Henry J. L. Megens
Henry J. L. Megens publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics, on topics such as Advancements in Photolithography Techniques, Advanced Surface Polishing Techniques and Advanced Measurement and Metrology Techniques.
- World rank
- #4,702,856 of 7,710,434 ranked researchers
- Rank in Netherlands
- #85,532 of 107,149
- Works
- 28
- Citations
- 384
- Citations per work
- 13.7
What does Henry J. L. Megens research?
Henry J. L. Megens's work is mostly in Engineering (63%), Physics and Astronomy (17%), Materials Science (7%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences2587.8%
- Engineering1863.1%
- Physics and Astronomy517.3%
- Materials Science27.4%
- Everything else312.2%
- 1Electrical and Electronic Engineering31% of their works
- 2Biomedical Engineering20% of their works
- 3Atomic and Molecular Physics, and Optics17% of their works
- 4Mechanical Engineering10% of their works
- 5Surfaces, Coatings and Films7% of their works
- 6Computational Mechanics2% of their works
Research topics
- Advancements in Photolithography Techniques
- Advanced Surface Polishing Techniques
- Advanced Measurement and Metrology Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Optical Coatings and Gratings
- Cold Atom Physics and Bose-Einstein Condensates
- Optical measurement and interference techniques
- Nanofabrication and Lithography Techniques
Which keywords describe Henry J. L. Megens's research?
The keywords of their largest research topics: Nanofabrication, High-Resolution Patterning, Electron Beam Lithography, Resolution Limits, Chemical Mechanical Planarization, Material Removal Mechanism, Dimensional Metrology and Error Compensation.
- Structured Light
- Nanolithography
- Ultracold Gases
- Nanostructures
- Failure Analysis
- Error Compensation
- Material Removal Mechanism
- Resolution Limits
- High-Resolution Patterning
- Nanofabrication
- Electron Beam Lithography
- Chemical Mechanical Planarization
- Dimensional Metrology
- Antireflective Coatings
- Integrated Circuits
- Quantum Simulation
- Camera Calibration
- Soft Lithography
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- Nanofabrication232 topics
- High-Resolution Patterning202 topics
- Electron Beam Lithography181 topic
- Resolution Limits181 topic
- Chemical Mechanical Planarization141 topic
- Material Removal Mechanism141 topic
- Dimensional Metrology81 topic
- Error Compensation81 topic
- Antireflective Coatings51 topic
- Failure Analysis51 topic
- Integrated Circuits51 topic
- Nanostructures51 topic
- Quantum Simulation51 topic
- Ultracold Gases51 topic
- Camera Calibration21 topic
- Nanolithography21 topic
- Soft Lithography21 topic
- Structured Light21 topic
Where does Henry J. L. Megens work?
Henry J. L. Megens's main affiliation in the publication record is ASML (Netherlands), Netherlands.
How many publications and citations does Henry J. L. Megens have?
OpenAlex counts 28 works and 384 citations for Henry J. L. Megens, an h-index of 11, ranking #4,702,856 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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