Tunnel Field-Effect Transistors, Atomic Force Microscopy and Force Spectroscopy.
- Radiative Cooling
- Wide Bandgap Semiconductors
- High-Temperature Superconductivity
- Thermoelectric
- Force Spectroscopy
- Tunnel Field-Effect Transistors
- Integrated Circuits
- High-k Dielectrics
- Atomic Layer Deposition
- Failure Analysis
- Nanowire Transistors
- Atomic Force Microscopy
- Materials
- Cuprate Superconductors
- Reliability
- Daytime Radiative Cooling
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 16 words, with their numbers
- Atomic Layer Deposition241 topic
- High-k Dielectrics241 topic
- Failure Analysis221 topic
- Integrated Circuits221 topic
- Nanowire Transistors211 topic
- Tunnel Field-Effect Transistors211 topic
- Atomic Force Microscopy161 topic
- Force Spectroscopy161 topic
- Materials131 topic
- Thermoelectric131 topic
- Cuprate Superconductors101 topic
- High-Temperature Superconductivity101 topic
- Reliability91 topic
- Wide Bandgap Semiconductors91 topic
- Daytime Radiative Cooling71 topic
- Radiative Cooling71 topic
Where does Hal L. Edwards work?
Hal L. Edwards's main affiliation in the publication record is Texas Instruments (United States), United States.
How many publications and citations does Hal L. Edwards have?
OpenAlex counts 83 works and 1,821 citations for Hal L. Edwards, an h-index of 19, ranking #2,561,477 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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